FR2609187A1 - Matiere photopolymerisable, pouvant supporter une chaleur moderee - Google Patents

Matiere photopolymerisable, pouvant supporter une chaleur moderee Download PDF

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Publication number
FR2609187A1
FR2609187A1 FR8618176A FR8618176A FR2609187A1 FR 2609187 A1 FR2609187 A1 FR 2609187A1 FR 8618176 A FR8618176 A FR 8618176A FR 8618176 A FR8618176 A FR 8618176A FR 2609187 A1 FR2609187 A1 FR 2609187A1
Authority
FR
France
Prior art keywords
parts
oxyl
photopolymerizable
group
compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR8618176A
Other languages
English (en)
French (fr)
Inventor
Wolfgang Haubold
Norbert Kraus
Gunter Israel
Uwe Muller
Thomas Taplick
Hans-Joachim Timpe
Manfred Ratzsch
Reingard Knopel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Filmfabrik Wolfen VEB
Original Assignee
Filmfabrik Wolfen VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Filmfabrik Wolfen VEB filed Critical Filmfabrik Wolfen VEB
Publication of FR2609187A1 publication Critical patent/FR2609187A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/32—Compounds containing nitrogen bound to oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
FR8618176A 1986-12-19 1986-12-24 Matiere photopolymerisable, pouvant supporter une chaleur moderee Withdrawn FR2609187A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8630357A GB2198736B (en) 1986-12-19 1986-12-19 Photopolymerisable material

Publications (1)

Publication Number Publication Date
FR2609187A1 true FR2609187A1 (fr) 1988-07-01

Family

ID=10609272

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8618176A Withdrawn FR2609187A1 (fr) 1986-12-19 1986-12-24 Matiere photopolymerisable, pouvant supporter une chaleur moderee

Country Status (4)

Country Link
CH (1) CH669052A5 (de)
DE (1) DE3641014A1 (de)
FR (1) FR2609187A1 (de)
GB (1) GB2198736B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2653458B2 (ja) * 1988-03-26 1997-09-17 旭化成工業株式会社 凸版印刷版用感光性樹脂組成物
DE3834299A1 (de) * 1988-10-08 1990-04-12 Hoechst Ag Verfahren zum stabilisieren einer leukofarbstoffloesung und durch strahlung polymerisierbares, einen leukofarbstoff enthaltendes gemisch
US5599650A (en) * 1995-04-28 1997-02-04 Polaroid Corporation Photoreaction quenchers in on-press developable lithographic printing plates
US5912106A (en) * 1996-09-10 1999-06-15 Ciba Specialty Chemicals Corporation Method for improving photoimage quality
US6296984B1 (en) * 1999-03-12 2001-10-02 Agere Systems Guardian Corp. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
DE10255667B4 (de) * 2002-11-28 2006-05-11 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit
EP1783548B1 (de) 2005-11-08 2017-03-08 Rohm and Haas Electronic Materials LLC Verfahren zur Bildung einer gemusterten Schicht auf einem Substrat
JP5523101B2 (ja) 2006-10-24 2014-06-18 チバ ホールディング インコーポレーテッド 熱安定性のカチオン光硬化性組成物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4180403A (en) * 1973-01-18 1979-12-25 E. I. Du Pont De Nemours And Company Photohardenable films having high resolution containing nitroso dimers
EP0070388A1 (de) * 1981-07-20 1983-01-26 American Cyanamid Company Lichtschutzmittel für Polymere
EP0082817A1 (de) * 1981-12-17 1983-06-29 Ciba-Geigy Ag Farbphotographisches Aufzeichnungsmaterial

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1127495A (en) * 1966-04-26 1968-09-18 Bp Chem Int Ltd Stabilization of chloroprene monomer
GB1127127A (en) * 1966-04-26 1968-09-11 Bp Chem Int Ltd Stabilization of acrylic acid
GB1218456A (en) * 1968-09-06 1971-01-06 Bp Chem Int Ltd Process for the stabilisation of butadiene
GB1346774A (en) * 1970-10-05 1974-02-13 Bp Chem Int Ltd Stabilisation of acrylonitrile
ATE49588T1 (de) * 1984-10-10 1990-02-15 Amoco Corp Verfahren zur reinigung von methacrylsaeure.

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4180403A (en) * 1973-01-18 1979-12-25 E. I. Du Pont De Nemours And Company Photohardenable films having high resolution containing nitroso dimers
EP0070388A1 (de) * 1981-07-20 1983-01-26 American Cyanamid Company Lichtschutzmittel für Polymere
EP0082817A1 (de) * 1981-12-17 1983-06-29 Ciba-Geigy Ag Farbphotographisches Aufzeichnungsmaterial

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
CHEMICAL ABSTRACTS, vol. 103, no. 22, 2 décembre 1985, page 3, résumé no. 178683h, Columbus, Ohio, US; W. CAO et al.: "Charge-transfer polymerization - photopolymerization of triphenylphosphine-initiated acrylonitrile", & GAOFENZI TONGXUN 1985, (3), 184-90 *
CHEMICAL ABSTRACTS, vol. 98, no. 16, 18 avril 1983, page 2, résumé no. 126651e, Columbus, Ohio, US; S. WU et al.: "Initiation mechanism of photopolymerization by using piperidylnitroxyl radical", & GAOFENZI TONGXUN 1982, (4), 253-60 *

Also Published As

Publication number Publication date
DE3641014A1 (de) 1988-06-16
GB8630357D0 (en) 1987-01-28
GB2198736B (en) 1990-04-04
GB2198736A (en) 1988-06-22
CH669052A5 (de) 1989-02-15

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Legal Events

Date Code Title Description
RE Withdrawal of published application