FR2581793B1 - Procede et dispositif de fabrication de composants electroniques ou optoelectroniques avec depot par evaporation sous vide - Google Patents

Procede et dispositif de fabrication de composants electroniques ou optoelectroniques avec depot par evaporation sous vide

Info

Publication number
FR2581793B1
FR2581793B1 FR8506923A FR8506923A FR2581793B1 FR 2581793 B1 FR2581793 B1 FR 2581793B1 FR 8506923 A FR8506923 A FR 8506923A FR 8506923 A FR8506923 A FR 8506923A FR 2581793 B1 FR2581793 B1 FR 2581793B1
Authority
FR
France
Prior art keywords
vacuum evaporation
optoelectronic components
manufacturing electronic
evaporation deposition
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8506923A
Other languages
English (en)
Other versions
FR2581793A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DURUY NICOLAS
Original Assignee
DURUY NICOLAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DURUY NICOLAS filed Critical DURUY NICOLAS
Priority to FR8506923A priority Critical patent/FR2581793B1/fr
Publication of FR2581793A1 publication Critical patent/FR2581793A1/fr
Application granted granted Critical
Publication of FR2581793B1 publication Critical patent/FR2581793B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR8506923A 1985-05-07 1985-05-07 Procede et dispositif de fabrication de composants electroniques ou optoelectroniques avec depot par evaporation sous vide Expired FR2581793B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR8506923A FR2581793B1 (fr) 1985-05-07 1985-05-07 Procede et dispositif de fabrication de composants electroniques ou optoelectroniques avec depot par evaporation sous vide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8506923A FR2581793B1 (fr) 1985-05-07 1985-05-07 Procede et dispositif de fabrication de composants electroniques ou optoelectroniques avec depot par evaporation sous vide

Publications (2)

Publication Number Publication Date
FR2581793A1 FR2581793A1 (fr) 1986-11-14
FR2581793B1 true FR2581793B1 (fr) 1988-04-29

Family

ID=9319039

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8506923A Expired FR2581793B1 (fr) 1985-05-07 1985-05-07 Procede et dispositif de fabrication de composants electroniques ou optoelectroniques avec depot par evaporation sous vide

Country Status (1)

Country Link
FR (1) FR2581793B1 (fr)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR805066A (fr) * 1935-08-02 1936-11-10 Dispositif pour la production de dépôts par sublimation dans le vide
US2702760A (en) * 1951-04-25 1955-02-22 Western Electric Co Method of applying metallic stripes to a web of paper
US2771055A (en) * 1952-04-25 1956-11-20 Technicolor Corp Apparatus for coating optical interference layers
US3502051A (en) * 1966-09-01 1970-03-24 George D Adams Vacuum deposition apparatus
FR1545890A (fr) * 1967-10-05 1968-11-15 Centre Nat Rech Scient Perfectionnements aux procédés et dispositifs de projection de molécules et aux supports revêtus par les molécules ainsi projetées
GB1446848A (en) * 1972-11-29 1976-08-18 Triplex Safety Glass Co Sputtered metal oxide coatings articles comprising transparent electrically-conductive coatings on non-conducting substrates
JPS52152881A (en) * 1976-06-15 1977-12-19 Ulvac Corp Controller of film thickness in equipment for forming coated film
FR2369016A1 (fr) * 1976-10-26 1978-05-26 Matra Procede d
US4315960A (en) * 1980-05-28 1982-02-16 Matsushita Electric Industrial Co., Ltd. Method of making a thin film
CH650028A5 (de) * 1980-09-26 1985-06-28 Balzers Hochvakuum Anordnung zum gleichfoermigen beschichten von rotationsflaechen durch bedampfen im hochvakuum.
CH652754A5 (de) * 1981-03-13 1985-11-29 Balzers Hochvakuum Anordnung zum beschichten von substraten in einer vakuumbeschichtungsanlage.

Also Published As

Publication number Publication date
FR2581793A1 (fr) 1986-11-14

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Legal Events

Date Code Title Description
ST Notification of lapse