FR2559788B1 - Bain pour le depot de cuivre par voie non electrolytique sur des substrats et son procede d'utilisation - Google Patents
Bain pour le depot de cuivre par voie non electrolytique sur des substrats et son procede d'utilisationInfo
- Publication number
- FR2559788B1 FR2559788B1 FR8502303A FR8502303A FR2559788B1 FR 2559788 B1 FR2559788 B1 FR 2559788B1 FR 8502303 A FR8502303 A FR 8502303A FR 8502303 A FR8502303 A FR 8502303A FR 2559788 B1 FR2559788 B1 FR 2559788B1
- Authority
- FR
- France
- Prior art keywords
- bath
- substrates
- electrolytic copper
- copper deposition
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
- C23C18/405—Formaldehyde
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US57947284A | 1984-02-17 | 1984-02-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2559788A1 FR2559788A1 (fr) | 1985-08-23 |
FR2559788B1 true FR2559788B1 (fr) | 1991-08-16 |
Family
ID=24317039
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8502303A Expired - Lifetime FR2559788B1 (fr) | 1984-02-17 | 1985-02-18 | Bain pour le depot de cuivre par voie non electrolytique sur des substrats et son procede d'utilisation |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS60194081A (fr) |
CA (1) | CA1248705A (fr) |
DE (1) | DE3504150A1 (fr) |
FR (1) | FR2559788B1 (fr) |
GB (1) | GB2154250B (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013204107A (ja) * | 2012-03-29 | 2013-10-07 | Kanto Gakuin | 無電解めっき方法および配線板 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3383224A (en) * | 1965-11-09 | 1968-05-14 | Shipley Co | Electroless copper deposition |
GB1195217A (en) * | 1967-10-04 | 1970-06-17 | Technograph Ltd | Electroless Copper Plating. |
US3992211A (en) * | 1968-07-15 | 1976-11-16 | Trans-Metals Corporation | Electroless plating composition |
US4265943A (en) * | 1978-11-27 | 1981-05-05 | Macdermid Incorporated | Method and composition for continuous electroless copper deposition using a hypophosphite reducing agent in the presence of cobalt or nickel ions |
CA1184359A (fr) * | 1981-10-23 | 1985-03-26 | Donald A. Arcilesi | Repression des impuretes metalliques en cuivrage non electrolytique |
-
1985
- 1985-02-07 GB GB08503104A patent/GB2154250B/en not_active Expired
- 1985-02-07 DE DE19853504150 patent/DE3504150A1/de active Granted
- 1985-02-15 JP JP2811385A patent/JPS60194081A/ja active Granted
- 1985-02-15 CA CA000474448A patent/CA1248705A/fr not_active Expired
- 1985-02-18 FR FR8502303A patent/FR2559788B1/fr not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0218387B2 (fr) | 1990-04-25 |
FR2559788A1 (fr) | 1985-08-23 |
GB8503104D0 (en) | 1985-03-13 |
GB2154250A (en) | 1985-09-04 |
GB2154250B (en) | 1987-06-03 |
CA1248705A (fr) | 1989-01-17 |
JPS60194081A (ja) | 1985-10-02 |
DE3504150C2 (fr) | 1987-08-13 |
DE3504150A1 (de) | 1985-10-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2550229B1 (fr) | Procede et bain pour le depot electrolytique de zinc et d'alliages de zinc | |
FR2534279B1 (fr) | Bain pour depot galvanoplastique d'etain, de plomb ou d'alliage d'etain-plomb et procede l'utilisant pour revetir des metaux | |
BE893396A (fr) | Procede et composition pour le depot d'or par immersion | |
BE893288A (fr) | Procede et composition pour eliminer un revetement d'aluminiure des substrats en superalliages de nickel | |
BE893534A (fr) | Composition de brillantage pour bain d'electrodeposition d'alliage de zinc et procede pour l'utiliser | |
FR2527649B1 (fr) | Bain et procede d'enlevement par voie electrolytique de depots metalliques, tels que le cuivre et les alliages de cuivre, a partir de substrats | |
BE838335A (fr) | Bain pour le depot galvanique d'alliages de palladium-nickel | |
AU8085187A (en) | Copper bath for electroless plating having excess counter-cation and process using same | |
FR2617492B1 (fr) | Composition de revetement, inhibant la corrosion et soudable, pour substrats metalliques | |
FR2537162B1 (fr) | Depot direct non electrolytique d'or sur des ceramiques metallisees | |
FR2519031B1 (fr) | Bain de dorure et procede pour appliquer des depots d'or par galvanoplastie | |
FR2569429B1 (fr) | Bain de depot galvanique d'alliage de chrome | |
FR2559788B1 (fr) | Bain pour le depot de cuivre par voie non electrolytique sur des substrats et son procede d'utilisation | |
GB2189259B (en) | Electroplating bath for forming zinc-nickel alloy coating | |
BE878515A (fr) | Bain et procede de depot electrolytique d'un alliage d'or | |
FR2547318B1 (fr) | Composition d'electrolyte et procede pour le depot electrolytique de cuivre | |
FR2501243B1 (fr) | Bain de galvanoplastie pour deposer un alliage nickel-palladium, procede d'utilisation de ce bain | |
BE892343A (fr) | Bain de depot galvanoplastique d'alliages nickel-palladium, procede d'utilisation de ce bain | |
BE893395A (fr) | Bain et procede pour l'electrodeposition du ruthenium | |
GB2200120B (en) | Adherent coating for copper | |
FR2578859B1 (fr) | Appareillage et installation de realisation d'un depot metallique electrolytique d'epaisseur constante. | |
FR2500012B1 (fr) | Bain de revetement electrolytique d'or et procede de depot | |
FR2639654B1 (fr) | Bain de dorure autocatalytique et son procede d'utilisation | |
GB2085924B (en) | Bath and process for high speed nickel electroplating | |
FR2478133B1 (fr) | Bain pour le depot galvanoplastique d'un alliage metallique de teinte jaune-or |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |