FR2539912A1 - Procede de fabrication d'une resistance a pellicule mince - Google Patents

Procede de fabrication d'une resistance a pellicule mince Download PDF

Info

Publication number
FR2539912A1
FR2539912A1 FR8400796A FR8400796A FR2539912A1 FR 2539912 A1 FR2539912 A1 FR 2539912A1 FR 8400796 A FR8400796 A FR 8400796A FR 8400796 A FR8400796 A FR 8400796A FR 2539912 A1 FR2539912 A1 FR 2539912A1
Authority
FR
France
Prior art keywords
resistance
value
thin film
process according
covered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR8400796A
Other languages
English (en)
French (fr)
Other versions
FR2539912B3 (https=
Inventor
Hermann Birnbreier
Helmut Haas
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BBC Brown Boveri AG Switzerland
BBC Brown Boveri AG Germany
Original Assignee
BBC Brown Boveri AG Switzerland
BBC Brown Boveri AG Germany
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BBC Brown Boveri AG Switzerland, BBC Brown Boveri AG Germany filed Critical BBC Brown Boveri AG Switzerland
Publication of FR2539912A1 publication Critical patent/FR2539912A1/fr
Application granted granted Critical
Publication of FR2539912B3 publication Critical patent/FR2539912B3/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques
    • H01C17/08—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques by vapour deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/02—Apparatus or processes specially adapted for manufacturing resistors adapted for manufacturing resistors with envelope or housing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
    • H01C17/26—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by converting resistive material
    • H01C17/265—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by converting resistive material by chemical or thermal treatment, e.g. oxydation, reduction, annealing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)
FR8400796A 1983-01-20 1984-01-19 Procede de fabrication d'une resistance a pellicule mince Granted FR2539912A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19833301665 DE3301665A1 (de) 1983-01-20 1983-01-20 Verfahren zur herstellung eines duennfilmwiderstandes

Publications (2)

Publication Number Publication Date
FR2539912A1 true FR2539912A1 (fr) 1984-07-27
FR2539912B3 FR2539912B3 (https=) 1985-05-17

Family

ID=6188649

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8400796A Granted FR2539912A1 (fr) 1983-01-20 1984-01-19 Procede de fabrication d'une resistance a pellicule mince

Country Status (5)

Country Link
US (1) US4530852A (https=)
JP (1) JPS59138310A (https=)
DE (1) DE3301665A1 (https=)
FR (1) FR2539912A1 (https=)
GB (1) GB2136213A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62159453A (ja) * 1986-01-07 1987-07-15 Nec Corp 抵抗体の製造方法
EP0704889A3 (de) * 1994-09-29 1998-10-21 Siemens Aktiengesellschaft Leistungshalbleiterbauelement mit monolithisch integriertem Messwiderstand und Verfahren zu dessen Herstellung
DE19945914C1 (de) * 1999-09-24 2001-08-30 Siemens Ag Verfahren zur Erzeugung von präzisen Lötflächen auf einem Schaltungsträger, insbesondere Dünnfilm-Substrat

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2610606A (en) * 1946-09-26 1952-09-16 Polytechnic Inst Brooklyn Apparatus for the formation of metallic films by thermal evaporation
DE1089861B (de) * 1957-11-12 1960-09-29 Int Resistance Co Metallschichtwiderstand mit aufgedampfter Widerstandsschicht aus einer Nickel-Chrom-Legierung
GB1249317A (en) * 1968-11-19 1971-10-13 Mullard Ltd Semiconductor devices
US4021277A (en) * 1972-12-07 1977-05-03 Sprague Electric Company Method of forming thin film resistor
DE2356419C3 (de) * 1973-11-12 1979-01-25 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen von Widerstandsschichten aus Aluminium-Tantal-Legierungen durch Kathodenzerstäubung
JPS5123693A (en) * 1974-08-21 1976-02-25 Tatsuta Densen Kk Teikoyokinzokuhimakuno netsushori
US4019168A (en) * 1975-08-21 1977-04-19 Airco, Inc. Bilayer thin film resistor and method for manufacture
JPS52132397A (en) * 1976-04-30 1977-11-07 Nippon Chemical Ind Thinnfilm resistor whose resistive temperature coefficient has been improved
JPS52135095A (en) * 1976-05-06 1977-11-11 Nippon Chemical Ind Thinnfilm resistor whose resistive temperature coeficent has been made small
FR2351478A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Procede de realisation de resistances en couches minces passivees et resistances obtenues par ce procede
US4194174A (en) * 1978-06-19 1980-03-18 Microwave Semiconductor Corp. Method for fabricating ballasted finger electrode
DE2939236A1 (de) * 1979-09-27 1981-04-02 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung duenner widerstandsschichten hoher langzeitstabilitaet

Also Published As

Publication number Publication date
GB8400677D0 (en) 1984-02-15
FR2539912B3 (https=) 1985-05-17
US4530852A (en) 1985-07-23
GB2136213A (en) 1984-09-12
JPS59138310A (ja) 1984-08-08
DE3301665A1 (de) 1984-07-26

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Legal Events

Date Code Title Description
ST Notification of lapse