FR2528233A1 - Structure de doigt d'emetteur dans un transistor de commutation - Google Patents

Structure de doigt d'emetteur dans un transistor de commutation Download PDF

Info

Publication number
FR2528233A1
FR2528233A1 FR8209954A FR8209954A FR2528233A1 FR 2528233 A1 FR2528233 A1 FR 2528233A1 FR 8209954 A FR8209954 A FR 8209954A FR 8209954 A FR8209954 A FR 8209954A FR 2528233 A1 FR2528233 A1 FR 2528233A1
Authority
FR
France
Prior art keywords
gold
emitter
layer
atoms
zones
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR8209954A
Other languages
English (en)
French (fr)
Other versions
FR2528233B1 (enExample
Inventor
Philippe Bouard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR8209954A priority Critical patent/FR2528233A1/fr
Priority to DE8383401076T priority patent/DE3364513D1/de
Priority to EP83401076A priority patent/EP0096625B1/fr
Priority to US06/501,189 priority patent/US4609414A/en
Publication of FR2528233A1 publication Critical patent/FR2528233A1/fr
Application granted granted Critical
Publication of FR2528233B1 publication Critical patent/FR2528233B1/fr
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/133Emitter regions of BJTs
    • H10D62/136Emitter regions of BJTs of heterojunction BJTs 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/83Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
    • H10D62/834Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge further characterised by the dopants

Landscapes

  • Bipolar Transistors (AREA)
FR8209954A 1982-06-08 1982-06-08 Structure de doigt d'emetteur dans un transistor de commutation Granted FR2528233A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR8209954A FR2528233A1 (fr) 1982-06-08 1982-06-08 Structure de doigt d'emetteur dans un transistor de commutation
DE8383401076T DE3364513D1 (en) 1982-06-08 1983-05-27 Emitter finger structure in a switching transistor and manufacturing process
EP83401076A EP0096625B1 (fr) 1982-06-08 1983-05-27 Structure de doigt d'émetteur dans un transistor de commutation et procédé de fabrication
US06/501,189 US4609414A (en) 1982-06-08 1983-06-06 Emitter finger structure in a switching transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8209954A FR2528233A1 (fr) 1982-06-08 1982-06-08 Structure de doigt d'emetteur dans un transistor de commutation

Publications (2)

Publication Number Publication Date
FR2528233A1 true FR2528233A1 (fr) 1983-12-09
FR2528233B1 FR2528233B1 (enExample) 1985-05-17

Family

ID=9274750

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8209954A Granted FR2528233A1 (fr) 1982-06-08 1982-06-08 Structure de doigt d'emetteur dans un transistor de commutation

Country Status (4)

Country Link
US (1) US4609414A (enExample)
EP (1) EP0096625B1 (enExample)
DE (1) DE3364513D1 (enExample)
FR (1) FR2528233A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2171555A (en) * 1985-02-20 1986-08-28 Philips Electronic Associated Bipolar semiconductor device with implanted recombination region
JP2775503B2 (ja) * 1990-03-13 1998-07-16 三菱電機株式会社 接合ゲート型電界効果トランジスタの製造方法
JP5061407B2 (ja) * 2001-01-31 2012-10-31 富士電機株式会社 半導体装置およびその製造方法
US10199529B2 (en) * 2008-05-28 2019-02-05 Solar-Tectic, Llc Methods of growing heteroepitaxial single crystal or large grained semiconductor films and devices thereon

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3258371A (en) * 1962-02-01 1966-06-28 Semiconductor Res Found Silicon semiconductor device for high frequency, and method of its manufacture
US3728592A (en) * 1969-05-09 1973-04-17 Ibm Semiconductor structure having reduced carrier lifetime
US3943549A (en) * 1972-03-15 1976-03-09 Bbc Brown, Boveri & Company, Limited Thyristor
JPS5342234B2 (enExample) * 1973-02-12 1978-11-09
US4177477A (en) * 1974-03-11 1979-12-04 Mitsubishi Denki Kabushiki Kaisha Semiconductor switching device
FR2374742A1 (fr) * 1976-12-20 1978-07-13 Radiotechnique Compelec Transistor multicouche pour tensions elevees et son procede de fabrication
FR2374743A1 (fr) * 1976-12-20 1978-07-13 Radiotechnique Compelec Transistor multicouche a emetteur compose
US4345266A (en) * 1978-07-20 1982-08-17 General Electric Company Transistor having improved turn-off time and second breakdown characteristics with bi-level emitter structure
GB2026236B (en) * 1978-07-20 1983-02-02 Gen Electric Power transistor
JPS5565460A (en) * 1978-11-09 1980-05-16 Ibm Method of manufacturing semiconductor device improved in current gain
FR2451106A1 (fr) * 1979-03-09 1980-10-03 Thomson Csf Dispositif semi-conducteur de commutation a frequence elevee

Also Published As

Publication number Publication date
EP0096625A1 (fr) 1983-12-21
FR2528233B1 (enExample) 1985-05-17
US4609414A (en) 1986-09-02
EP0096625B1 (fr) 1986-07-16
DE3364513D1 (en) 1986-08-21

Similar Documents

Publication Publication Date Title
EP0057126A2 (fr) Procédé de fabrication d'une structure de transistors
EP0022388B1 (fr) Procédé de fabrication d'un transistor à effet de champ du type DMOS à fonctionnement vertical
EP0069606B1 (fr) Transistor à effet de champ vertical à jonction et procédé de fabrication
EP0414618B1 (fr) Transistor MOS en couche mince avec la zone de canal reliée à la source et son procédé de fabrication
EP0096625B1 (fr) Structure de doigt d'émetteur dans un transistor de commutation et procédé de fabrication
EP0990266B1 (fr) Transistor hyperfrequence a structure quasi-autoalignee et son procede de fabrication
EP0410911B1 (fr) Procédé de fabrication d'un circuit intégré à transistors de puissance et logiques comprenant une diode.
EP0521802B1 (fr) Diode à avalanche dans un circuit intégré bipolaire
EP0002087B1 (fr) Dispositif semiconducteur monolithique comprenant deux transistors complémentaires et son procédé de fabrication
EP0843351A1 (fr) Procédé de fabrication d'un transistor NPN dans une technologie BICMOS
EP1058302A1 (fr) Procédé de fabrication de dispositifs bipolaires à jonction base-émetteur autoalignée
EP1006573A1 (fr) Procédé de fabrication de circuits intégrés BICMOS sur un substrat CMOS classique
EP0197838B1 (fr) Procédé de réalisation d'un transistor à effet de champ à métallisation de grille autoalignée
EP0230840B1 (fr) Transistor à base perméable et procédés de fabrication
EP0164292B1 (fr) Thyristor blocable à gachette d'anode
FR2530383A1 (fr) Circuit integre monolithique comprenant une partie logique schottky et une memoire programmable a fusibles
EP0872893A1 (fr) Transistor PNP latéral dans une technologie BICMOS
EP0843349A1 (fr) Procédé de fabrication d'un transistor NPN de surface minimale
EP0949666A1 (fr) Région de base-émetteur d'un transistor bipolaire submicronique
EP0060761B1 (fr) Transistor bipolaire latéral sur isolant et son procédé de fabrication
EP0037764B1 (fr) Structure de dispositif à semiconducteur à anneau de garde, et à fonctionnement unipolaire
EP0098209B1 (fr) Transistor de commutation de puissance à structure digitée
EP0065464B1 (fr) Procédé de fabrication de circuits intégrés de type MOS
FR2760130A1 (fr) Transistor mos a faible resistance de drain
FR2528232A1 (fr) Structure de contact sur une zone semi-conductrice superficielle fortement dopee et procede de fabrication

Legal Events

Date Code Title Description
CD Change of name or company name