FR2513425A1 - Dispositif de limitation angulaire dans un systeme a faisceau de particules chargees - Google Patents

Dispositif de limitation angulaire dans un systeme a faisceau de particules chargees Download PDF

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Publication number
FR2513425A1
FR2513425A1 FR8117846A FR8117846A FR2513425A1 FR 2513425 A1 FR2513425 A1 FR 2513425A1 FR 8117846 A FR8117846 A FR 8117846A FR 8117846 A FR8117846 A FR 8117846A FR 2513425 A1 FR2513425 A1 FR 2513425A1
Authority
FR
France
Prior art keywords
stencil
source
diaphragm
electronic
plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR8117846A
Other languages
English (en)
French (fr)
Other versions
FR2513425B1 (OSRAM
Inventor
Emmanuel De Chambost
Jacques Trotel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR8117846A priority Critical patent/FR2513425A1/fr
Priority to US06/413,524 priority patent/US4492870A/en
Priority to DE8282401634T priority patent/DE3268835D1/de
Priority to EP82401634A priority patent/EP0075504B1/fr
Priority to JP57164146A priority patent/JPS5866332A/ja
Publication of FR2513425A1 publication Critical patent/FR2513425A1/fr
Application granted granted Critical
Publication of FR2513425B1 publication Critical patent/FR2513425B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
FR8117846A 1981-09-22 1981-09-22 Dispositif de limitation angulaire dans un systeme a faisceau de particules chargees Granted FR2513425A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR8117846A FR2513425A1 (fr) 1981-09-22 1981-09-22 Dispositif de limitation angulaire dans un systeme a faisceau de particules chargees
US06/413,524 US4492870A (en) 1981-09-22 1982-08-31 Angular limitation device in a charged particle beam system
DE8282401634T DE3268835D1 (en) 1981-09-22 1982-09-07 Angle limitation device in a charged-particles beam system
EP82401634A EP0075504B1 (fr) 1981-09-22 1982-09-07 Dispositif de limitation angulaire dans un système à faisceau de particules chargées
JP57164146A JPS5866332A (ja) 1981-09-22 1982-09-22 荷電粒子ビ−ム装置の開口角制限装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8117846A FR2513425A1 (fr) 1981-09-22 1981-09-22 Dispositif de limitation angulaire dans un systeme a faisceau de particules chargees

Publications (2)

Publication Number Publication Date
FR2513425A1 true FR2513425A1 (fr) 1983-03-25
FR2513425B1 FR2513425B1 (OSRAM) 1983-12-02

Family

ID=9262358

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8117846A Granted FR2513425A1 (fr) 1981-09-22 1981-09-22 Dispositif de limitation angulaire dans un systeme a faisceau de particules chargees

Country Status (5)

Country Link
US (1) US4492870A (OSRAM)
EP (1) EP0075504B1 (OSRAM)
JP (1) JPS5866332A (OSRAM)
DE (1) DE3268835D1 (OSRAM)
FR (1) FR2513425A1 (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2597259A1 (fr) * 1986-04-15 1987-10-16 Thomson Csf Dispositif a faisceau electronique pour projeter l'image d'un objet sur un echantillon
JP2591548B2 (ja) * 1991-07-26 1997-03-19 富士通株式会社 荷電粒子線露光装置及び荷電粒子線露光方法
FR2837931B1 (fr) * 2002-03-29 2004-12-10 Cameca Dispositif de mesure de l'emission de rayons x produite par un objet soumis a un faisceau d'electrons

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1544222A (en) * 1976-07-02 1979-04-19 Zeiss Jena Veb Carl Method of and apparatus for non-thermal electron beam processing of workpieces

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2351497A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Dispositif permettant le trace programme de figures de formes differentes
GB1605087A (en) * 1977-05-31 1981-12-16 Rikagaku Kenkyusho Method for shaping a beam of electrically charged particles
US4218621A (en) * 1977-06-15 1980-08-19 Vlsi Technology Research Association Electron beam exposure apparatus
US4199689A (en) * 1977-12-21 1980-04-22 Tokyo Shibaura Denki Kabushiki Kaisha Electron beam exposing method and electron beam apparatus
US4243866A (en) * 1979-01-11 1981-01-06 International Business Machines Corporation Method and apparatus for forming a variable size electron beam
US4210806A (en) * 1979-01-18 1980-07-01 International Business Machines Corporation High brightness electron probe beam and method
US4282437A (en) * 1979-12-17 1981-08-04 Bell Telephone Laboratories, Incorporated Charged particle beam lithography

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1544222A (en) * 1976-07-02 1979-04-19 Zeiss Jena Veb Carl Method of and apparatus for non-thermal electron beam processing of workpieces

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
EXBK/77 *

Also Published As

Publication number Publication date
US4492870A (en) 1985-01-08
EP0075504B1 (fr) 1986-01-29
DE3268835D1 (en) 1986-03-13
EP0075504A1 (fr) 1983-03-30
JPS5866332A (ja) 1983-04-20
FR2513425B1 (OSRAM) 1983-12-02

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