FR2509755B1 - HIGH SPEED CATHODE SPRAYING APPARATUS AND METHOD - Google Patents

HIGH SPEED CATHODE SPRAYING APPARATUS AND METHOD

Info

Publication number
FR2509755B1
FR2509755B1 FR8212350A FR8212350A FR2509755B1 FR 2509755 B1 FR2509755 B1 FR 2509755B1 FR 8212350 A FR8212350 A FR 8212350A FR 8212350 A FR8212350 A FR 8212350A FR 2509755 B1 FR2509755 B1 FR 2509755B1
Authority
FR
France
Prior art keywords
high speed
spraying apparatus
cathode spraying
speed cathode
spraying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8212350A
Other languages
French (fr)
Other versions
FR2509755A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ampex Corp
Original Assignee
Ampex Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ampex Corp filed Critical Ampex Corp
Publication of FR2509755A1 publication Critical patent/FR2509755A1/en
Application granted granted Critical
Publication of FR2509755B1 publication Critical patent/FR2509755B1/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3417—Arrangements

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR8212350A 1981-07-16 1982-07-15 HIGH SPEED CATHODE SPRAYING APPARATUS AND METHOD Expired FR2509755B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US28376481A 1981-07-16 1981-07-16

Publications (2)

Publication Number Publication Date
FR2509755A1 FR2509755A1 (en) 1983-01-21
FR2509755B1 true FR2509755B1 (en) 1985-11-08

Family

ID=23087455

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8212350A Expired FR2509755B1 (en) 1981-07-16 1982-07-15 HIGH SPEED CATHODE SPRAYING APPARATUS AND METHOD

Country Status (11)

Country Link
JP (1) JPS5825476A (en)
KR (1) KR890001032B1 (en)
BR (1) BR8204080A (en)
DE (1) DE3226717A1 (en)
FR (1) FR2509755B1 (en)
GB (1) GB2101638B (en)
IE (1) IE53214B1 (en)
IT (1) IT1148359B (en)
MX (1) MX152639A (en)
NL (1) NL8202878A (en)
PT (1) PT75222B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2773203C1 (en) * 2021-07-28 2022-05-31 Акционерное общество "Пермский завод "Машиностроитель" Device for protecting the walls of the vacuum chamber from spraying

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2125441A (en) * 1982-07-13 1984-03-07 Christopher Elphick Tunnel magnetron for cathode sputtering
US4444643A (en) * 1982-09-03 1984-04-24 Gartek Systems, Inc. Planar magnetron sputtering device
JPS60149681U (en) * 1984-03-15 1985-10-04 ダイコク電機株式会社 Rental machine for pachinko halls
JPH0772349B2 (en) * 1987-05-12 1995-08-02 住友電気工業株式会社 Method and apparatus for producing large area compound thin film
US4885070A (en) * 1988-02-12 1989-12-05 Leybold Aktiengesellschaft Method and apparatus for the application of materials
CH687111A5 (en) * 1992-05-26 1996-09-13 Balzers Hochvakuum A method for generating a low voltage discharge, vacuum treatment system here, as well as for application of the method.
JP2001343309A (en) * 2000-06-01 2001-12-14 Kawasaki Steel Corp Pretreating method for metal analytical sample, and its device
US7528395B2 (en) 2002-09-19 2009-05-05 Asml Netherlands B.V. Radiation source, lithographic apparatus and device manufacturing method
DE102004027897A1 (en) * 2004-06-09 2006-01-05 Leybold Optics Gmbh Apparatus and method for atomization with a movable planar target
KR100844375B1 (en) * 2007-01-16 2008-07-07 (주)아이씨디 Plasma processing apparatus having radio frequency shield
JP2018517846A (en) * 2015-06-05 2018-07-05 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Sputter deposition source, sputtering apparatus and method of operating them
DE102020100061A1 (en) 2020-01-03 2021-07-08 Schott Ag Cooling device and cooling method for sputtering targets
CN112626458A (en) * 2020-12-08 2021-04-09 深圳市华星光电半导体显示技术有限公司 Magnetron sputtering device
WO2023274558A1 (en) 2021-07-02 2023-01-05 Schott Ag Cooling device and cooling method for sputter targets

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE705794C (en) * 1937-04-29 1941-05-09 Bernhard Berghaus Method and device for cathode sputtering
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3590777A (en) * 1969-03-13 1971-07-06 United Aircarft Corp Ingot feed drive
GB1354702A (en) * 1970-02-12 1974-06-05 Baxter Ltd Alexander Methods of and means for vacuum deposition
DE2301593C3 (en) * 1972-11-23 1979-05-03 Balzers Hochvakuum Gmbh, 6200 Wiesbaden Changing device for targets for cathode sputtering
DE2528108B2 (en) * 1975-06-24 1977-11-03 Siemens AG, 1000 Berlin und 8000 München METHOD FOR APPLYING ELECTRICALLY CONDUCTIVE LAYERS TO A SURFACE
DE2707144A1 (en) * 1976-02-19 1977-08-25 Sloan Technology Corp Cathode sputtering device with magnetic equipment - which can be displaced to move the area of sputtering over an extended surface by relative movement
DE2856930A1 (en) * 1977-06-23 1981-02-12 H Hessner A DEVICE FOR ABSORBING URINE WITH INCONTINENT PERSONS
US4142958A (en) * 1978-04-13 1979-03-06 Litton Systems, Inc. Method for fabricating multi-layer optical films
DE2832719A1 (en) * 1978-07-26 1980-02-07 Basf Ag ARRANGEMENT FOR COMPENSATING UNEQUAL WRITING AREAS IN MAGNETIC DATA STORAGE DEVICES, ESPECIALLY IN MAGNETIC DISK STORAGE
DE2903291A1 (en) * 1979-01-29 1980-08-07 Siemens Ag Alternating metallisation and polymer coating in capacitor mfr. - by sputtering and glow discharge polymerisation of gaseous monomer in vacuum vessel
JPS57120668A (en) * 1981-01-16 1982-07-27 Matsushita Electric Ind Co Ltd Method and apparatus for forming thin polymer film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2773203C1 (en) * 2021-07-28 2022-05-31 Акционерное общество "Пермский завод "Машиностроитель" Device for protecting the walls of the vacuum chamber from spraying

Also Published As

Publication number Publication date
IT1148359B (en) 1986-12-03
PT75222A (en) 1982-08-01
MX152639A (en) 1985-10-02
NL8202878A (en) 1983-02-16
JPH0236675B2 (en) 1990-08-20
GB2101638B (en) 1985-07-24
KR840000665A (en) 1984-02-25
IE821649L (en) 1983-01-16
FR2509755A1 (en) 1983-01-21
KR890001032B1 (en) 1989-04-20
PT75222B (en) 1984-11-19
JPS5825476A (en) 1983-02-15
BR8204080A (en) 1983-07-05
IT8248820A0 (en) 1982-07-15
DE3226717A1 (en) 1983-02-03
IE53214B1 (en) 1988-08-31
DE3226717C2 (en) 1988-10-06
GB2101638A (en) 1983-01-19

Similar Documents

Publication Publication Date Title
BE887806A (en) PHOTOMETRY APPARATUS AND METHOD
FR2572662B1 (en) METHOD AND APPARATUS FOR AUTOMATIC COATING BY ELECTROSTATIC SPRAYING
FR2498442B1 (en) RADIOSCOPY METHOD AND APPARATUS
BE882965A (en) ELECTROSTATIC PAINTING PROCESS AND APPARATUS
BE870092A (en) SPRAY COATING PROCESS
BE888465A (en) WELDING METHOD AND DEVICE,
IT8022674A0 (en) METHOD AND APPARATUS FOR PLASMA SPRAYING.
FR2551222B1 (en) LOGGING APPARATUS AND METHOD
BE873899A (en) METHOD AND APPARATUS FOR COATING SHEETS
FR2509755B1 (en) HIGH SPEED CATHODE SPRAYING APPARATUS AND METHOD
OA07068A (en) Acoustic logging method and apparatus.
AT376950B (en) DEVICE ON AXLE WRAPPING MACHINES
BE890520A (en) COATING METHOD AND APPARATUS
BE867221A (en) METHOD AND APPARATUS FOR SPRAYING METALS BY FUSION
FR2492297B1 (en) ELECTRO-EROSION DRILLING METHOD AND APPARATUS
BR8007386A (en) PROCESS AND APPARATUS FOR ITEMING
FR2553310B1 (en) PLASMA JET CLEANING APPARATUS AND METHOD
BE870001A (en) SPRAY DRYING APPARATUS AND METHOD
FR2499430B1 (en) ELECTROSTATIC SPRAYING PROCESS AND APPARATUS
FR2491056B1 (en) SINTERING METHOD AND APPARATUS
FR2506018B1 (en) METHOD AND APPARATUS FOR MONITORING ROD-SHAPED ARTICLES
BE885850A (en) SECOND ORDER SPEED ERROR CORRECTION APPARATUS AND METHOD
FR2418099B1 (en) STEREOPHOTOGRAPHIC SCULPTURE PROCESS
FR2548157B1 (en) METHOD AND APPARATUS FOR PALLETIZING SHEET PACKETS
FR2441199B1 (en) ELECTROSTATIC RADIOGRAPHY METHOD AND APPARATUS

Legal Events

Date Code Title Description
TP Transmission of property
ST Notification of lapse