FR2504732A1 - Transistor tunnel a double heterojonction - Google Patents
Transistor tunnel a double heterojonction Download PDFInfo
- Publication number
- FR2504732A1 FR2504732A1 FR8108341A FR8108341A FR2504732A1 FR 2504732 A1 FR2504732 A1 FR 2504732A1 FR 8108341 A FR8108341 A FR 8108341A FR 8108341 A FR8108341 A FR 8108341A FR 2504732 A1 FR2504732 A1 FR 2504732A1
- Authority
- FR
- France
- Prior art keywords
- layer
- tunnel
- semiconductor material
- transistor according
- tunnel transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000000694 effects Effects 0.000 claims abstract description 17
- 239000004065 semiconductor Substances 0.000 claims abstract description 17
- 239000000463 material Substances 0.000 claims abstract description 14
- 238000005036 potential barrier Methods 0.000 claims abstract description 10
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 14
- 238000001465 metallisation Methods 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 9
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 238000002513 implantation Methods 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 3
- 230000004888 barrier function Effects 0.000 description 14
- 238000010586 diagram Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000005669 field effect Effects 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000005610 quantum mechanics Effects 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/213—Channel regions of field-effect devices
- H10D62/221—Channel regions of field-effect devices of FETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
- H10D30/871—Vertical FETs having Schottky gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/82—Heterojunctions
- H10D62/824—Heterojunctions comprising only Group III-V materials heterojunctions, e.g. GaN/AlGaN heterojunctions
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8108341A FR2504732A1 (fr) | 1981-04-27 | 1981-04-27 | Transistor tunnel a double heterojonction |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8108341A FR2504732A1 (fr) | 1981-04-27 | 1981-04-27 | Transistor tunnel a double heterojonction |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2504732A1 true FR2504732A1 (fr) | 1982-10-29 |
| FR2504732B1 FR2504732B1 (enExample) | 1985-01-25 |
Family
ID=9257813
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8108341A Granted FR2504732A1 (fr) | 1981-04-27 | 1981-04-27 | Transistor tunnel a double heterojonction |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2504732A1 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0191201A1 (en) * | 1985-01-28 | 1986-08-20 | Koninklijke Philips Electronics N.V. | Semiconductor device with bidimensional charge carrier gas |
| EP0170044A3 (en) * | 1984-07-02 | 1987-08-19 | Texas Instruments Incorporated | Quantum-coupled device |
| EP0183474A3 (en) * | 1984-11-19 | 1987-10-21 | Fujitsu Limited | Semiconductor device |
| EP0316139A3 (en) * | 1987-11-10 | 1990-01-10 | Fujitsu Limited | Resonant tunelling barrier structure device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2072114A1 (enExample) * | 1969-12-30 | 1971-09-24 | Ibm | |
| FR2394174A1 (fr) * | 1977-06-09 | 1979-01-05 | Ibm | Dispositif a semi-conducteur du type transistor a heterojonctions a grande vitesse |
| GB1573310A (en) * | 1977-02-09 | 1980-08-20 | Mullard Ltd | Transistors |
-
1981
- 1981-04-27 FR FR8108341A patent/FR2504732A1/fr active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2072114A1 (enExample) * | 1969-12-30 | 1971-09-24 | Ibm | |
| GB1573310A (en) * | 1977-02-09 | 1980-08-20 | Mullard Ltd | Transistors |
| FR2394174A1 (fr) * | 1977-06-09 | 1979-01-05 | Ibm | Dispositif a semi-conducteur du type transistor a heterojonctions a grande vitesse |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0170044A3 (en) * | 1984-07-02 | 1987-08-19 | Texas Instruments Incorporated | Quantum-coupled device |
| EP0183474A3 (en) * | 1984-11-19 | 1987-10-21 | Fujitsu Limited | Semiconductor device |
| US4903090A (en) * | 1984-11-19 | 1990-02-20 | Fujitsu Limited | Semiconductor device |
| EP0191201A1 (en) * | 1985-01-28 | 1986-08-20 | Koninklijke Philips Electronics N.V. | Semiconductor device with bidimensional charge carrier gas |
| EP0316139A3 (en) * | 1987-11-10 | 1990-01-10 | Fujitsu Limited | Resonant tunelling barrier structure device |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2504732B1 (enExample) | 1985-01-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |