FR2488049A1 - Source lumineuse a jonction semiconductrice, notamment source-laser, utilisant des diodes schottky, et procede de fabrication - Google Patents
Source lumineuse a jonction semiconductrice, notamment source-laser, utilisant des diodes schottky, et procede de fabrication Download PDFInfo
- Publication number
- FR2488049A1 FR2488049A1 FR8016947A FR8016947A FR2488049A1 FR 2488049 A1 FR2488049 A1 FR 2488049A1 FR 8016947 A FR8016947 A FR 8016947A FR 8016947 A FR8016947 A FR 8016947A FR 2488049 A1 FR2488049 A1 FR 2488049A1
- Authority
- FR
- France
- Prior art keywords
- layer
- contact
- metal
- source
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 title claims description 11
- 238000004519 manufacturing process Methods 0.000 title description 4
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 23
- 238000002347 injection Methods 0.000 claims abstract description 9
- 239000007924 injection Substances 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims description 7
- 239000010931 gold Substances 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 238000003486 chemical etching Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 229910002065 alloy metal Inorganic materials 0.000 claims description 3
- 239000000243 solution Substances 0.000 claims description 3
- 238000005275 alloying Methods 0.000 claims description 2
- 238000000407 epitaxy Methods 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229910001297 Zn alloy Inorganic materials 0.000 claims 1
- 239000004020 conductor Substances 0.000 claims 1
- 230000007717 exclusion Effects 0.000 claims 1
- 239000007791 liquid phase Substances 0.000 claims 1
- 239000011701 zinc Substances 0.000 description 10
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 229910052725 zinc Inorganic materials 0.000 description 5
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 239000002800 charge carrier Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229910017401 Au—Ge Inorganic materials 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 229910018137 Al-Zn Inorganic materials 0.000 description 1
- 229910018573 Al—Zn Inorganic materials 0.000 description 1
- 235000016936 Dendrocalamus strictus Nutrition 0.000 description 1
- 101100346656 Drosophila melanogaster strat gene Proteins 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 150000001485 argon Chemical class 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- SAOPTAQUONRHEV-UHFFFAOYSA-N gold zinc Chemical compound [Zn].[Au] SAOPTAQUONRHEV-UHFFFAOYSA-N 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/832—Electrodes characterised by their material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04252—Electrodes, e.g. characterised by the structure characterised by the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/3235—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/831—Electrodes characterised by their shape
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8016947A FR2488049A1 (fr) | 1980-07-31 | 1980-07-31 | Source lumineuse a jonction semiconductrice, notamment source-laser, utilisant des diodes schottky, et procede de fabrication |
US06/283,631 US4441187A (en) | 1980-07-31 | 1981-07-15 | A semiconductor laser light source |
EP81401160A EP0045678B1 (fr) | 1980-07-31 | 1981-07-21 | Source laser à jonction semiconductrice utilisant des diodes Schottky, et procédé de fabrication |
CA000382143A CA1177149A (en) | 1980-07-31 | 1981-07-21 | Light source with a semiconductor junction, particularly a laser source and a process for producing such a source |
DE8181401160T DE3168477D1 (en) | 1980-07-31 | 1981-07-21 | Laser source with semiconductor junction using schottky diodes, and production method |
JP56120001A JPS5753990A (en:Method) | 1980-07-31 | 1981-07-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8016947A FR2488049A1 (fr) | 1980-07-31 | 1980-07-31 | Source lumineuse a jonction semiconductrice, notamment source-laser, utilisant des diodes schottky, et procede de fabrication |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2488049A1 true FR2488049A1 (fr) | 1982-02-05 |
FR2488049B1 FR2488049B1 (en:Method) | 1984-01-06 |
Family
ID=9244763
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8016947A Granted FR2488049A1 (fr) | 1980-07-31 | 1980-07-31 | Source lumineuse a jonction semiconductrice, notamment source-laser, utilisant des diodes schottky, et procede de fabrication |
Country Status (6)
Country | Link |
---|---|
US (1) | US4441187A (en:Method) |
EP (1) | EP0045678B1 (en:Method) |
JP (1) | JPS5753990A (en:Method) |
CA (1) | CA1177149A (en:Method) |
DE (1) | DE3168477D1 (en:Method) |
FR (1) | FR2488049A1 (en:Method) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3332398A1 (de) * | 1983-09-08 | 1985-03-28 | Standard Elektrik Lorenz Ag, 7000 Stuttgart | Multimodenlaser |
EP0170481B1 (en) * | 1984-07-24 | 1991-01-16 | Nec Corporation | Semiconductor light emitting device |
DE3838016A1 (de) * | 1988-11-09 | 1990-05-10 | Siemens Ag | Halbleiterlaser im system gaa1inas |
US5309001A (en) * | 1991-11-25 | 1994-05-03 | Sharp Kabushiki Kaisha | Light-emitting diode having a surface electrode of a tree-like form |
US5388116A (en) * | 1992-09-25 | 1995-02-07 | The Furukawa Electric Co., Ltd. | Semiconductor laser device |
JP4189610B2 (ja) | 1998-05-08 | 2008-12-03 | ソニー株式会社 | 光電変換素子およびその製造方法 |
US6228673B1 (en) * | 1999-05-13 | 2001-05-08 | Hughes Electronics Corporation | Method of fabricating a surface coupled InGaAs photodetector |
US6791119B2 (en) * | 2001-02-01 | 2004-09-14 | Cree, Inc. | Light emitting diodes including modifications for light extraction |
US6740906B2 (en) * | 2001-07-23 | 2004-05-25 | Cree, Inc. | Light emitting diodes including modifications for submount bonding |
US7211833B2 (en) * | 2001-07-23 | 2007-05-01 | Cree, Inc. | Light emitting diodes including barrier layers/sublayers |
US20030090103A1 (en) * | 2001-11-09 | 2003-05-15 | Thomas Becker | Direct mailing device |
RU2230411C2 (ru) * | 2002-04-16 | 2004-06-10 | Федеральное государственное унитарное предприятие "Научно-исследовательский институт "Полюс" им.М.Ф.Стельмаха | Инжекционный лазер |
CN100347866C (zh) * | 2002-07-22 | 2007-11-07 | 克里公司 | 包括阻挡层/子层的发光二极管及其制造方法 |
JP2009158550A (ja) * | 2007-12-25 | 2009-07-16 | Sony Corp | 半導体発光素子及びこれを用いた表示装置 |
DE102008014092A1 (de) * | 2007-12-27 | 2009-07-02 | Osram Opto Semiconductors Gmbh | Kantenemittierender Halbleiterlaserchip mit einem strukturierten Kontaktstreifen |
DE102016125857B4 (de) * | 2016-12-29 | 2022-05-05 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterlaserdiode |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4048627A (en) * | 1975-11-17 | 1977-09-13 | Rca Corporation | Electroluminescent semiconductor device having a restricted current flow |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4149175A (en) * | 1975-06-20 | 1979-04-10 | Matsushita Electric Industrial Co., Ltd. | Solidstate light-emitting device |
US4206468A (en) * | 1976-05-11 | 1980-06-03 | Thomson-Csf | Contacting structure on a semiconductor arrangement |
FR2394894A1 (fr) * | 1977-06-17 | 1979-01-12 | Thomson Csf | Dispositif de prise de contact sur un element semiconducteur |
US4182995A (en) * | 1978-03-16 | 1980-01-08 | Rca Corporation | Laser diode with thermal conducting, current confining film |
DE2856507A1 (de) * | 1978-12-28 | 1980-07-17 | Amann Markus Christian Dipl In | Halbleiter-laserdiode |
-
1980
- 1980-07-31 FR FR8016947A patent/FR2488049A1/fr active Granted
-
1981
- 1981-07-15 US US06/283,631 patent/US4441187A/en not_active Expired - Lifetime
- 1981-07-21 EP EP81401160A patent/EP0045678B1/fr not_active Expired
- 1981-07-21 DE DE8181401160T patent/DE3168477D1/de not_active Expired
- 1981-07-21 CA CA000382143A patent/CA1177149A/en not_active Expired
- 1981-07-30 JP JP56120001A patent/JPS5753990A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4048627A (en) * | 1975-11-17 | 1977-09-13 | Rca Corporation | Electroluminescent semiconductor device having a restricted current flow |
Also Published As
Publication number | Publication date |
---|---|
EP0045678A2 (fr) | 1982-02-10 |
JPS5753990A (en:Method) | 1982-03-31 |
DE3168477D1 (en) | 1985-03-07 |
EP0045678B1 (fr) | 1985-01-23 |
CA1177149A (en) | 1984-10-30 |
EP0045678A3 (en) | 1982-02-24 |
US4441187A (en) | 1984-04-03 |
FR2488049B1 (en:Method) | 1984-01-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2488049A1 (fr) | Source lumineuse a jonction semiconductrice, notamment source-laser, utilisant des diodes schottky, et procede de fabrication | |
EP0236189B1 (fr) | Structure semi-conductrice monolithique d'un transistor bipolaire à hétérojonction et d'un laser | |
FR2784795A1 (fr) | Structure comportant une couche mince de materiau composee de zones conductrices et de zones isolantes et procede de fabrication d'une telle structure | |
EP0566494B1 (fr) | Cavité laser à hétérostructure semi-conductrice dissymétrique à pompage électronique | |
CA2194004A1 (fr) | Procede de fabrication d'un laser semi-conducteur a emission par la surface | |
FR2695761A1 (fr) | Procédé de fabrication de dispositifs électro-optiques à ruban, notamment de lasers, et dispositifs ainsi obtenus. | |
EP0188147B1 (fr) | Procédé de fabrication d'un laser à semiconducteur à ruban enterré | |
FR2736211A1 (fr) | Procede de fabrication de dispositifs a semi-conducteur a haute resistance, pour couches d'arret de courant | |
EP1483793B1 (fr) | Diode schottky de puissance a substrat sicoi, et procede de realisation d'une telle diode | |
EP0232662B1 (fr) | Structure semi-conductrice monolithique d'un laser et d'un transistor à effet de champ et son procédé de fabrication | |
FR2468208A1 (fr) | Dispositif semiconducteur avec une diode zener | |
FR2656955A1 (fr) | Structure a semiconducteurs pour composant optoelectronique. | |
FR2687857A1 (fr) | Laser a semiconducteurs et procede de fabrication. | |
FR2604828A1 (fr) | Procede de fabrication d'une diode p+nn+ et d'un transistor bipolaire comportant cette diode, utilisant l'effet de neutralisation des atomes donneurs par l'hydrogene atomique | |
FR2724068A1 (fr) | Dispositif laser a semi-conducteur et procede de fabrication du dispositif laser a semi-conducteur | |
US5917243A (en) | Semiconductor device having ohmic electrode and method of manufacturing the same | |
EP4254520B1 (fr) | Diode electroluminescente a injection electrique optimisee depuis une electrode laterale | |
EP0096613B1 (fr) | Dispositif semi-conducteur photoémetteur de type laser à guidage par gradient d'indice, et procédé de réalisation d'un tel dispositif | |
JP3464629B2 (ja) | p型コンタクト電極装置および発光装置 | |
EP0218518A1 (fr) | Procédé de réalisation d'un laser à semiconducteur à ruban enterré avec ou sans réseau de diffraction et laser obtenu par ce procédé | |
JP2993654B2 (ja) | 電極構造 | |
FR2485823A1 (fr) | Laser semi-conducteur | |
JPH08274413A (ja) | 半導体デバイス及びその製造方法 | |
JPH07193216A (ja) | 電極構造およびその製造方法 | |
EP1233494A1 (fr) | Laser semi conducteur a ruban enterré et procédé de fabrication |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TP | Transmission of property | ||
TP | Transmission of property |