FR2469476A1 - Procede pour appliquer un doublage de cuivre sur des tableaux a circuits imprimes et d'autres supports non metalliques - Google Patents

Procede pour appliquer un doublage de cuivre sur des tableaux a circuits imprimes et d'autres supports non metalliques

Info

Publication number
FR2469476A1
FR2469476A1 FR8023693A FR8023693A FR2469476A1 FR 2469476 A1 FR2469476 A1 FR 2469476A1 FR 8023693 A FR8023693 A FR 8023693A FR 8023693 A FR8023693 A FR 8023693A FR 2469476 A1 FR2469476 A1 FR 2469476A1
Authority
FR
France
Prior art keywords
printed circuit
circuit boards
copper lining
applying copper
metallic media
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR8023693A
Other languages
English (en)
French (fr)
Other versions
FR2469476B1 (en:Method
Inventor
Thomas P Malak
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Harshaw Chemical Co
Original Assignee
Harshaw Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Harshaw Chemical Co filed Critical Harshaw Chemical Co
Publication of FR2469476A1 publication Critical patent/FR2469476A1/fr
Application granted granted Critical
Publication of FR2469476B1 publication Critical patent/FR2469476B1/fr
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
FR8023693A 1979-11-09 1980-11-06 Procede pour appliquer un doublage de cuivre sur des tableaux a circuits imprimes et d'autres supports non metalliques Granted FR2469476A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/093,081 US4242181A (en) 1979-11-09 1979-11-09 Copper plating process for printed circuit boards

Publications (2)

Publication Number Publication Date
FR2469476A1 true FR2469476A1 (fr) 1981-05-22
FR2469476B1 FR2469476B1 (en:Method) 1984-12-14

Family

ID=22236909

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8023693A Granted FR2469476A1 (fr) 1979-11-09 1980-11-06 Procede pour appliquer un doublage de cuivre sur des tableaux a circuits imprimes et d'autres supports non metalliques

Country Status (7)

Country Link
US (1) US4242181A (en:Method)
JP (1) JPS5684494A (en:Method)
CA (1) CA1142263A (en:Method)
DE (1) DE3041962A1 (en:Method)
FR (1) FR2469476A1 (en:Method)
GB (1) GB2062681B (en:Method)
NL (1) NL8006113A (en:Method)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4695348A (en) * 1986-09-15 1987-09-22 Psi Star Copper etching process and product
US4990224A (en) * 1988-12-21 1991-02-05 International Business Machines Corporation Copper plating bath and process for difficult to plate metals
US4954226A (en) * 1988-12-21 1990-09-04 International Business Machines Corporation Additive plating bath and process
US5100518A (en) * 1990-12-20 1992-03-31 At&T Bell Laboratories Method and apparatus for plating insulating strip
US6024857A (en) 1997-10-08 2000-02-15 Novellus Systems, Inc. Electroplating additive for filling sub-micron features
CN113166962A (zh) 2018-11-07 2021-07-23 科文特亚股份有限公司 缎面铜浴和沉积缎面铜层的方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2029481A1 (en:Method) * 1969-01-27 1970-10-23 Kewanee Oil Co
US3769179A (en) * 1972-01-19 1973-10-30 Kewanee Oil Co Copper plating process for printed circuits

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2029481A1 (en:Method) * 1969-01-27 1970-10-23 Kewanee Oil Co
US3769179A (en) * 1972-01-19 1973-10-30 Kewanee Oil Co Copper plating process for printed circuits

Also Published As

Publication number Publication date
CA1142263A (en) 1983-03-01
FR2469476B1 (en:Method) 1984-12-14
JPS5684494A (en) 1981-07-09
JPS6314069B2 (en:Method) 1988-03-29
DE3041962A1 (de) 1981-05-21
GB2062681B (en) 1983-11-02
US4242181A (en) 1980-12-30
GB2062681A (en) 1981-05-28
NL8006113A (nl) 1981-06-01

Similar Documents

Publication Publication Date Title
HK28197A (en) Functional fluid additives for acid copper electroplating baths
GB1311130A (en) Photopolymerisable compositions and elements containing hetero cyclic nitrogen-containing compounds
FR2469476A1 (fr) Procede pour appliquer un doublage de cuivre sur des tableaux a circuits imprimes et d'autres supports non metalliques
GB1379849A (en) Copper plating process for printed circuits
ES8306194A1 (es) Un metodo para la deposicion de estano metalico brillante o de aleaciones de estano con cobre o rodio sobre un sustrato.
ES8505420A1 (es) Dispositivo de circulacion a contracorriente para un aparato de galvanoplastia
JPS5743995A (en) Silver plating liquid and silver plating method
DE3677093D1 (de) Entfernung von eisenablagerungen aus kuehlwasserkreislaeufen.
BE838335A (fr) Bain pour le depot galvanique d'alliages de palladium-nickel
Scholz et al. Distribution of selenium-dependent and nonselenium-dependent glutathione peroxidase activity in tissues of young cattle
DE3568594D1 (en) Method for plating from an electroless plating bath
GB1001634A (en) Electronic circuit boards
PL131794B3 (en) Cathode for electrolytic refining of copper
GB1456583A (en) Electroplating composition and process
ATE186443T1 (de) Kupferfolie für gedruckte schaltungen und verfahren zu ihrer herstellung
GB1327243A (en) Method of plating vinyl chloride resins
FR1304964A (fr) Procédé et bain pour le dépôt électrolytique du nickel
GB1531454A (en) Electroplated copper foil
KR910004273A (ko) 연속주조설비에 있어서의 전자기 교반기
GB1233505A (en:Method)
Kohl The Design and Implementation of High-Speed Solder Plating Baths
Jani et al. Farewell to pitting.
ES378675A1 (es) Procedimiento para la deposicion de revestimientos de ro- dio.
GB1247908A (en) Copperplating process and agents for use in this process
GB1299455A (en) Copper plating process for printed circuits

Legal Events

Date Code Title Description
ST Notification of lapse