ES8505420A1 - Dispositivo de circulacion a contracorriente para un aparato de galvanoplastia - Google Patents

Dispositivo de circulacion a contracorriente para un aparato de galvanoplastia

Info

Publication number
ES8505420A1
ES8505420A1 ES534120A ES534120A ES8505420A1 ES 8505420 A1 ES8505420 A1 ES 8505420A1 ES 534120 A ES534120 A ES 534120A ES 534120 A ES534120 A ES 534120A ES 8505420 A1 ES8505420 A1 ES 8505420A1
Authority
ES
Spain
Prior art keywords
strip
plating
anodes
flow device
counter flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES534120A
Other languages
English (en)
Other versions
ES534120A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Publication of ES8505420A1 publication Critical patent/ES8505420A1/es
Publication of ES534120A0 publication Critical patent/ES534120A0/es
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0635In radial cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

DISPOSITIVO DE CIRCULACION A CONTRACORRIENTE PARA UN APARATO DE GALVANOPLASTICA.CONSTA DE UN TAMBOR GIRATORIO, INMERSO EN UNA SOLUCION ELECTROLITICA, ALREDEDOR DEL CUAL HAY UNA TIRA METALICA SINCRONIZADA CON LA ROTACION DEL TAMBOR Y ANODOS SEPARADOS POR INTERVALOS RADIALES. EXISTE UNA TOBERA (6) EN EL FONDO DEL BAN/O, ORIENTADA EN DIRECCION OPUESTA A LA ENTRADA DE LIQUIDO.
ES534120A 1983-10-07 1984-07-06 Dispositivo de circulacion a contracorriente para un aparato de galvanoplastia Granted ES534120A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58186883A JPS6082700A (ja) 1983-10-07 1983-10-07 ラジアルセル型めつき槽におけるカウンタ−フロ−装置

Publications (2)

Publication Number Publication Date
ES8505420A1 true ES8505420A1 (es) 1985-05-16
ES534120A0 ES534120A0 (es) 1985-05-16

Family

ID=16196346

Family Applications (1)

Application Number Title Priority Date Filing Date
ES534120A Granted ES534120A0 (es) 1983-10-07 1984-07-06 Dispositivo de circulacion a contracorriente para un aparato de galvanoplastia

Country Status (5)

Country Link
US (1) US4500400A (es)
EP (1) EP0140474B1 (es)
JP (1) JPS6082700A (es)
DE (1) DE3462613D1 (es)
ES (1) ES534120A0 (es)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1182818B (it) * 1985-08-12 1987-10-05 Centro Speriment Metallurg Dispositivo a cella radiale per elettrodeposizione
US4661213A (en) * 1986-02-13 1987-04-28 Dorsett Terry E Electroplate to moving metal
FR2607153B1 (fr) * 1986-05-05 1989-04-07 Lorraine Laminage Injecteur d'electrolyte a contre-courant pour une installation de traitement continu de surface
LU86520A1 (fr) * 1986-07-17 1988-02-02 Delloye Matthieu Procede d'electrozingage en continu d'une tole d'acier par voie electrolytique
JPS6398371U (es) * 1986-12-12 1988-06-25
JPH08993B2 (ja) * 1987-03-17 1996-01-10 川崎製鉄株式会社 金属ストリツプの電解処理装置
NL8802353A (nl) * 1988-09-23 1990-04-17 Hoogovens Groep Bv Werkwijze voor het eenzijdig elektrolytisch bekleden van een bewegende metaalband.
JP2549557B2 (ja) * 1989-03-14 1996-10-30 富士写真フイルム株式会社 電解処理装置
FR2653787B1 (fr) * 1989-10-27 1992-02-14 Lorraine Laminage Installation et procede de revetement electrolytique d'une bande metallique.
JPH0814037B2 (ja) * 1990-09-11 1996-02-14 大正工業株式会社 電解処理装置
US5069762A (en) * 1991-01-18 1991-12-03 Usx Corporation Appartaus for improved current transfer in radial cell electroplating
FR2771757B1 (fr) 1997-12-03 1999-12-31 Lorraine Laminage Installation d'electrodeposition, electrode et organe d'appui pour cette installation et procede d'electrodeposition
IT1303624B1 (it) * 1998-07-22 2000-11-15 Techint Spa Dispositivo per elettrodeposizione a cella circonferenziale a flussidifferenziati.
KR100733370B1 (ko) * 2001-07-12 2007-06-28 주식회사 포스코 전기도금시 스트립간 도금편차 발생 방지 장치
WO2008018471A1 (fr) * 2006-08-07 2008-02-14 Autonetworks Technologies, Ltd. Procédé de placage partiel, dispositif de placage au laser, et élément plaqué
CN108660501B (zh) * 2017-03-31 2024-02-27 可能可特科技(深圳)有限公司 一种基于fpc电镀的电镀槽
CN112301394B (zh) * 2020-10-30 2022-05-24 西北工业大学 一种可以提高环形件内表面电镀层均匀性的镀腔

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3483098A (en) * 1966-02-11 1969-12-09 United States Steel Corp Method and apparatus for electroplating a metallic strip
US3634223A (en) * 1970-02-25 1972-01-11 United States Steel Corp Contact assembly
DE2324834C2 (de) * 1973-05-17 1978-09-07 Dr. Eugen Duerrwaechter Doduco, 7530 Pforzheim Vorrichtung zum kontinuierlichen selektiven Bandgalvanisieren
US4064019A (en) * 1974-09-03 1977-12-20 Dixie Plating, Inc. Continuous contact plater method
GB1524985A (en) * 1975-08-26 1978-09-13 Inco Europ Ltd Electrolytic production of perforated metal foil
US4078982A (en) * 1976-03-15 1978-03-14 Dixie Plating, Inc. Apparatus for continuous contact plating
JPS55161520U (es) * 1979-05-07 1980-11-20
JPS5940237B2 (ja) * 1980-04-05 1984-09-28 川崎製鉄株式会社 ストリツプのラジアルセル通板めつき法
DE3108358C2 (de) * 1981-03-05 1985-08-29 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zum partiellen Galvanisieren von zu elektrisch leitenden Bändern, Streifen oder dgl. zusammengefaßten Teilen im Durchlaufverfahren
JPS59126793A (ja) * 1983-01-07 1984-07-21 Kawasaki Steel Corp ラジアルセル型めつき装置

Also Published As

Publication number Publication date
EP0140474A1 (en) 1985-05-08
JPS6256960B2 (es) 1987-11-27
EP0140474B1 (en) 1987-03-11
JPS6082700A (ja) 1985-05-10
US4500400A (en) 1985-02-19
DE3462613D1 (en) 1987-04-16
ES534120A0 (es) 1985-05-16

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19991108