FR2465241B1 - - Google Patents

Info

Publication number
FR2465241B1
FR2465241B1 FR7922587A FR7922587A FR2465241B1 FR 2465241 B1 FR2465241 B1 FR 2465241B1 FR 7922587 A FR7922587 A FR 7922587A FR 7922587 A FR7922587 A FR 7922587A FR 2465241 B1 FR2465241 B1 FR 2465241B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7922587A
Other languages
French (fr)
Other versions
FR2465241A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7922587A priority Critical patent/FR2465241A1/fr
Priority to EP80401270A priority patent/EP0025397B1/fr
Priority to DE8080401270T priority patent/DE3063902D1/de
Priority to US06/184,817 priority patent/US4370026A/en
Priority to JP12475680A priority patent/JPS5685724A/ja
Publication of FR2465241A1 publication Critical patent/FR2465241A1/fr
Application granted granted Critical
Publication of FR2465241B1 publication Critical patent/FR2465241B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7922587A 1979-09-10 1979-09-10 Dispositif illuminateur destine a fournir un faisceau d'eclairement a distribution d'intensite ajustable et systeme de transfert de motifs comprenant un tel dispositif Granted FR2465241A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR7922587A FR2465241A1 (fr) 1979-09-10 1979-09-10 Dispositif illuminateur destine a fournir un faisceau d'eclairement a distribution d'intensite ajustable et systeme de transfert de motifs comprenant un tel dispositif
EP80401270A EP0025397B1 (fr) 1979-09-10 1980-09-05 Dispositif illuminateur destiné à fournir un faisceau d'éclairement à distribution d'intensité ajustable et système de transfert de motifs comprenant un tel dispositif
DE8080401270T DE3063902D1 (en) 1979-09-10 1980-09-05 Illuminating means for producing a light beam having adjustable light intensity distribution and image transfer system comprising such a means
US06/184,817 US4370026A (en) 1979-09-10 1980-09-08 Illuminating device for providing an illumination beam with adjustable distribution of intensity and a pattern-transfer system comprising such a device
JP12475680A JPS5685724A (en) 1979-09-10 1980-09-10 Illuminator for producing lighting beam capable of light arrangement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7922587A FR2465241A1 (fr) 1979-09-10 1979-09-10 Dispositif illuminateur destine a fournir un faisceau d'eclairement a distribution d'intensite ajustable et systeme de transfert de motifs comprenant un tel dispositif

Publications (2)

Publication Number Publication Date
FR2465241A1 FR2465241A1 (fr) 1981-03-20
FR2465241B1 true FR2465241B1 (enFirst) 1983-08-05

Family

ID=9229522

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7922587A Granted FR2465241A1 (fr) 1979-09-10 1979-09-10 Dispositif illuminateur destine a fournir un faisceau d'eclairement a distribution d'intensite ajustable et systeme de transfert de motifs comprenant un tel dispositif

Country Status (5)

Country Link
US (1) US4370026A (enFirst)
EP (1) EP0025397B1 (enFirst)
JP (1) JPS5685724A (enFirst)
DE (1) DE3063902D1 (enFirst)
FR (1) FR2465241A1 (enFirst)

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JPS5879216A (ja) * 1981-11-06 1983-05-13 Hitachi Ltd ２ビ−ム走査光学系
DE3212393A1 (de) * 1982-04-02 1983-10-13 Karl Süss KG, Präzisionsgeräte für Wissenschaft und Industrie - GmbH & Co, 8046 Garching Verfahren zur interferenzverschmierung sowie ausrichtverfahren und -vorrichtung
US4491383A (en) * 1982-09-20 1985-01-01 Centro Ricerche Fiat S.P.A. Device for modifying and uniforming the distribution of the intensity of a power laser beam
JPS59165002A (ja) * 1983-03-11 1984-09-18 Canon Inc 光学素子及びこれを用いた光学装置
US4523809A (en) * 1983-08-04 1985-06-18 The United States Of America As Represented By The Secretary Of The Air Force Method and apparatus for generating a structured light beam array
JPS6052873A (ja) * 1983-09-01 1985-03-26 Canon Inc 光ビ−ム記録装置
US4793694A (en) * 1986-04-23 1988-12-27 Quantronix Corporation Method and apparatus for laser beam homogenization
US4911711A (en) * 1986-12-05 1990-03-27 Taunton Technologies, Inc. Sculpture apparatus for correcting curvature of the cornea
US4842277A (en) * 1987-05-20 1989-06-27 Lacroix Eugene F Multi-purpose baton
JPH0734069B2 (ja) * 1987-07-08 1995-04-12 富士写真フイルム株式会社 位相同期半導体レ−ザ光学系
US4912614A (en) * 1987-12-23 1990-03-27 North American Philips Corporation Light valve projection system with non imaging optics for illumination
US4976520A (en) * 1988-09-09 1990-12-11 Grumman Aerospace Corporation Common path multichannel optical processor
JP2732498B2 (ja) * 1988-11-24 1998-03-30 株式会社日立製作所 縮小投影式露光方法及びその装置
US5253110A (en) * 1988-12-22 1993-10-12 Nikon Corporation Illumination optical arrangement
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
CA2065368A1 (en) * 1989-08-21 1991-02-22 Carl R. Amos Methods of and apparatus for manipulating electromagnetic phenomenon
US5638211A (en) 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
US7656504B1 (en) * 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method
US6885433B2 (en) * 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
US6897942B2 (en) * 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6252647B1 (en) 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US6710855B2 (en) 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US5719704A (en) * 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
US5592328A (en) * 1991-04-19 1997-01-07 Edge Scientific Instrument Company Llc Illumination system and method for a high definition light microscope
DE4132068A1 (de) * 1991-09-26 1993-04-22 Raith Gmbh Optimierte lithographie fuer die integrierte optik
JP3267414B2 (ja) * 1993-11-11 2002-03-18 キヤノン株式会社 走査型露光装置及び該走査型露光装置を用いるデバイス製造方法
JPH07226559A (ja) * 1994-02-09 1995-08-22 Matsushita Electric Ind Co Ltd レーザ照射装置
US5557475A (en) * 1994-07-12 1996-09-17 Coherent, Inc. Optical system for improving the symmetry of the beam emitted from a broad area laser diode
US5699191A (en) * 1996-10-24 1997-12-16 Xerox Corporation Narrow-pitch beam homogenizer
DE69931690T2 (de) * 1998-04-08 2007-06-14 Asml Netherlands B.V. Lithographischer Apparat
US6930754B1 (en) * 1998-06-30 2005-08-16 Canon Kabushiki Kaisha Multiple exposure method
DE19829612A1 (de) * 1998-07-02 2000-01-05 Zeiss Carl Fa Beleuchtungssystem der Mikrolithographie mit Depolarisator
US6137631A (en) * 1999-03-12 2000-10-24 Kodak Polychrome Graphics Llc Illumination system and method for spatial modulators
US6542304B2 (en) * 1999-05-17 2003-04-01 Toolz, Ltd. Laser beam device with apertured reflective element
JP2001023918A (ja) * 1999-07-08 2001-01-26 Nec Corp 半導体薄膜形成装置
TW587199B (en) 1999-09-29 2004-05-11 Asml Netherlands Bv Lithographic method and apparatus
US6462883B1 (en) * 2000-08-23 2002-10-08 Apollo Instruments Inc. Optical coupling systems
US6556352B2 (en) * 2000-08-23 2003-04-29 Apollo Instruments Inc. Optical coupling system
WO2004025704A2 (en) * 2002-09-12 2004-03-25 Visotek, Inc. Contact lens package and storage case, holder, and system and method of making and using
EP2157480B1 (en) * 2003-04-09 2015-05-27 Nikon Corporation Exposure method and apparatus, and device manufacturing method
TWI609409B (zh) 2003-10-28 2017-12-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
EP1716457B9 (en) * 2004-01-16 2012-04-04 Carl Zeiss SMT GmbH Projection system with a polarization-modulating element having a variable thickness profile
US20070019179A1 (en) * 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US8270077B2 (en) * 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
TWI494972B (zh) 2004-02-06 2015-08-01 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
US20050205534A1 (en) * 2004-03-18 2005-09-22 Scott Caldwell Single and dual lensed optical waveguide for uniform welding
TWI453795B (zh) * 2005-01-21 2014-09-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
US8330938B2 (en) * 2009-02-27 2012-12-11 Corning Incorporated Solid-state array for lithography illumination
CN107290861A (zh) * 2017-08-01 2017-10-24 沈阳雷卓激光医疗器械有限公司 激光光束匀化装置及方法

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Publication number Priority date Publication date Assignee Title
US3584948A (en) * 1968-06-24 1971-06-15 Bell Telephone Labor Inc Apparatus and method for producing multiple images
DE2116713B2 (de) * 1971-04-06 1974-03-28 Ibm Deutschland Gmbh, 7000 Stuttgart Belichtungsverfahren zum Abbilden sehr fein strukturierter Lichtmuster auf Photolackschichten und dazu geeignete Belichtungsvorrichtung
FR2177475B1 (enFirst) * 1972-03-03 1974-12-13 Onera (Off Nat Aerospatiale)
US4023904A (en) * 1974-07-01 1977-05-17 Tamarack Scientific Co. Inc. Optical microcircuit printing process
US4024428A (en) * 1975-05-19 1977-05-17 Optical Associates, Incorporated Radiation-sensitive control circuit for driving lamp at various power levels
GB1549613A (en) * 1975-12-23 1979-08-08 Plessey Co Ltd Optical system for producing an area of light of even dispersion of illumination
US4109304A (en) * 1976-02-23 1978-08-22 Khvalovsky Vladimir Vasilievic Device for coherent lighting of objects
DE2608176A1 (de) * 1976-02-27 1977-09-01 Inst Zemnogo Magnetizma Ionosf Einrichtung zur kohaerenten beleuchtung von objekten
CA1090056A (en) * 1976-06-04 1980-11-25 Pierre C.E. Goffinet Textile treating compositions
FR2406236A1 (fr) * 1976-12-10 1979-05-11 Thomson Csf Dispositif optique a source coherente pour le transfert rapide de motifs sur substrats, applique a la realisation de composants et circuits a microstructures
JPS5945123B2 (ja) * 1977-07-08 1984-11-05 富士写真光機株式会社 線状照明法

Also Published As

Publication number Publication date
EP0025397A1 (fr) 1981-03-18
EP0025397B1 (fr) 1983-06-22
DE3063902D1 (en) 1983-07-28
US4370026A (en) 1983-01-25
JPS5685724A (en) 1981-07-13
FR2465241A1 (fr) 1981-03-20

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Legal Events

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