DE3063902D1 - Illuminating means for producing a light beam having adjustable light intensity distribution and image transfer system comprising such a means - Google Patents

Illuminating means for producing a light beam having adjustable light intensity distribution and image transfer system comprising such a means

Info

Publication number
DE3063902D1
DE3063902D1 DE8080401270T DE3063902T DE3063902D1 DE 3063902 D1 DE3063902 D1 DE 3063902D1 DE 8080401270 T DE8080401270 T DE 8080401270T DE 3063902 T DE3063902 T DE 3063902T DE 3063902 D1 DE3063902 D1 DE 3063902D1
Authority
DE
Germany
Prior art keywords
producing
intensity distribution
transfer system
image transfer
light beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080401270T
Other languages
English (en)
Inventor
Georges Dubroeucq
Michel Lacombat
Michele Brevignon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Application granted granted Critical
Publication of DE3063902D1 publication Critical patent/DE3063902D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE8080401270T 1979-09-10 1980-09-05 Illuminating means for producing a light beam having adjustable light intensity distribution and image transfer system comprising such a means Expired DE3063902D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7922587A FR2465241A1 (fr) 1979-09-10 1979-09-10 Dispositif illuminateur destine a fournir un faisceau d'eclairement a distribution d'intensite ajustable et systeme de transfert de motifs comprenant un tel dispositif

Publications (1)

Publication Number Publication Date
DE3063902D1 true DE3063902D1 (en) 1983-07-28

Family

ID=9229522

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080401270T Expired DE3063902D1 (en) 1979-09-10 1980-09-05 Illuminating means for producing a light beam having adjustable light intensity distribution and image transfer system comprising such a means

Country Status (5)

Country Link
US (1) US4370026A (de)
EP (1) EP0025397B1 (de)
JP (1) JPS5685724A (de)
DE (1) DE3063902D1 (de)
FR (1) FR2465241A1 (de)

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US5253110A (en) * 1988-12-22 1993-10-12 Nikon Corporation Illumination optical arrangement
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TWI609409B (zh) 2003-10-28 2017-12-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
CN101799637B (zh) * 2004-01-16 2012-07-04 卡尔蔡司Smt有限责任公司 照明光学装置、显微光刻投射系统及装置制造方法
US20070019179A1 (en) * 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US8270077B2 (en) * 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
TWI505329B (zh) * 2004-02-06 2015-10-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
US20050205534A1 (en) * 2004-03-18 2005-09-22 Scott Caldwell Single and dual lensed optical waveguide for uniform welding
TWI453796B (zh) * 2005-01-21 2014-09-21 尼康股份有限公司 偏光變更單元以及元件製造方法
US8330938B2 (en) * 2009-02-27 2012-12-11 Corning Incorporated Solid-state array for lithography illumination
CN107290861A (zh) * 2017-08-01 2017-10-24 沈阳雷卓激光医疗器械有限公司 激光光束匀化装置及方法

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FR2406236A1 (fr) * 1976-12-10 1979-05-11 Thomson Csf Dispositif optique a source coherente pour le transfert rapide de motifs sur substrats, applique a la realisation de composants et circuits a microstructures
JPS5945123B2 (ja) * 1977-07-08 1984-11-05 富士写真光機株式会社 線状照明法

Also Published As

Publication number Publication date
US4370026A (en) 1983-01-25
JPS5685724A (en) 1981-07-13
FR2465241B1 (de) 1983-08-05
EP0025397A1 (de) 1981-03-18
FR2465241A1 (fr) 1981-03-20
EP0025397B1 (de) 1983-06-22

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee