JPS5685724A - Illuminator for producing lighting beam capable of light arrangement - Google Patents

Illuminator for producing lighting beam capable of light arrangement

Info

Publication number
JPS5685724A
JPS5685724A JP12475680A JP12475680A JPS5685724A JP S5685724 A JPS5685724 A JP S5685724A JP 12475680 A JP12475680 A JP 12475680A JP 12475680 A JP12475680 A JP 12475680A JP S5685724 A JPS5685724 A JP S5685724A
Authority
JP
Japan
Prior art keywords
illuminator
light arrangement
beam capable
lighting beam
producing lighting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12475680A
Other languages
English (en)
Inventor
Deyuburoku Jiyorujiyu
Rakomuba Mishieru
Burebuinon Mishieru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of JPS5685724A publication Critical patent/JPS5685724A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
JP12475680A 1979-09-10 1980-09-10 Illuminator for producing lighting beam capable of light arrangement Pending JPS5685724A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7922587A FR2465241A1 (fr) 1979-09-10 1979-09-10 Dispositif illuminateur destine a fournir un faisceau d'eclairement a distribution d'intensite ajustable et systeme de transfert de motifs comprenant un tel dispositif

Publications (1)

Publication Number Publication Date
JPS5685724A true JPS5685724A (en) 1981-07-13

Family

ID=9229522

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12475680A Pending JPS5685724A (en) 1979-09-10 1980-09-10 Illuminator for producing lighting beam capable of light arrangement

Country Status (5)

Country Link
US (1) US4370026A (ja)
EP (1) EP0025397B1 (ja)
JP (1) JPS5685724A (ja)
DE (1) DE3063902D1 (ja)
FR (1) FR2465241A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6052873A (ja) * 1983-09-01 1985-03-26 Canon Inc 光ビ−ム記録装置
US5016149A (en) * 1988-11-24 1991-05-14 Hitachi, Ltd. Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the same

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5879216A (ja) * 1981-11-06 1983-05-13 Hitachi Ltd ２ビ−ム走査光学系
DE3212393A1 (de) * 1982-04-02 1983-10-13 Karl Süss KG, Präzisionsgeräte für Wissenschaft und Industrie - GmbH & Co, 8046 Garching Verfahren zur interferenzverschmierung sowie ausrichtverfahren und -vorrichtung
US4491383A (en) * 1982-09-20 1985-01-01 Centro Ricerche Fiat S.P.A. Device for modifying and uniforming the distribution of the intensity of a power laser beam
JPS59165002A (ja) * 1983-03-11 1984-09-18 Canon Inc 光学素子及びこれを用いた光学装置
US4523809A (en) * 1983-08-04 1985-06-18 The United States Of America As Represented By The Secretary Of The Air Force Method and apparatus for generating a structured light beam array
US4793694A (en) * 1986-04-23 1988-12-27 Quantronix Corporation Method and apparatus for laser beam homogenization
US4911711A (en) * 1986-12-05 1990-03-27 Taunton Technologies, Inc. Sculpture apparatus for correcting curvature of the cornea
US4842277A (en) * 1987-05-20 1989-06-27 Lacroix Eugene F Multi-purpose baton
JPH0734069B2 (ja) * 1987-07-08 1995-04-12 富士写真フイルム株式会社 位相同期半導体レ−ザ光学系
US4912614A (en) * 1987-12-23 1990-03-27 North American Philips Corporation Light valve projection system with non imaging optics for illumination
US4976520A (en) * 1988-09-09 1990-12-11 Grumman Aerospace Corporation Common path multichannel optical processor
US5253110A (en) * 1988-12-22 1993-10-12 Nikon Corporation Illumination optical arrangement
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
AU6294690A (en) * 1989-08-21 1991-04-03 Carl R. Amos Methods of and apparatus for manipulating electromagnetic phenomenon
US7656504B1 (en) 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US5638211A (en) 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
US6252647B1 (en) 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method
US6710855B2 (en) 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US5719704A (en) 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
US6897942B2 (en) * 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6885433B2 (en) * 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
US5592328A (en) * 1991-04-19 1997-01-07 Edge Scientific Instrument Company Llc Illumination system and method for a high definition light microscope
DE4132068A1 (de) * 1991-09-26 1993-04-22 Raith Gmbh Optimierte lithographie fuer die integrierte optik
JP3267414B2 (ja) * 1993-11-11 2002-03-18 キヤノン株式会社 走査型露光装置及び該走査型露光装置を用いるデバイス製造方法
JPH07226559A (ja) * 1994-02-09 1995-08-22 Matsushita Electric Ind Co Ltd レーザ照射装置
US5557475A (en) * 1994-07-12 1996-09-17 Coherent, Inc. Optical system for improving the symmetry of the beam emitted from a broad area laser diode
US5699191A (en) * 1996-10-24 1997-12-16 Xerox Corporation Narrow-pitch beam homogenizer
DE69931690T2 (de) * 1998-04-08 2007-06-14 Asml Netherlands B.V. Lithographischer Apparat
US6930754B1 (en) * 1998-06-30 2005-08-16 Canon Kabushiki Kaisha Multiple exposure method
DE19829612A1 (de) * 1998-07-02 2000-01-05 Zeiss Carl Fa Beleuchtungssystem der Mikrolithographie mit Depolarisator
US6137631A (en) * 1999-03-12 2000-10-24 Kodak Polychrome Graphics Llc Illumination system and method for spatial modulators
US6542304B2 (en) * 1999-05-17 2003-04-01 Toolz, Ltd. Laser beam device with apertured reflective element
JP2001023918A (ja) * 1999-07-08 2001-01-26 Nec Corp 半導体薄膜形成装置
TW587199B (en) 1999-09-29 2004-05-11 Asml Netherlands Bv Lithographic method and apparatus
US6462883B1 (en) * 2000-08-23 2002-10-08 Apollo Instruments Inc. Optical coupling systems
US6556352B2 (en) * 2000-08-23 2003-04-29 Apollo Instruments Inc. Optical coupling system
AU2003274969A1 (en) * 2002-09-12 2004-04-30 Visotek, Inc. Contact lens package and storage case, holder, and system and method of making and using
KR101484435B1 (ko) * 2003-04-09 2015-01-19 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI609409B (zh) 2003-10-28 2017-12-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
CN101799637B (zh) * 2004-01-16 2012-07-04 卡尔蔡司Smt有限责任公司 照明光学装置、显微光刻投射系统及装置制造方法
US20070019179A1 (en) * 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US8270077B2 (en) * 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
TWI505329B (zh) * 2004-02-06 2015-10-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
US20050205534A1 (en) * 2004-03-18 2005-09-22 Scott Caldwell Single and dual lensed optical waveguide for uniform welding
TWI453796B (zh) * 2005-01-21 2014-09-21 尼康股份有限公司 偏光變更單元以及元件製造方法
US8330938B2 (en) * 2009-02-27 2012-12-11 Corning Incorporated Solid-state array for lithography illumination
CN107290861A (zh) * 2017-08-01 2017-10-24 沈阳雷卓激光医疗器械有限公司 激光光束匀化装置及方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3584948A (en) * 1968-06-24 1971-06-15 Bell Telephone Labor Inc Apparatus and method for producing multiple images
DE2116713B2 (de) * 1971-04-06 1974-03-28 Ibm Deutschland Gmbh, 7000 Stuttgart Belichtungsverfahren zum Abbilden sehr fein strukturierter Lichtmuster auf Photolackschichten und dazu geeignete Belichtungsvorrichtung
FR2177475B1 (ja) * 1972-03-03 1974-12-13 Onera (Off Nat Aerospatiale)
US4023904A (en) * 1974-07-01 1977-05-17 Tamarack Scientific Co. Inc. Optical microcircuit printing process
US4024428A (en) * 1975-05-19 1977-05-17 Optical Associates, Incorporated Radiation-sensitive control circuit for driving lamp at various power levels
GB1549613A (en) * 1975-12-23 1979-08-08 Plessey Co Ltd Optical system for producing an area of light of even dispersion of illumination
US4109304A (en) * 1976-02-23 1978-08-22 Khvalovsky Vladimir Vasilievic Device for coherent lighting of objects
DE2608176A1 (de) * 1976-02-27 1977-09-01 Inst Zemnogo Magnetizma Ionosf Einrichtung zur kohaerenten beleuchtung von objekten
CA1090056A (en) * 1976-06-04 1980-11-25 Pierre C.E. Goffinet Textile treating compositions
FR2406236A1 (fr) * 1976-12-10 1979-05-11 Thomson Csf Dispositif optique a source coherente pour le transfert rapide de motifs sur substrats, applique a la realisation de composants et circuits a microstructures
JPS5945123B2 (ja) * 1977-07-08 1984-11-05 富士写真光機株式会社 線状照明法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6052873A (ja) * 1983-09-01 1985-03-26 Canon Inc 光ビ−ム記録装置
US5016149A (en) * 1988-11-24 1991-05-14 Hitachi, Ltd. Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the same

Also Published As

Publication number Publication date
US4370026A (en) 1983-01-25
FR2465241B1 (ja) 1983-08-05
EP0025397A1 (fr) 1981-03-18
FR2465241A1 (fr) 1981-03-20
EP0025397B1 (fr) 1983-06-22
DE3063902D1 (en) 1983-07-28

Similar Documents

Publication Publication Date Title
JPS5685724A (en) Illuminator for producing lighting beam capable of light arrangement
GB2132378B (en) Illumination of optical instruments
JPS5620428A (en) Lighting optical system for endoscope
JPS5688274A (en) Light source
JPS5688277A (en) Method of manufacturing light source
GB8620652D0 (en) Light distribution of headlight beam
JPS5617302A (en) Method of making light reflector
GB1549613A (en) Optical system for producing an area of light of even dispersion of illumination
JPS5491982A (en) Barrlike illumination lamp
GB2047870B (en) Signal lamp emitting coloured light
JPS5688278A (en) Method of manufacturing light source
JPS53129595A (en) Method of making light reflector
JPS5669796A (en) Bothhside light emitting field effect light emitting lamp
JPS5652965A (en) Linear light source illuminator
JPS5566853A (en) Light source for illuminating article
DE3266286D1 (en) High intensity light source
AU5024679A (en) Chemiluminescent light source
JPS5456279A (en) Illuminator having plural light sources
JPS54160231A (en) Light reflector for light emitting instrument
JPS5546263A (en) Producing shade for lighting lamp
GB2075167B (en) Lens for high intensity lamp fixtures
JPS53100689A (en) Light source cap for decorative lamp
JPS5693292A (en) Low light beam type emergency illuminator
JPS5525987A (en) Reflecting light emitting bulb
JPS5598786A (en) Light emitting diode lighting system