FR2454183A1 - Structure de type oxyde-semi-conducteur dans laquelle le semi-conducteur est un compose iii-v et procede de fabrication de cette structure - Google Patents
Structure de type oxyde-semi-conducteur dans laquelle le semi-conducteur est un compose iii-v et procede de fabrication de cette structureInfo
- Publication number
- FR2454183A1 FR2454183A1 FR7909043A FR7909043A FR2454183A1 FR 2454183 A1 FR2454183 A1 FR 2454183A1 FR 7909043 A FR7909043 A FR 7909043A FR 7909043 A FR7909043 A FR 7909043A FR 2454183 A1 FR2454183 A1 FR 2454183A1
- Authority
- FR
- France
- Prior art keywords
- oxide
- coated
- gallium arsenide
- crystalline substrate
- oxide semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P14/6312—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/40—Crystalline structures
- H10D62/405—Orientations of crystalline planes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
- H10D64/68—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator
- H10D64/691—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator comprising metallic compounds, e.g. metal oxides or metal silicates
-
- H10P14/6322—
Landscapes
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7909043A FR2454183A1 (fr) | 1979-04-10 | 1979-04-10 | Structure de type oxyde-semi-conducteur dans laquelle le semi-conducteur est un compose iii-v et procede de fabrication de cette structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7909043A FR2454183A1 (fr) | 1979-04-10 | 1979-04-10 | Structure de type oxyde-semi-conducteur dans laquelle le semi-conducteur est un compose iii-v et procede de fabrication de cette structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2454183A1 true FR2454183A1 (fr) | 1980-11-07 |
| FR2454183B1 FR2454183B1 (enExample) | 1982-05-21 |
Family
ID=9224169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7909043A Granted FR2454183A1 (fr) | 1979-04-10 | 1979-04-10 | Structure de type oxyde-semi-conducteur dans laquelle le semi-conducteur est un compose iii-v et procede de fabrication de cette structure |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2454183A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0178133A3 (en) * | 1984-10-08 | 1986-12-30 | Fujitsu Limited | Semiconductor integrated circuit device |
| US5070035A (en) * | 1988-01-25 | 1991-12-03 | Nippon Mining Co., Ltd. | Method for producing a iii-v compound semiconductor device with a phosphoric oxide insulating layer |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2182969A1 (enExample) * | 1972-05-01 | 1973-12-14 | Ibm | |
| DE2351216A1 (de) * | 1972-10-12 | 1974-04-25 | Hayashi Kentaro | Verfahren zur bildung von isolationszonen fuer die lichtuebertragung in einem verbundhalbleitenden optischen integrierten kreis |
-
1979
- 1979-04-10 FR FR7909043A patent/FR2454183A1/fr active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2182969A1 (enExample) * | 1972-05-01 | 1973-12-14 | Ibm | |
| DE2351216A1 (de) * | 1972-10-12 | 1974-04-25 | Hayashi Kentaro | Verfahren zur bildung von isolationszonen fuer die lichtuebertragung in einem verbundhalbleitenden optischen integrierten kreis |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0178133A3 (en) * | 1984-10-08 | 1986-12-30 | Fujitsu Limited | Semiconductor integrated circuit device |
| US4791471A (en) * | 1984-10-08 | 1988-12-13 | Fujitsu Limited | Semiconductor integrated circuit device |
| US5070035A (en) * | 1988-01-25 | 1991-12-03 | Nippon Mining Co., Ltd. | Method for producing a iii-v compound semiconductor device with a phosphoric oxide insulating layer |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2454183B1 (enExample) | 1982-05-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |