FR2379802B1 - - Google Patents

Info

Publication number
FR2379802B1
FR2379802B1 FR7802847A FR7802847A FR2379802B1 FR 2379802 B1 FR2379802 B1 FR 2379802B1 FR 7802847 A FR7802847 A FR 7802847A FR 7802847 A FR7802847 A FR 7802847A FR 2379802 B1 FR2379802 B1 FR 2379802B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7802847A
Other versions
FR2379802A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atos Origin IT Services Inc
Original Assignee
Sangamo Weston Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sangamo Weston Inc filed Critical Sangamo Weston Inc
Publication of FR2379802A1 publication Critical patent/FR2379802A1/fr
Application granted granted Critical
Publication of FR2379802B1 publication Critical patent/FR2379802B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G01B15/025—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness by measuring absorption

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length Measuring Devices By Optical Means (AREA)
FR7802847A 1977-02-03 1978-02-02 Jauge de mesure d'epaisseur et procede Granted FR2379802A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/765,180 US4119846A (en) 1977-02-03 1977-02-03 Non-contacting gage apparatus and method

Publications (2)

Publication Number Publication Date
FR2379802A1 FR2379802A1 (fr) 1978-09-01
FR2379802B1 true FR2379802B1 (fr) 1981-06-26

Family

ID=25072865

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7802847A Granted FR2379802A1 (fr) 1977-02-03 1978-02-02 Jauge de mesure d'epaisseur et procede

Country Status (6)

Country Link
US (1) US4119846A (fr)
JP (1) JPS53124468A (fr)
CA (1) CA1093709A (fr)
DE (1) DE2804454A1 (fr)
FR (1) FR2379802A1 (fr)
GB (1) GB1597010A (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE401733B (sv) * 1976-12-06 1978-05-22 Atomenergi Ab Forfarande och apparat vid metning av plattjocklek
DE2840819A1 (de) * 1978-09-20 1980-04-03 Philips Patentverwaltung Verfahren zum ermitteln des innenmasses von langgestreckten hohlkoerpern, insbesondere von rohren
JPS5740604A (en) * 1980-08-25 1982-03-06 Toshiba Corp Thickness measuring apparatus with radiation
JPS57197408A (en) * 1981-05-29 1982-12-03 Toshiba Corp Measuring method of plate thickness
US4574387A (en) * 1981-09-18 1986-03-04 Data Measurement Corporation Apparatus and method for measuring thickness
US4510577A (en) * 1982-02-18 1985-04-09 Tokyo Shibaura Denki Kabushiki Kaisha Non-contact radiation thickness gauge
JPS58150809A (ja) * 1982-02-25 1983-09-07 Toshiba Corp 非接触放射線厚み計及びその校正方法
US4777610A (en) * 1986-01-23 1988-10-11 Amp Incorporated Thickness monitor
JPH01178990A (ja) * 1987-12-29 1989-07-17 Toshiba Corp オートトナーセンサ
JP2750935B2 (ja) * 1990-03-20 1998-05-18 富士通株式会社 分子線制御方法及び分子線結晶成長装置
US5379237A (en) * 1990-05-31 1995-01-03 Integrated Diagnostic Measurement Corporation Automated system for controlling the quality of regularly-shaped products during their manufacture
GB9105639D0 (en) * 1991-03-18 1991-05-01 Data Measurement Corp Dynamic alloy correction gauge
DE4226179A1 (de) * 1992-08-07 1994-02-10 Amtec Analysenmestechnik Gmbh Verfahren zur Korrektur lang- und kurzzeitiger Veränderungen der Betriebsparameter bei der Schichtanalyse mittels RFA
JP3517388B2 (ja) * 2000-06-14 2004-04-12 新光電気工業株式会社 バンプの検査方法及びバンプの検査装置
CN105032953B (zh) * 2015-08-19 2017-04-26 山西太钢不锈钢股份有限公司 γ射线测厚仪样板快速标定方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3524063A (en) * 1967-10-12 1970-08-11 Bethlehem Steel Corp Multirange radiation thickness gauge
US3611408A (en) * 1969-04-07 1971-10-05 Industrial Nucleonics Corp Digital setup apparatus for radiation gauging and controlling systems
US4009376A (en) * 1972-02-15 1977-02-22 Sangamo Weston, Inc. Method and apparatus for measuring material thickness
CA990417A (en) * 1972-02-15 1976-06-01 Claude Faraguet Method and apparatus for measuring material thickness
US3832550A (en) * 1972-06-22 1974-08-27 Bethlehem Steel Corp Wide-range radiation gage for determining deviation of a material property with a controlled-gain detector in an interruptable self-balancing measuring loop

Also Published As

Publication number Publication date
US4119846A (en) 1978-10-10
DE2804454A1 (de) 1978-08-24
DE2804454C2 (fr) 1988-01-14
JPS53124468A (en) 1978-10-30
FR2379802A1 (fr) 1978-09-01
JPS635683B2 (fr) 1988-02-04
GB1597010A (en) 1981-09-03
CA1093709A (fr) 1981-01-13

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Legal Events

Date Code Title Description
ST Notification of lapse