FR2371709A1 - Materiel pour diazotypie a deux composants - Google Patents
Materiel pour diazotypie a deux composantsInfo
- Publication number
- FR2371709A1 FR2371709A1 FR7734854A FR7734854A FR2371709A1 FR 2371709 A1 FR2371709 A1 FR 2371709A1 FR 7734854 A FR7734854 A FR 7734854A FR 7734854 A FR7734854 A FR 7734854A FR 2371709 A1 FR2371709 A1 FR 2371709A1
- Authority
- FR
- France
- Prior art keywords
- component
- diazotypy
- photosensitive layer
- photosensitive
- coupler
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title abstract 2
- 239000002253 acid Substances 0.000 abstract 2
- 239000011230 binding agent Substances 0.000 abstract 1
- 239000012954 diazonium Substances 0.000 abstract 1
- 150000001989 diazonium salts Chemical class 0.000 abstract 1
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 230000002209 hydrophobic effect Effects 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/60—Compositions containing diazo compounds as photosensitive substances with macromolecular additives
Abstract
L'invention est relative à un matériel pour diazotypie à deux composants qui consiste en un film ou une feuille de support revêtu d'une couche photosensible comprenant au moins un liant hydrophobe polymère, un sel de diazonium photosensible et un copulant, caractérisé en ce que la couche photosensible comprend en outre au moins une resine possédant des groupes acides, présentant un indice d'acide d'au moins 100 et qui est dérivé de type maléique ou phtalique.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2652942A DE2652942C3 (de) | 1976-11-22 | 1976-11-22 | Zweikomponenten-Diazotypiematerial |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2371709A1 true FR2371709A1 (fr) | 1978-06-16 |
FR2371709B1 FR2371709B1 (fr) | 1981-09-11 |
Family
ID=5993659
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7734854A Granted FR2371709A1 (fr) | 1976-11-22 | 1977-11-21 | Materiel pour diazotypie a deux composants |
Country Status (19)
Country | Link |
---|---|
US (1) | US4171222A (fr) |
JP (1) | JPS5365721A (fr) |
AR (1) | AR218644A1 (fr) |
AT (1) | AT356513B (fr) |
AU (1) | AU515959B2 (fr) |
BE (1) | BE861023A (fr) |
BR (1) | BR7707712A (fr) |
CA (1) | CA1107997A (fr) |
CH (1) | CH630470A5 (fr) |
DE (1) | DE2652942C3 (fr) |
DK (1) | DK515377A (fr) |
ES (1) | ES464338A1 (fr) |
FI (1) | FI773518A (fr) |
FR (1) | FR2371709A1 (fr) |
GB (1) | GB1595347A (fr) |
IT (1) | IT1091789B (fr) |
NL (1) | NL186658C (fr) |
NO (1) | NO773984L (fr) |
SE (1) | SE417759B (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0161655A2 (fr) * | 1984-05-18 | 1985-11-21 | Hoechst Aktiengesellschaft | Composition photosensible et matériel pour diazotypie à deux constituants préparé à partir de cette composition |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3100579A1 (de) * | 1981-01-10 | 1982-08-26 | Hoechst Ag, 6000 Frankfurt | Zweikomponenten-diazotypiematerial |
DE3100580A1 (de) * | 1981-01-10 | 1982-08-26 | Hoechst Ag, 6000 Frankfurt | Zweikomponenten-diazotypiematerial |
DE3315977A1 (de) * | 1983-05-02 | 1984-11-08 | Hoechst Ag, 6230 Frankfurt | Haftmasse |
JP2000047346A (ja) * | 1998-07-31 | 2000-02-18 | Somar Corp | ジアゾ感光材料 |
US6861262B2 (en) * | 2000-03-03 | 2005-03-01 | Quest Diagnostics Investments Incorporated | Composition and method for detecting an adulterant in an aqueous sample |
DE60039505D1 (de) * | 1999-03-04 | 2008-08-28 | Quest Diagnostics Invest Inc | Reagens und verfahren zum nachweis von verfälschungsmitteln in wässrigen proben |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2990281A (en) * | 1956-12-17 | 1961-06-27 | Monsanto Chemicals | Photosensitive resinous compositions and photographic elements |
US3316092A (en) * | 1963-05-09 | 1967-04-25 | Dietzgen Co Eugene | Diazotype material comprising a metal sulfate nitrogenous compound and polymeric anhydride |
BE755280A (fr) * | 1969-08-26 | 1971-02-01 | Eastman Kodak Co | Nouveau produit photosensible pour diazotypie |
DE2123702B2 (de) * | 1971-05-13 | 1979-11-08 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung eines Reliefbildes |
-
1976
- 1976-11-22 DE DE2652942A patent/DE2652942C3/de not_active Expired
-
1977
- 1977-11-17 CH CH1408377A patent/CH630470A5/de not_active IP Right Cessation
- 1977-11-18 CA CA291,183A patent/CA1107997A/fr not_active Expired
- 1977-11-18 SE SE7713031A patent/SE417759B/sv unknown
- 1977-11-18 IT IT51852/77A patent/IT1091789B/it active
- 1977-11-18 NL NLAANVRAGE7712727,A patent/NL186658C/xx not_active IP Right Cessation
- 1977-11-18 AU AU30766/77A patent/AU515959B2/en not_active Expired
- 1977-11-21 BR BR7707712A patent/BR7707712A/pt unknown
- 1977-11-21 US US05/853,519 patent/US4171222A/en not_active Expired - Lifetime
- 1977-11-21 FR FR7734854A patent/FR2371709A1/fr active Granted
- 1977-11-21 NO NO773984A patent/NO773984L/no unknown
- 1977-11-21 AT AT830277A patent/AT356513B/de not_active IP Right Cessation
- 1977-11-21 AR AR270044A patent/AR218644A1/es active
- 1977-11-21 GB GB48348/77A patent/GB1595347A/en not_active Expired
- 1977-11-21 DK DK515377A patent/DK515377A/da not_active Application Discontinuation
- 1977-11-21 FI FI773518A patent/FI773518A/fi not_active Application Discontinuation
- 1977-11-21 BE BE182787A patent/BE861023A/fr unknown
- 1977-11-21 ES ES464338A patent/ES464338A1/es not_active Expired
- 1977-11-22 JP JP14057277A patent/JPS5365721A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0161655A2 (fr) * | 1984-05-18 | 1985-11-21 | Hoechst Aktiengesellschaft | Composition photosensible et matériel pour diazotypie à deux constituants préparé à partir de cette composition |
EP0161655A3 (en) * | 1984-05-18 | 1987-05-27 | Hoechst Aktiengesellschaft | Light-sensitive composition and two-component diazotype material prepared therefrom |
Also Published As
Publication number | Publication date |
---|---|
NL186658B (nl) | 1990-08-16 |
BE861023A (fr) | 1978-05-22 |
FI773518A (fi) | 1978-05-23 |
NL7712727A (nl) | 1978-05-24 |
DE2652942C3 (de) | 1979-05-31 |
AU515959B2 (en) | 1981-05-14 |
DK515377A (da) | 1978-05-23 |
IT1091789B (it) | 1985-07-06 |
AU3076677A (en) | 1979-05-24 |
AR218644A1 (es) | 1980-06-30 |
FR2371709B1 (fr) | 1981-09-11 |
US4171222A (en) | 1979-10-16 |
JPS5365721A (en) | 1978-06-12 |
SE417759B (sv) | 1981-04-06 |
DE2652942A1 (de) | 1978-05-24 |
GB1595347A (en) | 1981-08-12 |
BR7707712A (pt) | 1978-07-25 |
NO773984L (no) | 1978-05-23 |
CH630470A5 (de) | 1982-06-15 |
CA1107997A (fr) | 1981-09-01 |
ES464338A1 (es) | 1978-12-01 |
DE2652942B2 (de) | 1978-10-05 |
ATA830277A (de) | 1979-09-15 |
AT356513B (de) | 1980-05-12 |
NL186658C (nl) | 1991-01-16 |
SE7713031L (sv) | 1978-05-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |