FR2368308B1 - - Google Patents

Info

Publication number
FR2368308B1
FR2368308B1 FR7731172A FR7731172A FR2368308B1 FR 2368308 B1 FR2368308 B1 FR 2368308B1 FR 7731172 A FR7731172 A FR 7731172A FR 7731172 A FR7731172 A FR 7731172A FR 2368308 B1 FR2368308 B1 FR 2368308B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7731172A
Other languages
French (fr)
Other versions
FR2368308A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Juelich GmbH
Original Assignee
Kernforschungsanlage Juelich GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kernforschungsanlage Juelich GmbH filed Critical Kernforschungsanlage Juelich GmbH
Publication of FR2368308A1 publication Critical patent/FR2368308A1/fr
Application granted granted Critical
Publication of FR2368308B1 publication Critical patent/FR2368308B1/fr
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
  • Cleaning In General (AREA)
FR7731172A 1976-10-19 1977-10-17 Procede et dispositif pour nettoyer des surfaces, notamment des surfaces metalliques Granted FR2368308A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2647088A DE2647088B2 (de) 1976-10-19 1976-10-19 Verfahren und Vorrichtung zum Reinigen von Oberflächen

Publications (2)

Publication Number Publication Date
FR2368308A1 FR2368308A1 (fr) 1978-05-19
FR2368308B1 true FR2368308B1 (en17) 1984-07-06

Family

ID=5990801

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7731172A Granted FR2368308A1 (fr) 1976-10-19 1977-10-17 Procede et dispositif pour nettoyer des surfaces, notamment des surfaces metalliques

Country Status (5)

Country Link
US (1) US4452642A (en17)
JP (1) JPS6014109B2 (en17)
DE (1) DE2647088B2 (en17)
FR (1) FR2368308A1 (en17)
GB (1) GB1592864A (en17)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3026164A1 (de) * 1980-07-08 1982-01-28 Europäische Atomgemeinschaft (EURATOM), Kirchberg Verfahren und vorrichtung zur entladungschemischen behandlung empfindlicher werkstuecke durch einsatz der glimmentladung
US4534921A (en) * 1984-03-06 1985-08-13 Asm Fico Tooling, B.V. Method and apparatus for mold cleaning by reverse sputtering
EP0250455B1 (en) * 1985-10-29 1991-10-16 Hughes Aircraft Company Method and apparatus for atomic beam irradiation
JPH01152274A (ja) * 1987-12-09 1989-06-14 Iwatani Internatl Corp 膜形成操作系におけるフッ化塩素クリーニング後の汚染除去方法
JPH0754287B2 (ja) * 1987-12-16 1995-06-07 三菱電機株式会社 不純物検出分析方法
FR2631258B1 (fr) * 1988-05-10 1991-04-05 Prestations Services Sps Procede de nettoyage en surface par plasma differe
US5236537A (en) * 1989-04-07 1993-08-17 Seiko Epson Corporation Plasma etching apparatus
DE4034842A1 (de) * 1990-11-02 1992-05-07 Thyssen Edelstahlwerke Ag Verfahren zur plasmachemischen reinigung fuer eine anschliessende pvd oder pecvd beschichtung
US5825805A (en) * 1991-10-29 1998-10-20 Canon Spread spectrum communication system
US5409543A (en) * 1992-12-22 1995-04-25 Sandia Corporation Dry soldering with hot filament produced atomic hydrogen
GB2274286B (en) * 1993-01-13 1996-11-06 Singapore Asahi Chemical & Solder Ind Pte Ltd Method of and apparatus for preparing an electric circuit board for a flow or wave soldering process
WO1995012883A1 (en) * 1993-11-01 1995-05-11 Eneco, Inc. Glow discharge apparatus and methods providing prerequisites and testing for nuclear reactions
JP2731730B2 (ja) * 1993-12-22 1998-03-25 インターナショナル・ビジネス・マシーンズ・コーポレイション フォトレジストの除去方法
US5900351A (en) * 1995-01-17 1999-05-04 International Business Machines Corporation Method for stripping photoresist
JP4346741B2 (ja) * 1999-08-05 2009-10-21 キヤノンアネルバ株式会社 発熱体ｃｖｄ装置及び付着膜の除去方法
EP1235258A4 (en) * 1999-10-29 2007-03-28 Matsushita Electric Ind Co Ltd SUBSTRATE CLEANING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
US20040011381A1 (en) * 2002-07-17 2004-01-22 Klebanoff Leonard E. Method for removing carbon contamination from optic surfaces
US7361233B2 (en) * 2003-12-10 2008-04-22 General Electric Company Methods of hydrogen cleaning of metallic surfaces
US20100071720A1 (en) * 2008-09-19 2010-03-25 Carl Zeiss Smt Ag Method and system for removing contaminants from a surface
EP3566725B1 (de) * 2018-05-07 2021-10-27 Waldemar Link GmbH & Co. KG Antimikrobielle implantatbeschichtung
CN108754520A (zh) * 2018-06-29 2018-11-06 四川大学 硬质合金表面涂层去除方法和设备
CN113365747A (zh) * 2019-01-30 2021-09-07 应用材料公司 用于清洁真空系统的方法、用于真空处理基板的方法以及用于真空处理基板的设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2985756A (en) * 1957-12-09 1961-05-23 Edwards High Vacuum Ltd Ionic bombardment cleaning apparatus
GB948554A (en) * 1961-03-22 1964-02-05 Joseph Edmund Harling And Dona Method and apparatus for cleaning metal by plasma arcs
DE1521989A1 (de) * 1966-02-04 1970-02-05 Siemens Ag Verfahren zur Beseitigung von Oxyd-,Sulfid- und Sulfatschichten auf verzinnten Anschlussdraehten elektrischer Bauelemente
DE1621650A1 (de) * 1966-08-10 1971-06-24 Siemens Ag Verfahren zur Beseitigung von oberflaechlichen Verunreinigungen auf verzinnten Kontaktflaechen,insbesondere auf verzinnten Leitungsbahnen gedruckter Schaltungen
US3868271A (en) * 1973-06-13 1975-02-25 Ibm Method of cleaning a glass substrate by ionic bombardment in a wet active gas

Also Published As

Publication number Publication date
JPS5351142A (en) 1978-05-10
DE2647088B2 (de) 1979-04-05
JPS6014109B2 (ja) 1985-04-11
US4452642A (en) 1984-06-05
DE2647088A1 (de) 1978-04-20
GB1592864A (en) 1981-07-08
FR2368308A1 (fr) 1978-05-19

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Legal Events

Date Code Title Description
ST Notification of lapse