FR2339254A1 - Transistor planaire de circuit de logique a injection integree (i2l) - Google Patents

Transistor planaire de circuit de logique a injection integree (i2l)

Info

Publication number
FR2339254A1
FR2339254A1 FR7701556A FR7701556A FR2339254A1 FR 2339254 A1 FR2339254 A1 FR 2339254A1 FR 7701556 A FR7701556 A FR 7701556A FR 7701556 A FR7701556 A FR 7701556A FR 2339254 A1 FR2339254 A1 FR 2339254A1
Authority
FR
France
Prior art keywords
logic circuit
integrated injection
planar transistor
injection logic
planar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7701556A
Other languages
English (en)
French (fr)
Inventor
Wolfgang Kraft
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Micronas GmbH
ITT Inc
Original Assignee
Deutsche ITT Industries GmbH
ITT Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deutsche ITT Industries GmbH, ITT Industries Inc filed Critical Deutsche ITT Industries GmbH
Publication of FR2339254A1 publication Critical patent/FR2339254A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0214Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
    • H01L27/0229Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
    • H01L27/0233Integrated injection logic structures [I2L]
    • H01L27/0244I2L structures integrated in combination with analog structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8222Bipolar technology
    • H01L21/8226Bipolar technology comprising merged transistor logic or integrated injection logic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0804Emitter regions of bipolar transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • H01L29/732Vertical transistors
    • H01L29/7327Inverse vertical transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
FR7701556A 1976-01-23 1977-01-20 Transistor planaire de circuit de logique a injection integree (i2l) Withdrawn FR2339254A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762602395 DE2602395C3 (de) 1976-01-23 1976-01-23 Monolithisch integrierter I2 L-Planartransistor und Verfahren zu seiner Herstellung

Publications (1)

Publication Number Publication Date
FR2339254A1 true FR2339254A1 (fr) 1977-08-19

Family

ID=5968045

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7701556A Withdrawn FR2339254A1 (fr) 1976-01-23 1977-01-20 Transistor planaire de circuit de logique a injection integree (i2l)

Country Status (4)

Country Link
DE (1) DE2602395C3 (de)
FR (1) FR2339254A1 (de)
GB (1) GB1574461A (de)
IT (1) IT1077580B (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0016860A1 (de) * 1978-12-22 1980-10-15 Deutsche ITT Industries GmbH Monolithisch integrierte Schaltung mit einem I2L-Schaltungsteil und einem Analog-Schaltungsteil
FR2457564A1 (fr) * 1979-05-23 1980-12-19 Thomson Csf Transistor pnp pour circuit integre bipolaire et son procede de fabrication

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
EXBK/70 *
EXBK/71 *
EXBK/75 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0016860A1 (de) * 1978-12-22 1980-10-15 Deutsche ITT Industries GmbH Monolithisch integrierte Schaltung mit einem I2L-Schaltungsteil und einem Analog-Schaltungsteil
FR2457564A1 (fr) * 1979-05-23 1980-12-19 Thomson Csf Transistor pnp pour circuit integre bipolaire et son procede de fabrication

Also Published As

Publication number Publication date
IT1077580B (it) 1985-05-04
DE2602395A1 (de) 1977-07-28
DE2602395C3 (de) 1978-10-12
DE2602395B2 (de) 1978-01-26
GB1574461A (en) 1980-09-10

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Legal Events

Date Code Title Description
ST Notification of lapse