FR2335950B1 - - Google Patents
Info
- Publication number
- FR2335950B1 FR2335950B1 FR7638415A FR7638415A FR2335950B1 FR 2335950 B1 FR2335950 B1 FR 2335950B1 FR 7638415 A FR7638415 A FR 7638415A FR 7638415 A FR7638415 A FR 7638415A FR 2335950 B1 FR2335950 B1 FR 2335950B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- H10P32/141—
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- H10P32/171—
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/003—Anneal
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/02—Contacts, special
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/033—Diffusion of aluminum
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/112—Nitridation, direct, of silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/114—Nitrides of silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/141—Self-alignment coat gate
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50152662A JPS5275267A (en) | 1975-12-19 | 1975-12-19 | Production of semiconductor device |
| JP50152664A JPS5814741B2 (ja) | 1975-12-19 | 1975-12-19 | ハンドウタイチユウヘノフジユンブツカクサンホウホウ |
| JP50152659A JPS5814740B2 (ja) | 1975-12-19 | 1975-12-19 | ハンドウタイチユウヘノフジユンブツカクサンホウホウ |
| JP15266875A JPS5275270A (en) | 1975-12-19 | 1975-12-19 | Method of diffusing impurity in semiconductor |
| JP15266175A JPS5275266A (en) | 1975-12-19 | 1975-12-19 | Production of semiconductor device |
| JP15266075A JPS5275273A (en) | 1975-12-19 | 1975-12-19 | Method of forming boron nitride-boron oxidesilicon oxide mixed film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2335950A1 FR2335950A1 (fr) | 1977-07-15 |
| FR2335950B1 true FR2335950B1 (enExample) | 1981-06-12 |
Family
ID=27553110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7638415A Granted FR2335950A1 (fr) | 1975-12-19 | 1976-12-20 | Procede pour realiser la diffusion d'une impurete dans un corps semi-conducteur |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4102715A (enExample) |
| DE (1) | DE2657415C2 (enExample) |
| FR (1) | FR2335950A1 (enExample) |
| GB (1) | GB1581726A (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5795625A (en) | 1980-12-04 | 1982-06-14 | Toshiba Corp | Manufacture of semiconductor device |
| US4782036A (en) * | 1986-08-29 | 1988-11-01 | Siemens Aktiengesellschaft | Process for producing a predetermined doping in side walls and bases of trenches etched into semiconductor substrates |
| JP3131436B2 (ja) * | 1990-02-26 | 2001-01-31 | 株式会社東芝 | 半導体装置の製造方法 |
| KR19990064285A (ko) * | 1995-10-04 | 1999-07-26 | 피터 엔. 데트킨 | 도핑된 글라스로부터의 소스/드레인의 형성 |
| US6333245B1 (en) | 1999-12-21 | 2001-12-25 | International Business Machines Corporation | Method for introducing dopants into semiconductor devices using a germanium oxide sacrificial layer |
| US7851339B2 (en) * | 2008-05-29 | 2010-12-14 | Promos Technologies Pte. Ltd. | Method of repairing deep subsurface defects in a silicon substrate that includes diffusing negatively charged ions into the substrate from a sacrificial oxide layer |
| TWI501292B (zh) * | 2012-09-26 | 2015-09-21 | 財團法人工業技術研究院 | 形成圖案化摻雜區的方法 |
| US20140361407A1 (en) * | 2013-06-05 | 2014-12-11 | SCHMID Group | Silicon material substrate doping method, structure and applications |
| JP6810578B2 (ja) * | 2016-11-18 | 2021-01-06 | 株式会社Screenホールディングス | ドーパント導入方法および熱処理方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3437533A (en) * | 1966-12-13 | 1969-04-08 | Rca Corp | Method of fabricating semiconductor devices |
| DE2109300A1 (en) * | 1971-02-26 | 1972-09-21 | Siemens Ag | Formation of masking, passivating or doping coatings - or contacts - on surfaces of semiconductors |
| GB1363121A (en) * | 1972-04-25 | 1974-08-14 | Ferranti Ltd | Manufacture of semiconductor devices |
| US3808060A (en) * | 1972-07-05 | 1974-04-30 | Motorola Inc | Method of doping semiconductor substrates |
| US3865655A (en) * | 1973-09-24 | 1975-02-11 | Rca Corp | Method for diffusing impurities into nitride semiconductor crystals |
| US3869322A (en) * | 1973-10-15 | 1975-03-04 | Ibm | Automatic P-N junction formation during growth of a heterojunction |
| US4006046A (en) * | 1975-04-21 | 1977-02-01 | Trw Inc. | Method for compensating for emitter-push effect in the fabrication of transistors |
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1976
- 1976-12-16 US US05/751,124 patent/US4102715A/en not_active Expired - Lifetime
- 1976-12-17 DE DE2657415A patent/DE2657415C2/de not_active Expired
- 1976-12-20 FR FR7638415A patent/FR2335950A1/fr active Granted
- 1976-12-20 GB GB53080/76A patent/GB1581726A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2657415C2 (de) | 1983-03-31 |
| GB1581726A (en) | 1980-12-17 |
| FR2335950A1 (fr) | 1977-07-15 |
| US4102715A (en) | 1978-07-25 |
| DE2657415A1 (de) | 1977-07-07 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |