FR2325076A1 - Procede pour accroitre la sensibilite d'une laque sensible positive et nouvelle laque sensible resultante - Google Patents

Procede pour accroitre la sensibilite d'une laque sensible positive et nouvelle laque sensible resultante

Info

Publication number
FR2325076A1
FR2325076A1 FR7623079A FR7623079A FR2325076A1 FR 2325076 A1 FR2325076 A1 FR 2325076A1 FR 7623079 A FR7623079 A FR 7623079A FR 7623079 A FR7623079 A FR 7623079A FR 2325076 A1 FR2325076 A1 FR 2325076A1
Authority
FR
France
Prior art keywords
aryl
substd
unsubstd
sensitisers
sulphonamides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7623079A
Other languages
English (en)
French (fr)
Other versions
FR2325076B1 (de
Inventor
Gabor Paal
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2325076A1 publication Critical patent/FR2325076A1/fr
Application granted granted Critical
Publication of FR2325076B1 publication Critical patent/FR2325076B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
FR7623079A 1975-09-20 1976-07-20 Procede pour accroitre la sensibilite d'une laque sensible positive et nouvelle laque sensible resultante Granted FR2325076A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752541982 DE2541982A1 (de) 1975-09-20 1975-09-20 Verfahren zur sensibilisierung eines positiv arbeitenden photoresists sowie photoresistmaterial

Publications (2)

Publication Number Publication Date
FR2325076A1 true FR2325076A1 (fr) 1977-04-15
FR2325076B1 FR2325076B1 (de) 1978-05-05

Family

ID=5956974

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7623079A Granted FR2325076A1 (fr) 1975-09-20 1976-07-20 Procede pour accroitre la sensibilite d'une laque sensible positive et nouvelle laque sensible resultante

Country Status (3)

Country Link
JP (1) JPS5240126A (de)
DE (1) DE2541982A1 (de)
FR (1) FR2325076A1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2500645A1 (fr) * 1981-02-20 1982-08-27 Polychrome Corp Composition sensible aux radiations, element sensible portant un revetement de cette composition et pellicule de reproduction preparee a partir de cet element
EP0505094A1 (de) * 1991-03-19 1992-09-23 Minnesota Mining And Manufacturing Company Positivarbeitende Fotoresistzusammensetzungen mit stabilisierter Geschwindigkeit

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5145763A (en) * 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition
JPH0649906A (ja) * 1992-01-17 1994-02-22 Misawa Homes Co Ltd 中高層建築物の構築方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEANT *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2500645A1 (fr) * 1981-02-20 1982-08-27 Polychrome Corp Composition sensible aux radiations, element sensible portant un revetement de cette composition et pellicule de reproduction preparee a partir de cet element
EP0505094A1 (de) * 1991-03-19 1992-09-23 Minnesota Mining And Manufacturing Company Positivarbeitende Fotoresistzusammensetzungen mit stabilisierter Geschwindigkeit

Also Published As

Publication number Publication date
JPS5240126A (en) 1977-03-28
DE2541982A1 (de) 1977-03-24
FR2325076B1 (de) 1978-05-05

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Legal Events

Date Code Title Description
ST Notification of lapse