JPS5240126A - Positive photoresist material - Google Patents

Positive photoresist material

Info

Publication number
JPS5240126A
JPS5240126A JP10176276A JP10176276A JPS5240126A JP S5240126 A JPS5240126 A JP S5240126A JP 10176276 A JP10176276 A JP 10176276A JP 10176276 A JP10176276 A JP 10176276A JP S5240126 A JPS5240126 A JP S5240126A
Authority
JP
Japan
Prior art keywords
photoresist material
positive photoresist
positive
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10176276A
Other languages
English (en)
Inventor
Paaru Gaabaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5240126A publication Critical patent/JPS5240126A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
JP10176276A 1975-09-20 1976-08-27 Positive photoresist material Pending JPS5240126A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752541982 DE2541982A1 (de) 1975-09-20 1975-09-20 Verfahren zur sensibilisierung eines positiv arbeitenden photoresists sowie photoresistmaterial

Publications (1)

Publication Number Publication Date
JPS5240126A true JPS5240126A (en) 1977-03-28

Family

ID=5956974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10176276A Pending JPS5240126A (en) 1975-09-20 1976-08-27 Positive photoresist material

Country Status (3)

Country Link
JP (1) JPS5240126A (ja)
DE (1) DE2541982A1 (ja)
FR (1) FR2325076A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0649906A (ja) * 1992-01-17 1994-02-22 Misawa Homes Co Ltd 中高層建築物の構築方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU8021782A (en) * 1981-02-20 1982-08-26 Polychrome Corp. Non-silver positive working radiation sensitive compositions
US5145763A (en) * 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition
GB9105750D0 (en) * 1991-03-19 1991-05-01 Minnesota Mining & Mfg Speed stabilised positive-acting photoresist compositions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0649906A (ja) * 1992-01-17 1994-02-22 Misawa Homes Co Ltd 中高層建築物の構築方法

Also Published As

Publication number Publication date
DE2541982A1 (de) 1977-03-24
FR2325076B1 (ja) 1978-05-05
FR2325076A1 (fr) 1977-04-15

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