FR2319242A1 - Procede et systeme de controle de l'usinage, par un faisceau de particules chargees d'un substrat piezo-electrique - Google Patents

Procede et systeme de controle de l'usinage, par un faisceau de particules chargees d'un substrat piezo-electrique

Info

Publication number
FR2319242A1
FR2319242A1 FR7523337A FR7523337A FR2319242A1 FR 2319242 A1 FR2319242 A1 FR 2319242A1 FR 7523337 A FR7523337 A FR 7523337A FR 7523337 A FR7523337 A FR 7523337A FR 2319242 A1 FR2319242 A1 FR 2319242A1
Authority
FR
France
Prior art keywords
substrate
control
machining
resonant frequency
charged particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7523337A
Other languages
English (en)
Other versions
FR2319242B1 (fr
Inventor
Gerard Coussot
Armand Soufache
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7523337A priority Critical patent/FR2319242A1/fr
Publication of FR2319242A1 publication Critical patent/FR2319242A1/fr
Application granted granted Critical
Publication of FR2319242B1 publication Critical patent/FR2319242B1/fr
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
    • H10N30/08Shaping or machining of piezoelectric or electrostrictive bodies
    • H10N30/085Shaping or machining of piezoelectric or electrostrictive bodies by machining

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
FR7523337A 1975-07-25 1975-07-25 Procede et systeme de controle de l'usinage, par un faisceau de particules chargees d'un substrat piezo-electrique Granted FR2319242A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7523337A FR2319242A1 (fr) 1975-07-25 1975-07-25 Procede et systeme de controle de l'usinage, par un faisceau de particules chargees d'un substrat piezo-electrique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7523337A FR2319242A1 (fr) 1975-07-25 1975-07-25 Procede et systeme de controle de l'usinage, par un faisceau de particules chargees d'un substrat piezo-electrique

Publications (2)

Publication Number Publication Date
FR2319242A1 true FR2319242A1 (fr) 1977-02-18
FR2319242B1 FR2319242B1 (fr) 1977-12-09

Family

ID=9158387

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7523337A Granted FR2319242A1 (fr) 1975-07-25 1975-07-25 Procede et systeme de controle de l'usinage, par un faisceau de particules chargees d'un substrat piezo-electrique

Country Status (1)

Country Link
FR (1) FR2319242A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2709368A1 (de) * 1976-03-05 1977-09-08 Thomson Csf Verfahren zur kontrolle der bearbeitung eines piezoelektrischen plaettchens durch ionenbeschuss
FR2554289A1 (fr) * 1983-10-28 1985-05-03 Cepe Procede et dispositif d'usinage d'une lame de resonateur et lame ainsi obtenue

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB900206A (en) * 1957-10-03 1962-07-04 United Indsulator Company Ltd Improvements in electromechanical transducers
US3808752A (en) * 1972-07-10 1974-05-07 Comtec Economation Method of automatically adjusting the frequency of crystal resonators
FR2226257A1 (fr) * 1973-04-19 1974-11-15 Lasag Sa

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB900206A (en) * 1957-10-03 1962-07-04 United Indsulator Company Ltd Improvements in electromechanical transducers
US3808752A (en) * 1972-07-10 1974-05-07 Comtec Economation Method of automatically adjusting the frequency of crystal resonators
FR2226257A1 (fr) * 1973-04-19 1974-11-15 Lasag Sa

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2709368A1 (de) * 1976-03-05 1977-09-08 Thomson Csf Verfahren zur kontrolle der bearbeitung eines piezoelektrischen plaettchens durch ionenbeschuss
FR2554289A1 (fr) * 1983-10-28 1985-05-03 Cepe Procede et dispositif d'usinage d'une lame de resonateur et lame ainsi obtenue
EP0143686A1 (fr) * 1983-10-28 1985-06-05 Compagnie D'electronique Et De Piezo-Electricite - C.E.P.E. Procédé et dispositif d'usinage d'une lame de résonateur et lame ainsi obtenue

Also Published As

Publication number Publication date
FR2319242B1 (fr) 1977-12-09

Similar Documents

Publication Publication Date Title
EP0327406A3 (fr) Procédé d'usinage à plasma et dispositif pour le dépôt de couches minces
TW326616B (en) Plasma processing method and apparatus
EP0328257A3 (fr) Appareil et procédé de pulvérisation à magnétron
ES8703215A1 (es) Procedimiento para fabricar dispositivos semiconductores utilizando mordentado ionico reactivo
JPS6079726A (ja) プラズマリアクタ装置及びプラズマエッチング方法
IT1144745B (it) Rivestimento ottico e particolarmente procedimento per applicare un rivestimento ottico carbonaceo sulla superficie di materiale
JPS5687670A (en) Dry etching apparatus
FR2319242A1 (fr) Procede et systeme de controle de l'usinage, par un faisceau de particules chargees d'un substrat piezo-electrique
JPS5676339A (en) Wire cut discharge type machining system
JPS5411693A (en) Processig method for elastic surface wave substrate
JPS577129A (en) Treating method and device for sputtering
JPS5848422A (ja) 複合ドライエツチング装置
JPS538377A (en) Apparatus for high frequency sputtering
AU3161493A (en) Procedure and apparatus for improving a plasma accelerator plating apparatus used for diamond plating
JPS5220982A (en) Process for controlling surface working and surface treatment
JPS5685828A (en) Electrostatic wafer holder
JPS5253778A (en) Ion plating apparatus
JPH02297929A (ja) マイクロ波プラズマ処理装置
RU2168849C2 (ru) Способ настройки на центральную частоту узкополосного прибора на поверхностных акустических волнах
GB1482632A (en) Method and apparatus for sputtering
JPS5344993A (en) Servo equipment for electric machining
JPS5635775A (en) Ion beam etching method
FR2405111A1 (fr) Procede d'usinage par bombardement ionique et dispositif de mise en oeuvre d'un tel procede
JPS6467014A (en) Manufacture of piezoelectric component
JPH0427119A (ja) 半導体製造装置

Legal Events

Date Code Title Description
ST Notification of lapse