FR2307293A1 - Composition photo-durcissable - Google Patents

Composition photo-durcissable

Info

Publication number
FR2307293A1
FR2307293A1 FR7610291A FR7610291A FR2307293A1 FR 2307293 A1 FR2307293 A1 FR 2307293A1 FR 7610291 A FR7610291 A FR 7610291A FR 7610291 A FR7610291 A FR 7610291A FR 2307293 A1 FR2307293 A1 FR 2307293A1
Authority
FR
France
Prior art keywords
photo
curing composition
curing
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7610291A
Other languages
English (en)
Other versions
FR2307293B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Publication of FR2307293A1 publication Critical patent/FR2307293A1/fr
Application granted granted Critical
Publication of FR2307293B1 publication Critical patent/FR2307293B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
    • C08C19/00—Chemical modification of rubber
    • C08C19/30—Addition of a reagent which reacts with a hetero atom or a group containing hetero atoms of the macromolecule
    • C08C19/34—Addition of a reagent which reacts with a hetero atom or a group containing hetero atoms of the macromolecule reacting with oxygen or oxygen-containing groups
    • C08C19/36—Addition of a reagent which reacts with a hetero atom or a group containing hetero atoms of the macromolecule reacting with oxygen or oxygen-containing groups with carboxy radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F279/00—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • C08F279/02—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00 on to polymers of conjugated dienes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR7610291A 1975-04-08 1976-04-08 Composition photo-durcissable Granted FR2307293A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50041790A JPS51116893A (en) 1975-04-08 1975-04-08 Photo-setting compositions

Publications (2)

Publication Number Publication Date
FR2307293A1 true FR2307293A1 (fr) 1976-11-05
FR2307293B1 FR2307293B1 (fr) 1980-01-25

Family

ID=12618123

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7610291A Granted FR2307293A1 (fr) 1975-04-08 1976-04-08 Composition photo-durcissable

Country Status (6)

Country Link
US (1) US4038084A (fr)
JP (1) JPS51116893A (fr)
CA (1) CA1066105A (fr)
DE (1) DE2614860C3 (fr)
FR (1) FR2307293A1 (fr)
GB (1) GB1507793A (fr)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0029094A2 (fr) * 1979-11-10 1981-05-27 Chemische Werke Hüls Ag Agents de revêtement aqueux à cuire à chaud pour l'électrodéposition anodique
EP0029487A2 (fr) * 1979-11-10 1981-06-03 Chemische Werke Hüls Ag Agents de revêtement aqueux thermodurcissables et leur utilisation
EP0246918A1 (fr) * 1986-05-23 1987-11-25 W.R. Grace & Co.-Conn. Des prépolymères durcissables
EP0249468A2 (fr) * 1986-06-10 1987-12-16 Mitsubishi Kasei Corporation Composition photopolymérisable
EP0261890A2 (fr) * 1986-09-23 1988-03-30 W.R. Grace & Co.-Conn. Polymères réticulables par radiation
EP0353924A2 (fr) * 1988-07-30 1990-02-07 Nippon Petrochemicals Company, Limited Méthode pour la formation d'un film photoréticulable
EP0366333A2 (fr) * 1988-10-28 1990-05-02 W.R. Grace & Co.-Conn. Résines pour masque de soudure à stabilité modifiée

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CS193322B1 (en) * 1977-11-07 1979-10-31 Jaroslav Kalal Electron resisit
US4171974A (en) * 1978-02-15 1979-10-23 Polychrome Corporation Aqueous alkali developable negative working lithographic printing plates
DE3047681A1 (de) * 1980-12-18 1982-07-15 Metallgesellschaft Ag, 6000 Frankfurt Peroxidisch haertbare giessharzmischung
DE3120052A1 (de) * 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes kopiermaterial
US5521053A (en) * 1988-07-30 1996-05-28 Nippon Petrochemicals Co., Ltd. Photocurable resin composition for the preparation of a printed wiring board
JP2873705B2 (ja) * 1990-01-30 1999-03-24 日本石油化学株式会社 光硬化性樹脂組成物
DE69118456T2 (de) * 1990-01-30 1996-08-08 Nippon Petrochemicals Co Ltd Lichthärtbare harzzusammensetzung
EP0465672B1 (fr) * 1990-01-30 1996-11-20 Nippon Petrochemicals Co., Ltd. Composition de resine photopolymerisable et procede de production de resine photopolymerisable
US5407784A (en) * 1990-04-26 1995-04-18 W. R. Grace & Co.-Conn. Photocurable composition comprising maleic anhydride adduct of polybutadiene or butadiene copolymers
US5268257A (en) * 1990-08-01 1993-12-07 W. R. Grace & Co.-Conn. Aqueous developable, photocurable composition, and flexible, photosensitive articles made therefrom
TW290583B (fr) * 1993-10-14 1996-11-11 Alpha Metals Ltd
JP4918819B2 (ja) * 2006-07-25 2012-04-18 東ソー株式会社 石油樹脂アクリレート及びその製造方法
DE102007046641A1 (de) * 2007-09-27 2009-04-09 Carl Freudenberg Kg Strahlungs-härtbare Elastomermischung
JP2014051654A (ja) * 2012-08-06 2014-03-20 Toagosei Co Ltd 活性エネルギー線硬化型コーティング剤組成物
WO2014024826A1 (fr) * 2012-08-06 2014-02-13 東亞合成株式会社 Composition de revêtement durcissable par rayonnement énergétique actif
JP6183036B2 (ja) * 2012-08-06 2017-08-23 東亞合成株式会社 絶縁性硬化膜を有する金属基材の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE569759A (fr) *
FR1555957A (fr) * 1967-02-07 1969-01-31
DE2062563A1 (de) * 1969-12-19 1971-09-02 Mccall Corp Vernetzbare Polymerisate und Ver fahren zu ihrer Herstellung
US3607842A (en) * 1969-07-18 1971-09-21 Allied Chem Copolymers of a conjugated diene and maleic anhydride
US3766215A (en) * 1970-03-19 1973-10-16 Huels Chemische Werke Ag Process for the preparation of adducts from maleic anhydride and liquid low molecular weight polybutadienes
JPH108673A (ja) * 1996-06-25 1998-01-13 Matsushita Electric Works Ltd 棟部の換気構造

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3676145A (en) * 1970-09-21 1972-07-11 Staley Mfg Co A E Predetermined chemical reactions in photographic imagewise configuration
JPS5137128A (ja) * 1974-09-25 1976-03-29 Toa Gosei Chem Ind Shigaisenkokagatakinzokuhifukuyojushisoseibutsu

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE569759A (fr) *
FR1555957A (fr) * 1967-02-07 1969-01-31
US3607842A (en) * 1969-07-18 1971-09-21 Allied Chem Copolymers of a conjugated diene and maleic anhydride
DE2062563A1 (de) * 1969-12-19 1971-09-02 Mccall Corp Vernetzbare Polymerisate und Ver fahren zu ihrer Herstellung
US3766215A (en) * 1970-03-19 1973-10-16 Huels Chemische Werke Ag Process for the preparation of adducts from maleic anhydride and liquid low molecular weight polybutadienes
JPH108673A (ja) * 1996-06-25 1998-01-13 Matsushita Electric Works Ltd 棟部の換気構造

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0029487A2 (fr) * 1979-11-10 1981-06-03 Chemische Werke Hüls Ag Agents de revêtement aqueux thermodurcissables et leur utilisation
EP0029094A3 (en) * 1979-11-10 1981-07-22 Chemische Werke Huls Ag Heat-curable aqueous coating compositions for anodic electro-dip lacquering
EP0029487A3 (en) * 1979-11-10 1981-07-22 Chemische Werke Huls Ag Heat curable aqueous coating compositions
EP0029094A2 (fr) * 1979-11-10 1981-05-27 Chemische Werke Hüls Ag Agents de revêtement aqueux à cuire à chaud pour l'électrodéposition anodique
EP0246918A1 (fr) * 1986-05-23 1987-11-25 W.R. Grace & Co.-Conn. Des prépolymères durcissables
EP0249468A3 (en) * 1986-06-10 1988-09-07 Mitsubishi Chemical Industries Limited Photopolymerizable composition
EP0249468A2 (fr) * 1986-06-10 1987-12-16 Mitsubishi Kasei Corporation Composition photopolymérisable
EP0261890A2 (fr) * 1986-09-23 1988-03-30 W.R. Grace & Co.-Conn. Polymères réticulables par radiation
EP0261890A3 (fr) * 1986-09-23 1989-10-11 W.R. Grace & Co.-Conn. Polymères réticulables par radiation
EP0353924A2 (fr) * 1988-07-30 1990-02-07 Nippon Petrochemicals Company, Limited Méthode pour la formation d'un film photoréticulable
EP0353924A3 (fr) * 1988-07-30 1991-02-06 Nippon Petrochemicals Company, Limited Méthode pour la formation d'un film photoréticulable
EP0366333A2 (fr) * 1988-10-28 1990-05-02 W.R. Grace & Co.-Conn. Résines pour masque de soudure à stabilité modifiée
EP0366333A3 (fr) * 1988-10-28 1990-11-28 W.R. Grace & Co.-Conn. Résines pour masque de soudure à stabilité modifiée

Also Published As

Publication number Publication date
US4038084A (en) 1977-07-26
CA1066105A (fr) 1979-11-13
GB1507793A (en) 1978-04-19
FR2307293B1 (fr) 1980-01-25
DE2614860A1 (de) 1976-10-21
JPS5328351B2 (fr) 1978-08-14
DE2614860C3 (de) 1980-10-16
JPS51116893A (en) 1976-10-14
DE2614860B2 (de) 1980-02-28

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Legal Events

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