FR2303001A1 - Thioethersulfonates de nitriles ou d'amides, bains de revetements electrolytiques de nickel ou d'alliages de nickel les renfermant, et revetements composites ainsi obtenus - Google Patents
Thioethersulfonates de nitriles ou d'amides, bains de revetements electrolytiques de nickel ou d'alliages de nickel les renfermant, et revetements composites ainsi obtenusInfo
- Publication number
- FR2303001A1 FR2303001A1 FR7530237A FR7530237A FR2303001A1 FR 2303001 A1 FR2303001 A1 FR 2303001A1 FR 7530237 A FR7530237 A FR 7530237A FR 7530237 A FR7530237 A FR 7530237A FR 2303001 A1 FR2303001 A1 FR 2303001A1
- Authority
- FR
- France
- Prior art keywords
- sulphonates
- nitriles
- thioether
- amides
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title abstract 9
- 229910052759 nickel Inorganic materials 0.000 title abstract 4
- 238000007747 plating Methods 0.000 title abstract 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 title abstract 3
- 239000005864 Sulphur Substances 0.000 title abstract 3
- 239000000654 additive Substances 0.000 title abstract 2
- 150000001408 amides Chemical class 0.000 title abstract 2
- 230000007797 corrosion Effects 0.000 title abstract 2
- 238000005260 corrosion Methods 0.000 title abstract 2
- 150000002825 nitriles Chemical class 0.000 title abstract 2
- 239000011229 interlayer Substances 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 125000002947 alkylene group Chemical group 0.000 abstract 1
- 239000002131 composite material Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/64—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton
- C07C323/66—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton containing sulfur atoms of sulfo, esterified sulfo or halosulfonyl groups, bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/556,232 US3985784A (en) | 1972-07-10 | 1975-03-07 | Thioether sulfonates for use in electroplating baths |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2303001A1 true FR2303001A1 (fr) | 1976-10-01 |
| FR2303001B1 FR2303001B1 (enExample) | 1979-06-29 |
Family
ID=24220455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7530237A Granted FR2303001A1 (fr) | 1975-03-07 | 1975-10-02 | Thioethersulfonates de nitriles ou d'amides, bains de revetements electrolytiques de nickel ou d'alliages de nickel les renfermant, et revetements composites ainsi obtenus |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5921393B2 (enExample) |
| AU (1) | AU8469875A (enExample) |
| DE (1) | DE2541553A1 (enExample) |
| FR (1) | FR2303001A1 (enExample) |
| NL (1) | NL7511610A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4384929A (en) * | 1981-07-06 | 1983-05-24 | Occidental Chemical Corporation | Process for electro-depositing composite nickel layers |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2064070A1 (enExample) * | 1969-10-01 | 1971-07-16 | Udylite Corp |
-
1975
- 1975-09-10 AU AU84698/75A patent/AU8469875A/en not_active Expired
- 1975-09-18 DE DE19752541553 patent/DE2541553A1/de active Pending
- 1975-10-02 NL NL7511610A patent/NL7511610A/xx not_active Application Discontinuation
- 1975-10-02 FR FR7530237A patent/FR2303001A1/fr active Granted
-
1976
- 1976-01-29 JP JP51008050A patent/JPS5921393B2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2064070A1 (enExample) * | 1969-10-01 | 1971-07-16 | Udylite Corp |
Also Published As
| Publication number | Publication date |
|---|---|
| AU8469875A (en) | 1977-03-17 |
| NL7511610A (nl) | 1976-09-09 |
| JPS51104441A (enExample) | 1976-09-16 |
| DE2541553A1 (de) | 1976-09-23 |
| FR2303001B1 (enExample) | 1979-06-29 |
| JPS5921393B2 (ja) | 1984-05-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |