FR2303001A1 - Thioether sulphonates of nitriles or amides - useful additives to nickel plating baths to give high sulphur corrosion resistant nickel interlayers - Google Patents

Thioether sulphonates of nitriles or amides - useful additives to nickel plating baths to give high sulphur corrosion resistant nickel interlayers

Info

Publication number
FR2303001A1
FR2303001A1 FR7530237A FR7530237A FR2303001A1 FR 2303001 A1 FR2303001 A1 FR 2303001A1 FR 7530237 A FR7530237 A FR 7530237A FR 7530237 A FR7530237 A FR 7530237A FR 2303001 A1 FR2303001 A1 FR 2303001A1
Authority
FR
France
Prior art keywords
sulphonates
nitriles
thioether
amides
nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7530237A
Other languages
French (fr)
Other versions
FR2303001B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oxy Metal Industries Corp
Original Assignee
Oxy Metal Industries Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/556,232 external-priority patent/US3985784A/en
Application filed by Oxy Metal Industries Corp filed Critical Oxy Metal Industries Corp
Publication of FR2303001A1 publication Critical patent/FR2303001A1/en
Application granted granted Critical
Publication of FR2303001B1 publication Critical patent/FR2303001B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/64—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton
    • C07C323/66—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton containing sulfur atoms of sulfo, esterified sulfo or halosulfonyl groups, bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/625—Discontinuous layers, e.g. microcracked layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

Thioether sulphonates of nitriles or amides of formula (I) are claimed where M = Na, K, NH4 or H, R = 2-4 C alkylene gp., R1 = H, or 1-4 C alkyl gp., R2 = H, aryl or -(CH2-)m-Y where m = 1-2, Y = X or aryl gp., X = -CN or -CO-N(R3)-(R4), R3, R4 = H or 1-4 C alkyl and n = 0-3. (I) are esp. useful as additives to nickel plating baths, e.g. at 0.01-4 g/l., to give composite nickel platings on metals in which the intermediate layer of Ni contains 0.05-0.3% sulphur and the top layer contains 0.02-0.15% sulphur. The resulting platings have excellent corrosion resistance.
FR7530237A 1975-03-07 1975-10-02 Thioether sulphonates of nitriles or amides - useful additives to nickel plating baths to give high sulphur corrosion resistant nickel interlayers Granted FR2303001A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/556,232 US3985784A (en) 1972-07-10 1975-03-07 Thioether sulfonates for use in electroplating baths

Publications (2)

Publication Number Publication Date
FR2303001A1 true FR2303001A1 (en) 1976-10-01
FR2303001B1 FR2303001B1 (en) 1979-06-29

Family

ID=24220455

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7530237A Granted FR2303001A1 (en) 1975-03-07 1975-10-02 Thioether sulphonates of nitriles or amides - useful additives to nickel plating baths to give high sulphur corrosion resistant nickel interlayers

Country Status (5)

Country Link
JP (1) JPS5921393B2 (en)
AU (1) AU8469875A (en)
DE (1) DE2541553A1 (en)
FR (1) FR2303001A1 (en)
NL (1) NL7511610A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4384929A (en) * 1981-07-06 1983-05-24 Occidental Chemical Corporation Process for electro-depositing composite nickel layers

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2064070A1 (en) * 1969-10-01 1971-07-16 Udylite Corp

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2064070A1 (en) * 1969-10-01 1971-07-16 Udylite Corp

Also Published As

Publication number Publication date
DE2541553A1 (en) 1976-09-23
NL7511610A (en) 1976-09-09
AU8469875A (en) 1977-03-17
JPS51104441A (en) 1976-09-16
FR2303001B1 (en) 1979-06-29
JPS5921393B2 (en) 1984-05-19

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Legal Events

Date Code Title Description
ST Notification of lapse