FR2299666A2 - Proce - Google Patents

Proce

Info

Publication number
FR2299666A2
FR2299666A2 FR7502889A FR7502889A FR2299666A2 FR 2299666 A2 FR2299666 A2 FR 2299666A2 FR 7502889 A FR7502889 A FR 7502889A FR 7502889 A FR7502889 A FR 7502889A FR 2299666 A2 FR2299666 A2 FR 2299666A2
Authority
FR
France
Prior art keywords
pref
nitroso
free radical
angstroms
actinic radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7502889A
Other languages
English (en)
French (fr)
Other versions
FR2299666B2 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Priority to FR7502889A priority Critical patent/FR2299666A2/fr
Publication of FR2299666A2 publication Critical patent/FR2299666A2/fr
Application granted granted Critical
Publication of FR2299666B2 publication Critical patent/FR2299666B2/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7502889A 1975-01-30 1975-01-30 Proce Granted FR2299666A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7502889A FR2299666A2 (fr) 1975-01-30 1975-01-30 Proce

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7502889A FR2299666A2 (fr) 1975-01-30 1975-01-30 Proce

Publications (2)

Publication Number Publication Date
FR2299666A2 true FR2299666A2 (fr) 1976-08-27
FR2299666B2 FR2299666B2 (enExample) 1980-04-30

Family

ID=9150508

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7502889A Granted FR2299666A2 (fr) 1975-01-30 1975-01-30 Proce

Country Status (1)

Country Link
FR (1) FR2299666A2 (enExample)

Also Published As

Publication number Publication date
FR2299666B2 (enExample) 1980-04-30

Similar Documents

Publication Publication Date Title
AU650697B2 (en) Photosensitive polymeric printing medium and water developable printing plates
GB1535200A (en) Light-sensitive material for forming relief polymer image
JPS6130253B2 (enExample)
JPS5569265A (en) Pattern-forming method
EP0152114A3 (en) Method for making a dry planographic printing plate
JPS5436721A (en) Treatment of photographic photosensitive paper
FR2299666A2 (fr) Proce
NL7501162A (en) Photo-polymerisable positive copying system - contg. nitroso-dimer and free radical source activated by different actinic radiation
US3249436A (en) Process for preparing printing plates from photopolymerizable materials by the use of a masking technique
EP0052806B1 (en) Dot-enlargement process for photopolymer litho masks
EP0130581B1 (en) Enlargement of photopolymer images in photopolymer mask
JPS56167135A (en) Contact exposing method
GB1293722A (en) Photoresist process
ES8609752A1 (es) Un metodo para obtener una placa de impresion de relieve
JPS5347825A (en) Photoresist exposure
JPS57102015A (en) Pattern formation
JPS52143769A (en) Removing method of positive type photo resist
JPS5528256A (en) Method of forming fluorescent film
JPS5255867A (en) Exposure method
JPS53128277A (en) Projection exposure method for negative resist
JPS5283064A (en) Regist film forming method
JPS5366173A (en) Light exposure method
JPS533821A (en) Exposure method
JPS5218320A (en) Image forming method
JPS57205740A (en) Method for fixing negative type lithographic plate requiring no dampening water