FR2299666A2 - Photo-polymerisable positive copying system - contg. nitroso-dimer and free radical source activated by different actinic radiation - Google Patents
Photo-polymerisable positive copying system - contg. nitroso-dimer and free radical source activated by different actinic radiationInfo
- Publication number
- FR2299666A2 FR2299666A2 FR7502889A FR7502889A FR2299666A2 FR 2299666 A2 FR2299666 A2 FR 2299666A2 FR 7502889 A FR7502889 A FR 7502889A FR 7502889 A FR7502889 A FR 7502889A FR 2299666 A2 FR2299666 A2 FR 2299666A2
- Authority
- FR
- France
- Prior art keywords
- pref
- nitroso
- free radical
- angstroms
- actinic radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Polymeric positive images are produced on a substrate using a coating contg. a non-gaseous ethylenically unsatd. cpd. (I) which can be polymerised by free radical-initiated chain propagation, a nitroso-dimer (II), which can be photodissociated to nitroso monomers, and an organic, free radical-forming system (III), which can be activated by actinic radiation which does not cause photodissociation of (II). The material is exposed selectivity (pref. which radiation of wavelength below 3400 angstroms) to effect dissociation of (II), then at least the unexposed areas are exposed with actinic radiation (pref. of wavelength well above 3400 angstroms) and a polymeric positive image is developed. (III) pref. absorbs light in the 2000-8000 angstroms range and contains component(s) having an active light absorption band with a molar extinction coefft. of >50 in the 3400-8000 angstroms range. In particular, (III) is a benzoin ether, esp. benzoin methyl ether (IIIa), which is used in an amt. of 0.001-1.0 (wt.) pts./pt. (I). The (II) content pref. is 0.1-10, esp. 0.2-2%. Method is use in the prodn. of printed circuits, presensitised, positive-working lithographic printing plates, as photoresists, for the prodn. of colour correction images from colour print etc.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7502889A FR2299666A2 (en) | 1975-01-30 | 1975-01-30 | Photo-polymerisable positive copying system - contg. nitroso-dimer and free radical source activated by different actinic radiation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7502889A FR2299666A2 (en) | 1975-01-30 | 1975-01-30 | Photo-polymerisable positive copying system - contg. nitroso-dimer and free radical source activated by different actinic radiation |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2299666A2 true FR2299666A2 (en) | 1976-08-27 |
FR2299666B2 FR2299666B2 (en) | 1980-04-30 |
Family
ID=9150508
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7502889A Granted FR2299666A2 (en) | 1975-01-30 | 1975-01-30 | Photo-polymerisable positive copying system - contg. nitroso-dimer and free radical source activated by different actinic radiation |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2299666A2 (en) |
-
1975
- 1975-01-30 FR FR7502889A patent/FR2299666A2/en active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2299666B2 (en) | 1980-04-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU650697B2 (en) | Photosensitive polymeric printing medium and water developable printing plates | |
GB1535200A (en) | Light-sensitive material for forming relief polymer image | |
US4123272A (en) | Double-negative positive-working photohardenable elements | |
JPS5569265A (en) | Pattern-forming method | |
EP0152114A3 (en) | Method for making a dry planographic printing plate | |
JPS5436721A (en) | Treatment of photographic photosensitive paper | |
FR2299666A2 (en) | Photo-polymerisable positive copying system - contg. nitroso-dimer and free radical source activated by different actinic radiation | |
NL7501162A (en) | Photo-polymerisable positive copying system - contg. nitroso-dimer and free radical source activated by different actinic radiation | |
US3249436A (en) | Process for preparing printing plates from photopolymerizable materials by the use of a masking technique | |
EP0052806B1 (en) | Dot-enlargement process for photopolymer litho masks | |
JPS56167135A (en) | Contact exposing method | |
GB1293722A (en) | Photoresist process | |
ES8609752A1 (en) | Projected image relief printing plates. | |
JPS5354239A (en) | Method of bonding photosensitive flexographic plate and rubber backingmaterial | |
JPS5347825A (en) | Photoresist exposure | |
JPS57102015A (en) | Pattern formation | |
JPS52143769A (en) | Removing method of positive type photo resist | |
JPS53128277A (en) | Projection exposure method for negative resist | |
JPS5283064A (en) | Regist film forming method | |
JPS5366173A (en) | Light exposure method | |
JPS533821A (en) | Exposure method | |
JPS5560947A (en) | Fixing method of negative type lithographic printing plate which does not requier dampening water | |
JPS5655950A (en) | Photographic etching method | |
FR2307823A2 (en) | Positive working photo-polymerisable compsn. contg. nitroso dimer - giving sufficient monomer to consume free radicals formed on exposure | |
EP0012833A3 (en) | Process and apparatus for making lithographic printing plates |