FR2266302A1 - - Google Patents

Info

Publication number
FR2266302A1
FR2266302A1 FR7509903A FR7509903A FR2266302A1 FR 2266302 A1 FR2266302 A1 FR 2266302A1 FR 7509903 A FR7509903 A FR 7509903A FR 7509903 A FR7509903 A FR 7509903A FR 2266302 A1 FR2266302 A1 FR 2266302A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7509903A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fairchild Semiconductor Corp
Original Assignee
Fairchild Camera and Instrument Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fairchild Camera and Instrument Corp filed Critical Fairchild Camera and Instrument Corp
Publication of FR2266302A1 publication Critical patent/FR2266302A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • H10W20/40
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • H10P50/644
    • H10P50/667
    • H10P95/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/02Contacts, special
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/051Etching
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/122Polycrystalline
FR7509903A 1974-04-01 1975-03-28 Withdrawn FR2266302A1 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/456,499 US3936331A (en) 1974-04-01 1974-04-01 Process for forming sloped topography contact areas between polycrystalline silicon and single-crystal silicon

Publications (1)

Publication Number Publication Date
FR2266302A1 true FR2266302A1 (enExample) 1975-10-24

Family

ID=23813006

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7509903A Withdrawn FR2266302A1 (enExample) 1974-04-01 1975-03-28

Country Status (6)

Country Link
US (1) US3936331A (enExample)
JP (1) JPS5847852B2 (enExample)
CA (1) CA1019468A (enExample)
DE (1) DE2511773A1 (enExample)
FR (1) FR2266302A1 (enExample)
GB (1) GB1470264A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0083816A1 (en) * 1981-12-31 1983-07-20 Koninklijke Philips Electronics N.V. Semiconductor device having an interconnection pattern

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51114079A (en) * 1975-03-31 1976-10-07 Fujitsu Ltd Construction of semiconductor memory device
US4305760A (en) * 1978-12-22 1981-12-15 Ncr Corporation Polysilicon-to-substrate contact processing
JPS55153338A (en) * 1979-05-18 1980-11-29 Fujitsu Ltd Surface treatment of semiconductor substrate
JPS5638838A (en) * 1979-09-06 1981-04-14 Pioneer Electronic Corp Manufacture of semiconductor device
US4477963A (en) * 1980-12-23 1984-10-23 Gte Laboratories Incorporated Method of fabrication of a low capacitance self-aligned semiconductor electrode structure
JPS63198323A (ja) * 1987-02-13 1988-08-17 Mitsubishi Electric Corp 半導体装置およびその製造方法
KR900005871B1 (ko) * 1987-09-21 1990-08-13 삼성전자 주식회사 반도체 메모리소자의 제조방법
KR910010167B1 (ko) * 1988-06-07 1991-12-17 삼성전자 주식회사 스택 캐패시터 dram셀 및 그의 제조방법
US5068707A (en) * 1990-05-02 1991-11-26 Nec Electronics Inc. DRAM memory cell with tapered capacitor electrodes
JP3474286B2 (ja) * 1994-10-26 2003-12-08 株式会社半導体エネルギー研究所 薄膜トランジスタの作製方法
US5773346A (en) * 1995-12-06 1998-06-30 Micron Technology, Inc. Semiconductor processing method of forming a buried contact
US6436744B1 (en) 2001-03-16 2002-08-20 International Business Machines Corporation Method and structure for creating high density buried contact for use with SOI processes for high performance logic
DE102007010563A1 (de) * 2007-02-22 2008-08-28 IHP GmbH - Innovations for High Performance Microelectronics/Institut für innovative Mikroelektronik Selektives Wachstum von polykristallinem siliziumhaltigen Halbleitermaterial auf siliziumhaltiger Halbleiteroberfläche

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3768150A (en) * 1970-02-13 1973-10-30 B Sloan Integrated circuit process utilizing orientation dependent silicon etch
US3675319A (en) * 1970-06-29 1972-07-11 Bell Telephone Labor Inc Interconnection of electrical devices
US3761785A (en) * 1971-04-23 1973-09-25 Bell Telephone Labor Inc Methods for making transistor structures
JPS5217995B2 (enExample) * 1972-02-18 1977-05-19

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0083816A1 (en) * 1981-12-31 1983-07-20 Koninklijke Philips Electronics N.V. Semiconductor device having an interconnection pattern

Also Published As

Publication number Publication date
JPS50134576A (enExample) 1975-10-24
JPS5847852B2 (ja) 1983-10-25
US3936331A (en) 1976-02-03
GB1470264A (en) 1977-04-14
DE2511773A1 (de) 1975-10-09
CA1019468A (en) 1977-10-18

Similar Documents

Publication Publication Date Title
FR2266302A1 (enExample)
FI751817A7 (enExample)
DK91774A (enExample)
DK135982C (enExample)
DK139692C (enExample)
DK138212C (enExample)
DE2406094A1 (enExample)
DK137774A (enExample)
CH614948A5 (enExample)
CH573156A5 (enExample)
AU482019A (enExample)
AU482236A (enExample)
AU480247A (enExample)
AU481796A (enExample)
AU481082A (enExample)
DD115196A1 (enExample)
AU481078A (enExample)
AU481044A (enExample)
AU480981A (enExample)
AU480783A (enExample)
AU480759A (enExample)
DD111123A1 (enExample)
DD110512A1 (enExample)
BG19819A1 (enExample)
CH601943A5 (enExample)

Legal Events

Date Code Title Description
ST Notification of lapse