FR2238953A1 - - Google Patents

Info

Publication number
FR2238953A1
FR2238953A1 FR7425452A FR7425452A FR2238953A1 FR 2238953 A1 FR2238953 A1 FR 2238953A1 FR 7425452 A FR7425452 A FR 7425452A FR 7425452 A FR7425452 A FR 7425452A FR 2238953 A1 FR2238953 A1 FR 2238953A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7425452A
Other languages
French (fr)
Other versions
FR2238953B1 (ja
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of FR2238953A1 publication Critical patent/FR2238953A1/fr
Application granted granted Critical
Publication of FR2238953B1 publication Critical patent/FR2238953B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/695—Compositions containing azides as the photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Graft Or Block Polymers (AREA)
FR7425452A 1973-07-23 1974-07-23 Expired FR2238953B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8284973A JPS5140452B2 (ja) 1973-07-23 1973-07-23

Publications (2)

Publication Number Publication Date
FR2238953A1 true FR2238953A1 (ja) 1975-02-21
FR2238953B1 FR2238953B1 (ja) 1977-10-21

Family

ID=13785815

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7425452A Expired FR2238953B1 (ja) 1973-07-23 1974-07-23

Country Status (5)

Country Link
JP (1) JPS5140452B2 (ja)
DE (1) DE2435390A1 (ja)
FR (1) FR2238953B1 (ja)
GB (1) GB1475599A (ja)
IT (1) IT1016966B (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0001597A1 (de) * 1977-10-14 1979-05-02 Ciba-Geigy Ag Unter der Einwirkung von Licht härtbare, Bis-Azidophthalimidyl-Derivate enthaltende Stoffgemische
FR2486259A1 (fr) * 1980-07-03 1982-01-08 Rca Corp Procede pour la realisation de configurations en relief de surface, en vue d'applications micro-lithographiques
EP0189271A2 (en) * 1985-01-18 1986-07-30 Hitachi Chemical Co., Ltd. Photosensitive composition

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5294632A (en) * 1976-02-04 1977-08-09 Mitsui Constr Transfer method in compressed air of material lock and its device
US4556625A (en) * 1982-07-09 1985-12-03 Armstrong World Industries, Inc. Development of a colored image on a cellulosic material with monosulfonyl azides
EP2562599B1 (en) 2009-01-29 2014-12-10 Digiflex Ltd. Process for producing a photomask on a photopolymeric surface

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1572068C3 (de) * 1966-03-12 1976-01-08 Hoechst Ag, 6000 Frankfurt Lichtempfindliche Schicht zur Herstellung von Druckformen
DE1294191B (de) * 1967-07-06 1969-07-31 Kalle Ag Lichtempfindliches Kopiermaterial mit einer lichtvernetzbaren Schicht
DE1597614B2 (de) * 1967-07-07 1977-06-23 Hoechst Ag, 6000 Frankfurt Lichtempfindliche kopiermasse

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0001597A1 (de) * 1977-10-14 1979-05-02 Ciba-Geigy Ag Unter der Einwirkung von Licht härtbare, Bis-Azidophthalimidyl-Derivate enthaltende Stoffgemische
FR2486259A1 (fr) * 1980-07-03 1982-01-08 Rca Corp Procede pour la realisation de configurations en relief de surface, en vue d'applications micro-lithographiques
EP0189271A2 (en) * 1985-01-18 1986-07-30 Hitachi Chemical Co., Ltd. Photosensitive composition
EP0189271A3 (en) * 1985-01-18 1988-03-30 Hitachi Chemical Co., Ltd. Photosensitive composition

Also Published As

Publication number Publication date
DE2435390A1 (de) 1975-02-13
GB1475599A (en) 1977-06-01
JPS5140452B2 (ja) 1976-11-04
FR2238953B1 (ja) 1977-10-21
IT1016966B (it) 1977-06-20
JPS5032924A (ja) 1975-03-29

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Legal Events

Date Code Title Description
ST Notification of lapse