FR2231114B1 - - Google Patents

Info

Publication number
FR2231114B1
FR2231114B1 FR7417676A FR7417676A FR2231114B1 FR 2231114 B1 FR2231114 B1 FR 2231114B1 FR 7417676 A FR7417676 A FR 7417676A FR 7417676 A FR7417676 A FR 7417676A FR 2231114 B1 FR2231114 B1 FR 2231114B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7417676A
Other languages
French (fr)
Other versions
FR2231114A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Semiconductor Research Foundation
Original Assignee
Mitsubishi Electric Corp
Semiconductor Research Foundation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp, Semiconductor Research Foundation filed Critical Mitsubishi Electric Corp
Publication of FR2231114A1 publication Critical patent/FR2231114A1/fr
Application granted granted Critical
Publication of FR2231114B1 publication Critical patent/FR2231114B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/80—FETs having rectifying junction gate electrodes
    • H10D30/83—FETs having PN junction gate electrodes
    • H10D30/831—Vertical FETs having PN junction gate electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W44/00—Electrical arrangements for controlling or matching impedance
    • H10W44/501—Inductive arrangements
FR7417676A 1973-05-22 1974-05-21 Transistor à effet de champ Granted FR2231114A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5805473A JPS5546068B2 (enExample) 1973-05-22 1973-05-22

Publications (2)

Publication Number Publication Date
FR2231114A1 FR2231114A1 (fr) 1974-12-20
FR2231114B1 true FR2231114B1 (enExample) 1978-11-24

Family

ID=13073188

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7417676A Granted FR2231114A1 (fr) 1973-05-22 1974-05-21 Transistor à effet de champ

Country Status (7)

Country Link
US (1) US4297718A (enExample)
JP (1) JPS5546068B2 (enExample)
CA (1) CA1003121A (enExample)
DE (1) DE2424947C2 (enExample)
FR (1) FR2231114A1 (enExample)
NL (1) NL7406911A (enExample)
SE (2) SE423657B (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5811756B2 (ja) * 1974-11-29 1983-03-04 三菱電機株式会社 デンカイコウカハンドウタイソシ オヨビ ソノソウチ
JPS5562775A (en) * 1978-11-02 1980-05-12 Matsushita Electric Ind Co Ltd Field-effect transistor
US4463366A (en) * 1980-06-20 1984-07-31 Nippon Telegraph & Telephone Public Corp. Field effect transistor with combination Schottky-junction gate
US4361814A (en) * 1980-09-29 1982-11-30 Rockwell International Corporation Distributed optical parametric amplifier
FR2501913A1 (fr) * 1981-03-10 1982-09-17 Thomson Csf Transistor a effet de champ de type planar comportant des electrodes a puits metallises et procede de fabrication de ce transistor
US4507845A (en) * 1983-09-12 1985-04-02 Trw Inc. Method of making field effect transistors with opposed source _and gate regions
US4587713A (en) * 1984-02-22 1986-05-13 Rca Corporation Method for making vertical MOSFET with reduced bipolar effects
US4837606A (en) * 1984-02-22 1989-06-06 General Electric Company Vertical MOSFET with reduced bipolar effects
EP0156585A3 (en) * 1984-03-21 1987-03-25 Plessey Overseas Limited Travelling-wave field-effect transistor
US4797716A (en) * 1984-04-04 1989-01-10 The United States Of America As Represented By The United States Department Of Energy Field-effect transistor having a superlattice channel and high carrier velocities at high applied fields
US4700460A (en) * 1986-05-30 1987-10-20 Rca Corporation Method for fabricating bidirectional vertical power MOS device
US4641164A (en) * 1986-05-30 1987-02-03 Rca Corporation Bidirectional vertical power MOS device and fabrication method
FR2608318B1 (fr) * 1986-12-16 1989-06-16 Thomson Semiconducteurs Dispositif semi-conducteur a faible bruit en hyperfrequence, monte dans un boitier
US5057886A (en) * 1988-12-21 1991-10-15 Texas Instruments Incorporated Non-volatile memory with improved coupling between gates
US5627389A (en) * 1994-07-15 1997-05-06 Schary; Alison High-frequency traveling wave field-effect transistor
US6563150B1 (en) 2000-07-25 2003-05-13 Alison Schary High frequency field effect transistor
US7791160B2 (en) 2006-10-19 2010-09-07 International Business Machines Corporation High-performance FET device layout
US7689946B2 (en) * 2006-10-19 2010-03-30 International Business Machines Corporation High-performance FET device layout
JPWO2017043611A1 (ja) * 2015-09-10 2018-06-21 古河電気工業株式会社 パワーデバイス

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL299911A (enExample) * 1951-08-02
US3011104A (en) * 1959-07-31 1961-11-28 Watanabe Yasushi Semiconductor diodes
DE1789084B2 (de) * 1961-08-17 1973-05-30 Rca Corp., New York, N.Y. (V.St.A.) Duennschicht-verknuepfungsglied und verfahren zu seiner herstellung
US3436689A (en) * 1964-11-02 1969-04-01 Us Navy Field effect delay line
GB1155578A (en) * 1965-10-08 1969-06-18 Sony Corp Field Effect Transistor
US3427514A (en) * 1966-10-13 1969-02-11 Rca Corp Mos tetrode
AT280348B (de) * 1968-07-30 1970-04-10 H C Hans Dipl Ing Dr Dr List Integrierter Feld-Effekt-Kettenverstärker
DE2058702A1 (de) * 1970-11-28 1972-06-29 Licentia Gmbh Feldeffekttransistor
NL7303347A (enExample) * 1972-03-10 1973-09-12
US3905036A (en) * 1974-03-29 1975-09-09 Gen Electric Field effect transistor devices and methods of making same

Also Published As

Publication number Publication date
NL7406911A (nl) 1974-11-26
JPS5546068B2 (enExample) 1980-11-21
SE7710301L (sv) 1977-09-14
CA1003121A (en) 1977-01-04
SE7710302L (sv) 1977-09-14
SE423657B (sv) 1982-05-17
US4297718A (en) 1981-10-27
DE2424947A1 (de) 1974-12-05
FR2231114A1 (fr) 1974-12-20
JPS5012982A (enExample) 1975-02-10
DE2424947C2 (de) 1982-12-16
SE424119B (sv) 1982-06-28

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