FR2201533A1 - - Google Patents

Info

Publication number
FR2201533A1
FR2201533A1 FR7330310A FR7330310A FR2201533A1 FR 2201533 A1 FR2201533 A1 FR 2201533A1 FR 7330310 A FR7330310 A FR 7330310A FR 7330310 A FR7330310 A FR 7330310A FR 2201533 A1 FR2201533 A1 FR 2201533A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7330310A
Other versions
FR2201533B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LINFIELD RESEARCH INST
Original Assignee
LINFIELD RESEARCH INST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LINFIELD RESEARCH INST filed Critical LINFIELD RESEARCH INST
Publication of FR2201533A1 publication Critical patent/FR2201533A1/fr
Application granted granted Critical
Publication of FR2201533B1 publication Critical patent/FR2201533B1/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • H01J37/073Electron guns using field emission, photo emission, or secondary emission electron sources
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/022Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06Sources
    • H01J2237/063Electron sources
    • H01J2237/06308Thermionic sources
    • H01J2237/06316Schottky emission

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
FR7330310A 1972-09-29 1973-08-21 Expired FR2201533B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00293322A US3817592A (en) 1972-09-29 1972-09-29 Method for reproducibly fabricating and using stable thermal-field emission cathodes

Publications (2)

Publication Number Publication Date
FR2201533A1 true FR2201533A1 (fr) 1974-04-26
FR2201533B1 FR2201533B1 (fr) 1977-05-13

Family

ID=23128615

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7330310A Expired FR2201533B1 (fr) 1972-09-29 1973-08-21

Country Status (7)

Country Link
US (1) US3817592A (fr)
JP (1) JPS585496B2 (fr)
CA (1) CA1014602A (fr)
DE (1) DE2345096A1 (fr)
FR (1) FR2201533B1 (fr)
GB (1) GB1445695A (fr)
NL (1) NL7313420A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0817232A1 (fr) * 1996-07-02 1998-01-07 Pixtech S.A. Procédé de régénération de micropointes d'un écran plat de visualisation

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3947716A (en) * 1973-08-27 1976-03-30 The United States Of America As Represented By The Secretary Of The Army Field emission tip and process for making same
JPS5062766A (fr) * 1973-10-05 1975-05-28
US3919580A (en) * 1974-09-11 1975-11-11 Us Energy Relativistic electron beam generator
US4324999A (en) * 1980-04-30 1982-04-13 Burroughs Corporation Electron-beam cathode having a uniform emission pattern
US4486684A (en) * 1981-05-26 1984-12-04 International Business Machines Corporation Single crystal lanthanum hexaboride electron beam emitter having high brightness
US4588928A (en) * 1983-06-15 1986-05-13 At&T Bell Laboratories Electron emission system
JPS60225345A (ja) * 1984-04-20 1985-11-09 Hitachi Ltd 電界放射方法およびそれに用いる電子線装置
EP0287774A3 (fr) * 1987-04-24 1990-03-07 Balzers Aktiengesellschaft Cathode thermionique en épingle à cheveux
US5012194A (en) * 1989-09-05 1991-04-30 Raytheon Company Method testing electron discharge tubes
DE4040201C2 (de) * 1990-12-15 1994-11-24 Hell Ag Linotype Verfahren zum wartungsarmen Betrieb einer Vorrichtung zur Herstellung einer Oberflächenstruktur und Vorrichtung zur Durchführung des Verfahrens
FR2707795B1 (fr) * 1993-07-12 1995-08-11 Commissariat Energie Atomique Perfectionnement à un procédé de fabrication d'une source d'électrons à micropointes.
JP2807668B2 (ja) * 1997-03-27 1998-10-08 株式会社日立製作所 電子ビーム欠陥検査方法および装置
US9159527B2 (en) * 2003-10-16 2015-10-13 Carl Zeiss Microscopy, Llc Systems and methods for a gas field ionization source
JP2006059513A (ja) * 2004-07-22 2006-03-02 Kuresutetsuku:Kk 電子ビーム照射装置および描画装置
US7888654B2 (en) * 2007-01-24 2011-02-15 Fei Company Cold field emitter
US8736170B1 (en) 2011-02-22 2014-05-27 Fei Company Stable cold field emission electron source
CN102629538B (zh) 2012-04-13 2014-03-19 吴江炀晟阴极材料有限公司 具有低逸出功和高化学稳定性的电极材料
US9697983B1 (en) * 2016-02-29 2017-07-04 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Thermal field emitter tip, electron beam device including a thermal field emitter tip and method for operating an electron beam device
US11887805B2 (en) 2021-09-30 2024-01-30 Fei Company Filament-less electron source
WO2024018570A1 (fr) * 2022-07-20 2024-01-25 株式会社日立ハイテク Source de particules chargées, canon à particules chargées et dispositif à faisceau de particules chargées

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3374386A (en) * 1964-11-02 1968-03-19 Field Emission Corp Field emission cathode having tungsten miller indices 100 plane coated with zirconium, hafnium or magnesium on oxygen binder
US3356887A (en) * 1965-07-30 1967-12-05 Frederick C W Heil Fe cathode redesign

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
ARTICLE DE F. OKUYAMA ET AL, INTITULE "NEW METHOD FOR PREPARING UN-USUALLY ORIENTED TUNGSTEN TIPS AND THEIR GROWTH MECHANISM", PARU DANS LA *REVUE "JAPANESE JOURNAL OF APPLIED PHYSICS", VOLUME 9, NO. 1, JANVIER 1970, PAGES 15 A 23) *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0817232A1 (fr) * 1996-07-02 1998-01-07 Pixtech S.A. Procédé de régénération de micropointes d'un écran plat de visualisation
FR2750785A1 (fr) * 1996-07-02 1998-01-09 Pixtech Sa Procede de regeneration de micropointes d'un ecran plat de visualisation

Also Published As

Publication number Publication date
CA1014602A (en) 1977-07-26
US3817592A (en) 1974-06-18
GB1445695A (en) 1976-08-11
NL7313420A (fr) 1974-04-02
JPS585496B2 (ja) 1983-01-31
JPS4973967A (fr) 1974-07-17
FR2201533B1 (fr) 1977-05-13
DE2345096A1 (de) 1974-04-04

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Legal Events

Date Code Title Description
ST Notification of lapse