FR2192378A1 - - Google Patents
Info
- Publication number
- FR2192378A1 FR2192378A1 FR7325121A FR7325121A FR2192378A1 FR 2192378 A1 FR2192378 A1 FR 2192378A1 FR 7325121 A FR7325121 A FR 7325121A FR 7325121 A FR7325121 A FR 7325121A FR 2192378 A1 FR2192378 A1 FR 2192378A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P52/00—
-
- H10P50/242—
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6839872A JPS523775B2 (enExample) | 1972-07-08 | 1972-07-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2192378A1 true FR2192378A1 (enExample) | 1974-02-08 |
| FR2192378B1 FR2192378B1 (enExample) | 1977-09-02 |
Family
ID=13372538
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7325121A Expired FR2192378B1 (enExample) | 1972-07-08 | 1973-07-09 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS523775B2 (enExample) |
| DE (1) | DE2334658C3 (enExample) |
| FR (1) | FR2192378B1 (enExample) |
| GB (1) | GB1398940A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0644592B2 (ja) * | 1984-10-25 | 1994-06-08 | 日本電気株式会社 | 半導体装置の製造方法 |
| US6642127B2 (en) * | 2001-10-19 | 2003-11-04 | Applied Materials, Inc. | Method for dicing a semiconductor wafer |
| CN103341692A (zh) * | 2013-06-26 | 2013-10-09 | 京东方科技集团股份有限公司 | 切割不规则图形基板的方法和显示装置 |
| JP7102065B2 (ja) * | 2018-06-20 | 2022-07-19 | 株式会社ディスコ | チップの製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3615956A (en) * | 1969-03-27 | 1971-10-26 | Signetics Corp | Gas plasma vapor etching process |
-
1972
- 1972-07-08 JP JP6839872A patent/JPS523775B2/ja not_active Expired
-
1973
- 1973-07-06 GB GB3238173A patent/GB1398940A/en not_active Expired
- 1973-07-07 DE DE2334658A patent/DE2334658C3/de not_active Expired
- 1973-07-09 FR FR7325121A patent/FR2192378B1/fr not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3615956A (en) * | 1969-03-27 | 1971-10-26 | Signetics Corp | Gas plasma vapor etching process |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2192378B1 (enExample) | 1977-09-02 |
| JPS523775B2 (enExample) | 1977-01-29 |
| DE2334658C3 (de) | 1978-11-23 |
| DE2334658A1 (de) | 1974-01-24 |
| JPS4928270A (enExample) | 1974-03-13 |
| DE2334658B2 (de) | 1978-03-30 |
| GB1398940A (en) | 1975-06-25 |