FR2171724A5 - - Google Patents
Info
- Publication number
- FR2171724A5 FR2171724A5 FR7245032A FR7245032A FR2171724A5 FR 2171724 A5 FR2171724 A5 FR 2171724A5 FR 7245032 A FR7245032 A FR 7245032A FR 7245032 A FR7245032 A FR 7245032A FR 2171724 A5 FR2171724 A5 FR 2171724A5
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US22308272A | 1972-02-03 | 1972-02-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2171724A5 true FR2171724A5 (ru) | 1973-09-21 |
Family
ID=22834951
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7245032A Expired FR2171724A5 (ru) | 1972-02-03 | 1972-12-18 |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPS4887904A (ru) |
| BE (1) | BE791212A (ru) |
| CA (1) | CA981507A (ru) |
| DE (1) | DE2259180A1 (ru) |
| FR (1) | FR2171724A5 (ru) |
| GB (1) | GB1387350A (ru) |
| IT (1) | IT972853B (ru) |
| NL (1) | NL7215272A (ru) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2316625A1 (fr) * | 1975-06-30 | 1977-01-28 | Ibm | Procede d'obtention d'image photoresistante negative |
| EP0049840A2 (de) * | 1980-10-13 | 1982-04-21 | Hoechst Aktiengesellschaft | Verfahren zur Herstellung von Reliefkopien |
| EP0307596A2 (de) * | 1987-09-15 | 1989-03-22 | Schering Aktiengesellschaft | Verfahren zur Herstellung von Leiternetzwerken |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5228370B2 (ru) * | 1972-03-06 | 1977-07-26 | ||
| JPS5890636A (ja) * | 1981-11-24 | 1983-05-30 | Fuji Photo Film Co Ltd | 光重合性組成物を用いた感光材料による画像形成方法および現像ユニツト |
| US4389482A (en) * | 1981-12-14 | 1983-06-21 | International Business Machines Corporation | Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light |
| JPH1026834A (ja) * | 1996-07-09 | 1998-01-27 | Tokyo Ohka Kogyo Co Ltd | 画像形成方法 |
| US11581187B2 (en) * | 2018-12-20 | 2023-02-14 | Xia Tai Xin Semiconductor (Qing Dao) Ltd. | Method of heating SOC film on wafer by electromagnetic wave generator and heating apparatus using the same |
-
0
- BE BE791212D patent/BE791212A/xx unknown
-
1972
- 1972-10-10 CA CA153,534A patent/CA981507A/en not_active Expired
- 1972-10-11 GB GB4680472A patent/GB1387350A/en not_active Expired
- 1972-11-10 NL NL7215272A patent/NL7215272A/xx not_active Application Discontinuation
- 1972-12-02 DE DE19722259180 patent/DE2259180A1/de active Pending
- 1972-12-18 FR FR7245032A patent/FR2171724A5/fr not_active Expired
- 1972-12-22 IT IT3350772A patent/IT972853B/it active
-
1973
- 1973-01-30 JP JP1166773A patent/JPS4887904A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2316625A1 (fr) * | 1975-06-30 | 1977-01-28 | Ibm | Procede d'obtention d'image photoresistante negative |
| EP0049840A2 (de) * | 1980-10-13 | 1982-04-21 | Hoechst Aktiengesellschaft | Verfahren zur Herstellung von Reliefkopien |
| EP0049840A3 (en) * | 1980-10-13 | 1982-05-19 | Hoechst Aktiengesellschaft | Process for the production of relief copies |
| US4421844A (en) | 1980-10-13 | 1983-12-20 | Hoechst Aktiengesellschaft | Process for the preparation of relief copies |
| EP0307596A2 (de) * | 1987-09-15 | 1989-03-22 | Schering Aktiengesellschaft | Verfahren zur Herstellung von Leiternetzwerken |
| EP0307596A3 (de) * | 1987-09-15 | 1990-08-08 | Schering Aktiengesellschaft | Verfahren zur Herstellung von Leiternetzwerken |
Also Published As
| Publication number | Publication date |
|---|---|
| BE791212A (fr) | 1973-03-01 |
| CA981507A (en) | 1976-01-13 |
| IT972853B (it) | 1974-05-31 |
| JPS4887904A (ru) | 1973-11-19 |
| NL7215272A (ru) | 1973-08-07 |
| GB1387350A (en) | 1975-03-19 |
| DE2259180A1 (de) | 1973-08-09 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |