FR2139981A1 - - Google Patents
Info
- Publication number
- FR2139981A1 FR2139981A1 FR7218944A FR7218944A FR2139981A1 FR 2139981 A1 FR2139981 A1 FR 2139981A1 FR 7218944 A FR7218944 A FR 7218944A FR 7218944 A FR7218944 A FR 7218944A FR 2139981 A1 FR2139981 A1 FR 2139981A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US00148238A US3823130A (en) | 1971-05-28 | 1971-05-28 | Light sensitive esters of naphthoquinone-1,2-diazide-(2)-5-sulfonicacids with cyclohexylmethanol or secondary or tertiary alkanols of up to six carbon atoms |
| US16413171A | 1971-07-19 | 1971-07-19 | |
| US16955171A | 1971-08-05 | 1971-08-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2139981A1 true FR2139981A1 (de) | 1973-01-12 |
| FR2139981B1 FR2139981B1 (de) | 1973-07-13 |
Family
ID=27386662
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7218944A Expired FR2139981B1 (de) | 1971-05-28 | 1972-05-26 |
Country Status (9)
| Country | Link |
|---|---|
| JP (2) | JPS5724341B1 (de) |
| BE (1) | BE783962A (de) |
| CA (1) | CA977338A (de) |
| CH (1) | CH566574A5 (de) |
| FR (1) | FR2139981B1 (de) |
| GB (1) | GB1398641A (de) |
| IT (1) | IT958100B (de) |
| NL (1) | NL171264C (de) |
| SE (1) | SE394811B (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0147596A2 (de) * | 1983-12-30 | 1985-07-10 | International Business Machines Corporation | Positive lichtempfindliche lithographische Lackzusammensetzung |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5820393Y2 (ja) * | 1980-12-19 | 1983-04-27 | 徳三 長田 | ガイドペン |
| GB2127175A (en) * | 1982-09-07 | 1984-04-04 | Letraset International Ltd | Manufacture of signs |
| US5272026A (en) * | 1987-12-18 | 1993-12-21 | Ucb S.A. | Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article |
| GB8729510D0 (en) * | 1987-12-18 | 1988-02-03 | Ucb Sa | Photosensitive compositions containing phenolic resins & diazoquinone compounds |
| JPH0489469A (ja) * | 1990-07-27 | 1992-03-23 | Fuji Photo Film Co Ltd | ２−ジアゾ−１，２−キノン誘導体、及びそれを用いた画像形成材料 |
-
1972
- 1972-05-25 BE BE783962A patent/BE783962A/xx not_active IP Right Cessation
- 1972-05-26 NL NL7207131A patent/NL171264C/xx not_active IP Right Cessation
- 1972-05-26 SE SE693972A patent/SE394811B/xx unknown
- 1972-05-26 CH CH788972A patent/CH566574A5/xx not_active IP Right Cessation
- 1972-05-26 FR FR7218944A patent/FR2139981B1/fr not_active Expired
- 1972-05-26 CA CA143,217A patent/CA977338A/en not_active Expired
- 1972-05-26 GB GB2505872A patent/GB1398641A/en not_active Expired
- 1972-05-26 IT IT5054072A patent/IT958100B/it active
- 1972-05-27 JP JP5220172A patent/JPS5724341B1/ja active Pending
-
1978
- 1978-12-13 JP JP15326478A patent/JPS5494024A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0147596A2 (de) * | 1983-12-30 | 1985-07-10 | International Business Machines Corporation | Positive lichtempfindliche lithographische Lackzusammensetzung |
| EP0147596A3 (de) * | 1983-12-30 | 1987-03-04 | International Business Machines Corporation | Positive lichtempfindliche lithographische Lackzusammensetzung |
Also Published As
| Publication number | Publication date |
|---|---|
| NL7207131A (de) | 1972-11-30 |
| CA977338A (en) | 1975-11-04 |
| SE394811B (sv) | 1977-07-11 |
| DE2224843B2 (de) | 1976-07-29 |
| JPS552615B2 (de) | 1980-01-21 |
| GB1398641A (en) | 1975-06-25 |
| CH566574A5 (de) | 1975-09-15 |
| BE783962A (fr) | 1972-11-27 |
| FR2139981B1 (de) | 1973-07-13 |
| DE2224843A1 (de) | 1972-12-14 |
| JPS5724341B1 (de) | 1982-05-24 |
| JPS5494024A (en) | 1979-07-25 |
| NL171264C (nl) | 1983-03-01 |
| IT958100B (it) | 1973-10-20 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |