FR2137942B1 - - Google Patents

Info

Publication number
FR2137942B1
FR2137942B1 FR7217434A FR7217434A FR2137942B1 FR 2137942 B1 FR2137942 B1 FR 2137942B1 FR 7217434 A FR7217434 A FR 7217434A FR 7217434 A FR7217434 A FR 7217434A FR 2137942 B1 FR2137942 B1 FR 2137942B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7217434A
Other versions
FR2137942A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Uniroyal Inc
Original Assignee
Uniroyal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Uniroyal Inc filed Critical Uniroyal Inc
Publication of FR2137942A1 publication Critical patent/FR2137942A1/fr
Application granted granted Critical
Publication of FR2137942B1 publication Critical patent/FR2137942B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F287/00—Macromolecular compounds obtained by polymerising monomers on to block polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Graft Or Block Polymers (AREA)
  • Materials For Photolithography (AREA)
FR7217434A 1971-05-17 1972-05-16 Expired FR2137942B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14432371A 1971-05-17 1971-05-17

Publications (2)

Publication Number Publication Date
FR2137942A1 FR2137942A1 (fr) 1972-12-29
FR2137942B1 true FR2137942B1 (fr) 1976-06-11

Family

ID=22508084

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7217434A Expired FR2137942B1 (fr) 1971-05-17 1972-05-16

Country Status (7)

Country Link
AU (1) AU4228872A (fr)
CA (1) CA1101586A (fr)
DE (1) DE2223808A1 (fr)
FR (1) FR2137942B1 (fr)
GB (1) GB1395822A (fr)
IT (1) IT958889B (fr)
NL (1) NL7206691A (fr)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52503A (en) * 1975-10-17 1977-01-05 Tokyo Ouka Kougiyou Kk Photoosensitive resin composition for flexo graphic printing
US4045231A (en) * 1975-03-15 1977-08-30 Tokyo Ohka Kogyo Kabushiki Kaisha Photosensitive resin composition for flexographic printing plates
JPS51106501A (ja) * 1975-03-15 1976-09-21 Tokyo Ohka Kogyo Co Ltd Furekisobanyokankoseijushisoseibutsu
JPS53127004A (en) * 1977-04-11 1978-11-06 Asahi Chemical Ind Photosensitive elastomer composition
US4234676A (en) 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
US4179531A (en) 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
US4177074A (en) * 1978-01-25 1979-12-04 E. I. Du Pont De Nemours And Company Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates
US4292150A (en) * 1979-06-26 1981-09-29 Uniroyal, Inc. Iodine treated elastomeric article
JPS5922219B2 (ja) * 1980-07-07 1984-05-25 東京応化工業株式会社 フレキソ印刷版用感光性樹脂組成物
US4684600A (en) * 1981-02-02 1987-08-04 Uniroyal Plastics Co., Inc. Compressible photopolymer printing plate
US4547453A (en) * 1981-02-02 1985-10-15 Uniroyal, Inc. Compressible photopolymer printing plate
CA1203107A (fr) * 1982-08-31 1986-04-15 Uniroyal, Inc. Composition a base de polymere elastomere photosensible pour cliches de flexographie a traiter dans une solution basique semi-aqueuse ou un solvant
DE3415044C2 (de) * 1984-04-21 1986-12-04 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Verfahren zum Ozonschutz von Fotopolymer-Flexodruckformen durch alkohollösliche Polyamide
GB2163435B (en) * 1984-07-11 1987-07-22 Asahi Chemical Ind Image-forming materials sensitive to high-energy beam
US4702994A (en) * 1984-10-01 1987-10-27 W. R. Grace & Co. Projection imaged relief printing plates
DE3630474A1 (de) * 1986-09-06 1988-03-10 Basf Ag Verfahren zur herstellung von aufzeichnungsschichten und deren verwendung zur herstellung von flexodruckformen
US4839261A (en) * 1986-09-29 1989-06-13 Asahi Kasei Kogyo Kabushiki Kaisha Photocurable laminate
DE3810096A1 (de) * 1988-03-29 1989-10-05 Kendall & Co Verfahren zum verbinden zweier substrate und dafuer geeignete zusammensetzung
DE3841853A1 (de) * 1988-12-13 1990-06-21 Hoechst Ag Photopolymerisierbares elastomeres gemisch und dieses enthaltendes aufzeichnungsmaterial fuer die herstellung von ozonresistenten flexodruckformen
DE3841854A1 (de) * 1988-12-13 1990-06-21 Hoechst Ag Verfahren zur herstellung einer ozonresistenten flexodruckform
NZ237919A (en) * 1990-04-26 1994-09-27 Grace W R & Co Photocurable element comprising photocurable base layer and a photocurable printing layer which comprises two incompatible elastomeric polymers and a photopolymerisable monomer, base layer comprising elastomer, monomer and photoinitiator; relief printing plates
US5679485A (en) * 1993-03-31 1997-10-21 Nippon Zeon Co., Ltd. Photosensitive composition, photosensitive rubber plate and process for producing same, and flexographic plate and process for producing same
JPH1031303A (ja) * 1994-09-29 1998-02-03 Nippon Zeon Co Ltd 感光性組成物及び感光性ゴム版
CN101981121B (zh) 2008-03-31 2013-02-06 日本瑞翁株式会社 嵌段共聚物组合物、其制备方法及薄膜
WO2010074270A1 (fr) 2008-12-26 2010-07-01 日本ゼオン株式会社 Composition de copolymère à blocs, film et procédé de fabrication d'une composition de copolymère à blocs
JP5527220B2 (ja) 2008-12-26 2014-06-18 日本ゼオン株式会社 ブロック共重合体組成物およびホットメルト粘接着剤組成物
EP2402817B1 (fr) * 2009-02-27 2014-01-22 Zeon Corporation Composition de copolymères séquencés pour des plaques d'impression flexographique
WO2010113883A1 (fr) 2009-03-31 2010-10-07 日本ゼオン株式会社 Composition adhésive pour étiquettes
WO2010113882A1 (fr) 2009-03-31 2010-10-07 日本ゼオン株式会社 Composition pour film étirable
US8722800B2 (en) 2009-06-30 2014-05-13 Zeon Corporation Composition for stretchable film

Also Published As

Publication number Publication date
NL7206691A (fr) 1972-11-21
DE2223808A1 (de) 1972-12-07
IT958889B (it) 1973-10-30
GB1395822A (en) 1975-05-29
FR2137942A1 (fr) 1972-12-29
AU4228872A (en) 1973-11-22
CA1101586A (fr) 1981-05-19

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Legal Events

Date Code Title Description
ST Notification of lapse