NL7206691A - - Google Patents
Info
- Publication number
- NL7206691A NL7206691A NL7206691A NL7206691A NL7206691A NL 7206691 A NL7206691 A NL 7206691A NL 7206691 A NL7206691 A NL 7206691A NL 7206691 A NL7206691 A NL 7206691A NL 7206691 A NL7206691 A NL 7206691A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F287/00—Macromolecular compounds obtained by polymerising monomers on to block polymers
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14432371A | 1971-05-17 | 1971-05-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7206691A true NL7206691A (xx) | 1972-11-21 |
Family
ID=22508084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7206691A NL7206691A (xx) | 1971-05-17 | 1972-05-17 |
Country Status (7)
| Country | Link |
|---|---|
| AU (1) | AU4228872A (xx) |
| CA (1) | CA1101586A (xx) |
| DE (1) | DE2223808A1 (xx) |
| FR (1) | FR2137942B1 (xx) |
| GB (1) | GB1395822A (xx) |
| IT (1) | IT958889B (xx) |
| NL (1) | NL7206691A (xx) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51106501A (ja) * | 1975-03-15 | 1976-09-21 | Tokyo Ohka Kogyo Co Ltd | Furekisobanyokankoseijushisoseibutsu |
| JPS52503A (en) * | 1975-10-17 | 1977-01-05 | Tokyo Ouka Kougiyou Kk | Photoosensitive resin composition for flexo graphic printing |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4045231A (en) * | 1975-03-15 | 1977-08-30 | Tokyo Ohka Kogyo Kabushiki Kaisha | Photosensitive resin composition for flexographic printing plates |
| JPS53127004A (en) * | 1977-04-11 | 1978-11-06 | Asahi Chemical Ind | Photosensitive elastomer composition |
| US4234676A (en) | 1978-01-23 | 1980-11-18 | W. R. Grace & Co. | Polythiol effect curable polymeric composition |
| US4179531A (en) | 1977-08-23 | 1979-12-18 | W. R. Grace & Co. | Polythiol effect, curable monoalkenyl aromatic-diene and ene composition |
| US4177074A (en) * | 1978-01-25 | 1979-12-04 | E. I. Du Pont De Nemours And Company | Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates |
| US4292150A (en) * | 1979-06-26 | 1981-09-29 | Uniroyal, Inc. | Iodine treated elastomeric article |
| JPS5922219B2 (ja) * | 1980-07-07 | 1984-05-25 | 東京応化工業株式会社 | フレキソ印刷版用感光性樹脂組成物 |
| US4684600A (en) * | 1981-02-02 | 1987-08-04 | Uniroyal Plastics Co., Inc. | Compressible photopolymer printing plate |
| US4547453A (en) * | 1981-02-02 | 1985-10-15 | Uniroyal, Inc. | Compressible photopolymer printing plate |
| CA1203107A (en) * | 1982-08-31 | 1986-04-15 | Uniroyal, Inc. | Photosensitive elastomeric polymer composition for flexographic printing plates, processable in semi- aqueous basic solution or solvent |
| DE3415044C2 (de) * | 1984-04-21 | 1986-12-04 | Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf | Verfahren zum Ozonschutz von Fotopolymer-Flexodruckformen durch alkohollösliche Polyamide |
| GB2163435B (en) * | 1984-07-11 | 1987-07-22 | Asahi Chemical Ind | Image-forming materials sensitive to high-energy beam |
| US4702994A (en) * | 1984-10-01 | 1987-10-27 | W. R. Grace & Co. | Projection imaged relief printing plates |
| DE3630474A1 (de) * | 1986-09-06 | 1988-03-10 | Basf Ag | Verfahren zur herstellung von aufzeichnungsschichten und deren verwendung zur herstellung von flexodruckformen |
| US4839261A (en) * | 1986-09-29 | 1989-06-13 | Asahi Kasei Kogyo Kabushiki Kaisha | Photocurable laminate |
| DE3810096A1 (de) * | 1988-03-29 | 1989-10-05 | Kendall & Co | Verfahren zum verbinden zweier substrate und dafuer geeignete zusammensetzung |
| DE3841853A1 (de) * | 1988-12-13 | 1990-06-21 | Hoechst Ag | Photopolymerisierbares elastomeres gemisch und dieses enthaltendes aufzeichnungsmaterial fuer die herstellung von ozonresistenten flexodruckformen |
| DE3841854A1 (de) * | 1988-12-13 | 1990-06-21 | Hoechst Ag | Verfahren zur herstellung einer ozonresistenten flexodruckform |
| NZ237919A (en) * | 1990-04-26 | 1994-09-27 | Grace W R & Co | Photocurable element comprising photocurable base layer and a photocurable printing layer which comprises two incompatible elastomeric polymers and a photopolymerisable monomer, base layer comprising elastomer, monomer and photoinitiator; relief printing plates |
| DE69426298T2 (de) * | 1993-03-31 | 2001-07-12 | Nippon Zeon Co | Lichtempfindliche zusammensetzung, lichtempfindliche kautschukplatte und verfahren zur herstellung dieser platte, flexografische platte und verfahren zur herstellung dieser platte |
| JPH1031303A (ja) * | 1994-09-29 | 1998-02-03 | Nippon Zeon Co Ltd | 感光性組成物及び感光性ゴム版 |
| EP2264101B1 (en) | 2008-03-31 | 2014-05-28 | Zeon Corporation | Block copolymer composition, method for producing the same, and film of the same |
| US8501869B2 (en) | 2008-12-26 | 2013-08-06 | Zeon Corporation | Block copolymer composition and hot-melt adhesive composition |
| CN102264832B (zh) | 2008-12-26 | 2014-01-08 | 日本瑞翁株式会社 | 嵌段共聚物组合物、薄膜以及嵌段共聚物组合物的制造方法 |
| US8578852B2 (en) | 2009-02-27 | 2013-11-12 | Zeon Corporation | Block copolymer composition for flexographic printing plates |
| JP5772592B2 (ja) | 2009-03-31 | 2015-09-02 | 日本ゼオン株式会社 | ラベル用粘接着剤組成物 |
| WO2010113882A1 (ja) | 2009-03-31 | 2010-10-07 | 日本ゼオン株式会社 | 伸縮性フィルム用組成物 |
| EP2450396B1 (en) | 2009-06-30 | 2015-02-25 | Zeon Corporation | Composition for stretchable film |
-
1972
- 1972-02-22 CA CA135,271A patent/CA1101586A/en not_active Expired
- 1972-05-10 GB GB2182372A patent/GB1395822A/en not_active Expired
- 1972-05-15 AU AU42288/72A patent/AU4228872A/en not_active Expired
- 1972-05-16 DE DE19722223808 patent/DE2223808A1/de active Pending
- 1972-05-16 FR FR7217434A patent/FR2137942B1/fr not_active Expired
- 1972-05-16 IT IT6853772A patent/IT958889B/it active
- 1972-05-17 NL NL7206691A patent/NL7206691A/xx unknown
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51106501A (ja) * | 1975-03-15 | 1976-09-21 | Tokyo Ohka Kogyo Co Ltd | Furekisobanyokankoseijushisoseibutsu |
| JPS5337762B2 (xx) * | 1975-03-15 | 1978-10-11 | ||
| JPS52503A (en) * | 1975-10-17 | 1977-01-05 | Tokyo Ouka Kougiyou Kk | Photoosensitive resin composition for flexo graphic printing |
| JPS5337764B2 (xx) * | 1975-10-17 | 1978-10-11 |
Also Published As
| Publication number | Publication date |
|---|---|
| AU4228872A (en) | 1973-11-22 |
| FR2137942A1 (xx) | 1972-12-29 |
| GB1395822A (en) | 1975-05-29 |
| CA1101586A (en) | 1981-05-19 |
| DE2223808A1 (de) | 1972-12-07 |
| FR2137942B1 (xx) | 1976-06-11 |
| IT958889B (it) | 1973-10-30 |