CA1101586A - Composes photosensibles - Google Patents

Composes photosensibles

Info

Publication number
CA1101586A
CA1101586A CA135,271A CA135271A CA1101586A CA 1101586 A CA1101586 A CA 1101586A CA 135271 A CA135271 A CA 135271A CA 1101586 A CA1101586 A CA 1101586A
Authority
CA
Canada
Prior art keywords
ester
composition
relief plate
rubber
butadiene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA135,271A
Other languages
English (en)
Other versions
CA135271S (en
Inventor
Arnel D. Potter
Michael J. Lowe
Maclean R. Hess
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
P T Sub Inc
Original Assignee
WR Grace and Co Conn
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace and Co Conn filed Critical WR Grace and Co Conn
Application granted granted Critical
Publication of CA1101586A publication Critical patent/CA1101586A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F287/00—Macromolecular compounds obtained by polymerising monomers on to block polymers
CA135,271A 1971-05-17 1972-02-22 Composes photosensibles Expired CA1101586A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14432371A 1971-05-17 1971-05-17
US144,323 1971-05-17

Publications (1)

Publication Number Publication Date
CA1101586A true CA1101586A (fr) 1981-05-19

Family

ID=22508084

Family Applications (1)

Application Number Title Priority Date Filing Date
CA135,271A Expired CA1101586A (fr) 1971-05-17 1972-02-22 Composes photosensibles

Country Status (7)

Country Link
AU (1) AU4228872A (fr)
CA (1) CA1101586A (fr)
DE (1) DE2223808A1 (fr)
FR (1) FR2137942B1 (fr)
GB (1) GB1395822A (fr)
IT (1) IT958889B (fr)
NL (1) NL7206691A (fr)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4045231A (en) * 1975-03-15 1977-08-30 Tokyo Ohka Kogyo Kabushiki Kaisha Photosensitive resin composition for flexographic printing plates
JPS51106501A (ja) * 1975-03-15 1976-09-21 Tokyo Ohka Kogyo Co Ltd Furekisobanyokankoseijushisoseibutsu
JPS52503A (en) * 1975-10-17 1977-01-05 Tokyo Ouka Kougiyou Kk Photoosensitive resin composition for flexo graphic printing
JPS53127004A (en) * 1977-04-11 1978-11-06 Asahi Chemical Ind Photosensitive elastomer composition
US4234676A (en) 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
US4179531A (en) 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
US4177074A (en) * 1978-01-25 1979-12-04 E. I. Du Pont De Nemours And Company Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates
US4292150A (en) * 1979-06-26 1981-09-29 Uniroyal, Inc. Iodine treated elastomeric article
JPS5922219B2 (ja) * 1980-07-07 1984-05-25 東京応化工業株式会社 フレキソ印刷版用感光性樹脂組成物
US4684600A (en) * 1981-02-02 1987-08-04 Uniroyal Plastics Co., Inc. Compressible photopolymer printing plate
US4547453A (en) * 1981-02-02 1985-10-15 Uniroyal, Inc. Compressible photopolymer printing plate
CA1203107A (fr) * 1982-08-31 1986-04-15 Uniroyal, Inc. Composition a base de polymere elastomere photosensible pour cliches de flexographie a traiter dans une solution basique semi-aqueuse ou un solvant
DE3415044C2 (de) * 1984-04-21 1986-12-04 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Verfahren zum Ozonschutz von Fotopolymer-Flexodruckformen durch alkohollösliche Polyamide
GB2163435B (en) * 1984-07-11 1987-07-22 Asahi Chemical Ind Image-forming materials sensitive to high-energy beam
US4702994A (en) * 1984-10-01 1987-10-27 W. R. Grace & Co. Projection imaged relief printing plates
DE3630474A1 (de) * 1986-09-06 1988-03-10 Basf Ag Verfahren zur herstellung von aufzeichnungsschichten und deren verwendung zur herstellung von flexodruckformen
US4839261A (en) * 1986-09-29 1989-06-13 Asahi Kasei Kogyo Kabushiki Kaisha Photocurable laminate
DE3810096A1 (de) * 1988-03-29 1989-10-05 Kendall & Co Verfahren zum verbinden zweier substrate und dafuer geeignete zusammensetzung
DE3841853A1 (de) * 1988-12-13 1990-06-21 Hoechst Ag Photopolymerisierbares elastomeres gemisch und dieses enthaltendes aufzeichnungsmaterial fuer die herstellung von ozonresistenten flexodruckformen
DE3841854A1 (de) * 1988-12-13 1990-06-21 Hoechst Ag Verfahren zur herstellung einer ozonresistenten flexodruckform
NZ237919A (en) * 1990-04-26 1994-09-27 Grace W R & Co Photocurable element comprising photocurable base layer and a photocurable printing layer which comprises two incompatible elastomeric polymers and a photopolymerisable monomer, base layer comprising elastomer, monomer and photoinitiator; relief printing plates
DE69426298T2 (de) * 1993-03-31 2001-07-12 Nippon Zeon Co Lichtempfindliche zusammensetzung, lichtempfindliche kautschukplatte und verfahren zur herstellung dieser platte, flexografische platte und verfahren zur herstellung dieser platte
JPH1031303A (ja) * 1994-09-29 1998-02-03 Nippon Zeon Co Ltd 感光性組成物及び感光性ゴム版
EP2264101B1 (fr) 2008-03-31 2014-05-28 Zeon Corporation Composition de copolymère séquencé, son procédé de fabrication et film de celle-ci
US8501869B2 (en) 2008-12-26 2013-08-06 Zeon Corporation Block copolymer composition and hot-melt adhesive composition
CN102264832B (zh) 2008-12-26 2014-01-08 日本瑞翁株式会社 嵌段共聚物组合物、薄膜以及嵌段共聚物组合物的制造方法
US8578852B2 (en) 2009-02-27 2013-11-12 Zeon Corporation Block copolymer composition for flexographic printing plates
JP5772592B2 (ja) 2009-03-31 2015-09-02 日本ゼオン株式会社 ラベル用粘接着剤組成物
WO2010113882A1 (fr) 2009-03-31 2010-10-07 日本ゼオン株式会社 Composition pour film étirable
EP2450396B1 (fr) 2009-06-30 2015-02-25 Zeon Corporation Composition pour film étirable

Also Published As

Publication number Publication date
AU4228872A (en) 1973-11-22
FR2137942A1 (fr) 1972-12-29
GB1395822A (en) 1975-05-29
NL7206691A (fr) 1972-11-21
DE2223808A1 (de) 1972-12-07
FR2137942B1 (fr) 1976-06-11
IT958889B (it) 1973-10-30

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Legal Events

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MKEX Expiry