FR2117855A1 - Selective application of metal layer - onto substrate surface provided with patterned protective coating - Google Patents
Selective application of metal layer - onto substrate surface provided with patterned protective coatingInfo
- Publication number
- FR2117855A1 FR2117855A1 FR7139294A FR7139294A FR2117855A1 FR 2117855 A1 FR2117855 A1 FR 2117855A1 FR 7139294 A FR7139294 A FR 7139294A FR 7139294 A FR7139294 A FR 7139294A FR 2117855 A1 FR2117855 A1 FR 2117855A1
- Authority
- FR
- France
- Prior art keywords
- protective coating
- substrate surface
- metal layer
- surface provided
- selective application
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
- H05K3/146—By vapour deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
- C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
Substrate, e.g., glass, is provided with a protective coating corresponding to the desired pattern, and a gas mixture is passed over it comprising a reducible metal cpd., such as WF6, and a reducing gas such as H2. As a result, tungsten is deposited onto the protective coating only, as the unprotected part of the substrate surface is being etched away by HF produced during the reaction. Highly accurate patterns can be obtained. The method is suitable for the prodn. of printed circuits and similar applications; also for etching accurate patterns in glass (without under-etching), for this purpose the metal coating is eventually dissolved.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US9853370A | 1970-12-16 | 1970-12-16 | |
US9853470A | 1970-12-16 | 1970-12-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2117855A1 true FR2117855A1 (en) | 1972-07-28 |
FR2117855B1 FR2117855B1 (en) | 1974-05-31 |
Family
ID=26794833
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7139294A Granted FR2117855A1 (en) | 1970-12-16 | 1971-10-26 | Selective application of metal layer - onto substrate surface provided with patterned protective coating |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5539624B1 (en) |
DE (1) | DE2151127C3 (en) |
FR (1) | FR2117855A1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2588277A1 (en) * | 1985-10-07 | 1987-04-10 | Gen Electric | METHOD FOR DEPOSITING A TUNGSTEN LAYER ON A DIELECTRIC SURFACE |
EP0284435A2 (en) * | 1987-03-26 | 1988-09-28 | Canon Kabushiki Kaisha | Process for selective formation of II-VI group compound film |
EP0307109A1 (en) * | 1987-08-24 | 1989-03-15 | Canon Kabushiki Kaisha | Method for forming semiconductor crystal and semiconductor crystal article obtained by said method |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3141567C2 (en) * | 1981-10-20 | 1986-02-06 | Siemens AG, 1000 Berlin und 8000 München | Process for producing layers consisting of tantalum, tungsten or molybdenum at low temperatures and using these layers |
US4552783A (en) * | 1984-11-05 | 1985-11-12 | General Electric Company | Enhancing the selectivity of tungsten deposition on conductor and semiconductor surfaces |
GB2183090B (en) * | 1985-10-07 | 1989-09-13 | Canon Kk | Method for selective formation of deposited film |
DE3730644A1 (en) * | 1987-09-11 | 1989-03-30 | Baeuerle Dieter | METHOD FOR THE PRESENTED STRUCTURED DEPOSITION OF MICROSTRUCTURES WITH LASER LIGHT |
US5021363A (en) * | 1989-09-07 | 1991-06-04 | Laboratories Incorporated | Method of selectively producing conductive members on a semiconductor surface |
US10622214B2 (en) * | 2017-05-25 | 2020-04-14 | Applied Materials, Inc. | Tungsten defluorination by high pressure treatment |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3243323A (en) * | 1962-06-11 | 1966-03-29 | Motorola Inc | Gas etching |
GB1051451A (en) * | 1963-02-08 | |||
US3477872A (en) * | 1966-09-21 | 1969-11-11 | Rca Corp | Method of depositing refractory metals |
GB1129707A (en) * | 1966-11-10 | 1968-10-09 | Ass Elect Ind | The deposition of tungsten on semi-conductor material |
-
1971
- 1971-10-14 DE DE2151127A patent/DE2151127C3/en not_active Expired
- 1971-10-19 JP JP8219971A patent/JPS5539624B1/ja active Pending
- 1971-10-26 FR FR7139294A patent/FR2117855A1/en active Granted
Non-Patent Citations (1)
Title |
---|
NEANT * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2588277A1 (en) * | 1985-10-07 | 1987-04-10 | Gen Electric | METHOD FOR DEPOSITING A TUNGSTEN LAYER ON A DIELECTRIC SURFACE |
EP0284435A2 (en) * | 1987-03-26 | 1988-09-28 | Canon Kabushiki Kaisha | Process for selective formation of II-VI group compound film |
EP0284435A3 (en) * | 1987-03-26 | 1989-01-25 | Canon Kabushiki Kaisha | Process for selective formation of ii-vi group compound film |
EP0307109A1 (en) * | 1987-08-24 | 1989-03-15 | Canon Kabushiki Kaisha | Method for forming semiconductor crystal and semiconductor crystal article obtained by said method |
US5130103A (en) * | 1987-08-24 | 1992-07-14 | Canon Kabushiki Kaisha | Method for forming semiconductor crystal and semiconductor crystal article obtained by said method |
Also Published As
Publication number | Publication date |
---|---|
DE2151127A1 (en) | 1972-07-13 |
DE2151127C3 (en) | 1981-04-16 |
DE2151127B2 (en) | 1980-07-10 |
JPS5539624B1 (en) | 1980-10-13 |
FR2117855B1 (en) | 1974-05-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |