FR2010858A1 - Prodn of thin films for magnetic or electronic devices usin - cathodic sputtering techniques - Google Patents

Prodn of thin films for magnetic or electronic devices usin - cathodic sputtering techniques

Info

Publication number
FR2010858A1
FR2010858A1 FR6910803A FR6910803A FR2010858A1 FR 2010858 A1 FR2010858 A1 FR 2010858A1 FR 6910803 A FR6910803 A FR 6910803A FR 6910803 A FR6910803 A FR 6910803A FR 2010858 A1 FR2010858 A1 FR 2010858A1
Authority
FR
France
Prior art keywords
cathode
usin
prodn
magnetic
electronic devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6910803A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2010858A1 publication Critical patent/FR2010858A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The cathode is bombarded by ions with energy of 1-5 key under a low pressure gas and liberates neutral atoms. If the cathode is refrigerated to prevent diffusion and vaporisation, the material liberated and deposited on the film has same composition as the cathode. By applying an electrostatic potential to the substrate, bombardment of the film during deposition by gas ions causes preferential displacement of one alloy constituent and permits composition control by variation of applied potential. Gas ions are suitably A. The procedure is effective for elements of different atomic dia., e.g. Fe-Gd. Where atomic size is similar, e.g. Fe-Ni, procedure is not effective up to high applied potentials.
FR6910803A 1968-06-14 1969-04-17 Prodn of thin films for magnetic or electronic devices usin - cathodic sputtering techniques Withdrawn FR2010858A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73714468A 1968-06-14 1968-06-14

Publications (1)

Publication Number Publication Date
FR2010858A1 true FR2010858A1 (en) 1970-02-20

Family

ID=24962746

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6910803A Withdrawn FR2010858A1 (en) 1968-06-14 1969-04-17 Prodn of thin films for magnetic or electronic devices usin - cathodic sputtering techniques

Country Status (2)

Country Link
DE (1) DE1930021A1 (en)
FR (1) FR2010858A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005111257A2 (en) * 2004-04-27 2005-11-24 Ppg Industries Ohio, Inc. Effects of methods of manufacturing sputtering targets on characteristics of coatings

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3737404A1 (en) * 1987-11-04 1989-05-18 Bartl Josef Franz Process and appliance for generating strongly adhering vacuum coatings

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005111257A2 (en) * 2004-04-27 2005-11-24 Ppg Industries Ohio, Inc. Effects of methods of manufacturing sputtering targets on characteristics of coatings
WO2005111257A3 (en) * 2004-04-27 2007-11-15 Ppg Ind Ohio Inc Effects of methods of manufacturing sputtering targets on characteristics of coatings
US9051211B2 (en) 2004-04-27 2015-06-09 Ppg Industries Ohio, Inc. Effects of methods of manufacturing sputtering targets on characteristics of coatings

Also Published As

Publication number Publication date
DE1930021A1 (en) 1969-12-18

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Legal Events

Date Code Title Description
ST Notification of lapse