FR2006648A1 - - Google Patents

Info

Publication number
FR2006648A1
FR2006648A1 FR6912180A FR6912180A FR2006648A1 FR 2006648 A1 FR2006648 A1 FR 2006648A1 FR 6912180 A FR6912180 A FR 6912180A FR 6912180 A FR6912180 A FR 6912180A FR 2006648 A1 FR2006648 A1 FR 2006648A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6912180A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
APPLIED RES LAB
Original Assignee
APPLIED RES LAB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by APPLIED RES LAB filed Critical APPLIED RES LAB
Publication of FR2006648A1 publication Critical patent/FR2006648A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/028—Negative ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/142—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using a solid target which is not previously vapourised
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/961—Ion beam source and generation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Physical Vapour Deposition (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Electron Tubes For Measurement (AREA)
FR6912180A 1968-04-22 1969-04-18 Withdrawn FR2006648A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US72302668A 1968-04-22 1968-04-22

Publications (1)

Publication Number Publication Date
FR2006648A1 true FR2006648A1 (fr) 1970-01-02

Family

ID=24904500

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6912180A Withdrawn FR2006648A1 (fr) 1968-04-22 1969-04-18

Country Status (5)

Country Link
US (1) US3573454A (fr)
JP (1) JPS567292B1 (fr)
DE (1) DE1920183C3 (fr)
FR (1) FR2006648A1 (fr)
GB (1) GB1259505A (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3917491A (en) * 1974-01-08 1975-11-04 Us Army Methods for fabricating resistant MOS devices
US4110625A (en) * 1976-12-20 1978-08-29 International Business Machines Corporation Method and apparatus for monitoring the dose of ion implanted into a target by counting emitted X-rays
USRE33344E (en) * 1977-04-22 1990-09-18 Finnigan Corporation Apparatus and method for detecting negative ions
US4132614A (en) * 1977-10-26 1979-01-02 International Business Machines Corporation Etching by sputtering from an intermetallic target to form negative metallic ions which produce etching of a juxtaposed substrate
US4416725A (en) * 1982-12-30 1983-11-22 International Business Machines Corporation Copper texturing process
GB8404173D0 (en) * 1984-02-17 1984-03-21 Ti Group Services Ltd Controlling current density
JP2568006B2 (ja) * 1990-08-23 1996-12-25 インターナショナル・ビジネス・マシーンズ・コーポレイション イオン化空気により対象物から電荷を放電させる方法及びそのための装置
FR2806527B1 (fr) * 2000-03-20 2002-10-25 Schlumberger Technologies Inc Colonne a focalisation simultanee d'un faisceau de particules et d'un faisceau optique
US11031205B1 (en) 2020-02-04 2021-06-08 Georg-August-Universität Göttingen Stiftung Öffentlichen Rechts, Universitätsmedizin Device for generating negative ions by impinging positive ions on a target

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2947868A (en) * 1959-07-27 1960-08-02 Geophysics Corp Of America Mass spectrometer
US3336475A (en) * 1964-02-05 1967-08-15 Electro Optical Systems Inc Device for forming negative ions from iodine gas and a lanthanum boride contact ionizer surface
US3328210A (en) * 1964-10-26 1967-06-27 North American Aviation Inc Method of treating semiconductor device by ionic bombardment
US3341754A (en) * 1966-01-20 1967-09-12 Ion Physics Corp Semiconductor resistor containing interstitial and substitutional ions formed by an ion implantation method

Also Published As

Publication number Publication date
GB1259505A (fr) 1972-01-05
JPS567292B1 (fr) 1981-02-17
DE1920183A1 (de) 1970-08-27
DE1920183C3 (de) 1981-10-29
DE1920183B2 (de) 1977-02-10
US3573454A (en) 1971-04-06

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Legal Events

Date Code Title Description
ST Notification of lapse