FR1364093A - Dispositif pour l'obtention par évaporation sous vide de couches mixtes minces - Google Patents

Dispositif pour l'obtention par évaporation sous vide de couches mixtes minces

Info

Publication number
FR1364093A
FR1364093A FR934112A FR934112A FR1364093A FR 1364093 A FR1364093 A FR 1364093A FR 934112 A FR934112 A FR 934112A FR 934112 A FR934112 A FR 934112A FR 1364093 A FR1364093 A FR 1364093A
Authority
FR
France
Prior art keywords
vacuum evaporation
mixed layers
obtaining thin
thin mixed
obtaining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR934112A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel Lucent SAS
Original Assignee
Compagnie Generale dElectricite SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to GB1051402D priority Critical patent/GB1051402A/en
Application filed by Compagnie Generale dElectricite SA filed Critical Compagnie Generale dElectricite SA
Priority to FR934112A priority patent/FR1364093A/fr
Priority to BE646776A priority patent/BE646776A/xx
Priority to DE1964C0032818 priority patent/DE1282410B/de
Priority to NL6405174A priority patent/NL6405174A/xx
Application granted granted Critical
Publication of FR1364093A publication Critical patent/FR1364093A/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/02Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
    • H01J41/04Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas with ionisation by means of thermionic cathodes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/548Controlling the composition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/02Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
FR934112A 1963-05-08 1963-05-08 Dispositif pour l'obtention par évaporation sous vide de couches mixtes minces Expired FR1364093A (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
GB1051402D GB1051402A (fr) 1963-05-08
FR934112A FR1364093A (fr) 1963-05-08 1963-05-08 Dispositif pour l'obtention par évaporation sous vide de couches mixtes minces
BE646776A BE646776A (fr) 1963-05-08 1964-04-20
DE1964C0032818 DE1282410B (de) 1963-05-08 1964-05-06 Verfahren und Vorrichtung zur kontinuierlichen Messung und Steuerung der Abscheidung duenner, durch Vakuumverdampfung erzeugter Mischschichten
NL6405174A NL6405174A (fr) 1963-05-08 1964-05-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR934112A FR1364093A (fr) 1963-05-08 1963-05-08 Dispositif pour l'obtention par évaporation sous vide de couches mixtes minces

Publications (1)

Publication Number Publication Date
FR1364093A true FR1364093A (fr) 1964-06-19

Family

ID=8803369

Family Applications (1)

Application Number Title Priority Date Filing Date
FR934112A Expired FR1364093A (fr) 1963-05-08 1963-05-08 Dispositif pour l'obtention par évaporation sous vide de couches mixtes minces

Country Status (5)

Country Link
BE (1) BE646776A (fr)
DE (1) DE1282410B (fr)
FR (1) FR1364093A (fr)
GB (1) GB1051402A (fr)
NL (1) NL6405174A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4068016A (en) * 1974-03-16 1978-01-10 Wilmanns Ingo G Method for regulating evaporating rate and layer build up in the production of thin layers
US4837044A (en) * 1987-01-23 1989-06-06 Itt Research Institute Rugate optical filter systems

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3636916A (en) * 1966-03-14 1972-01-25 Optical Coating Laboratory Inc Coating apparatus and system
US3570449A (en) * 1969-03-13 1971-03-16 United Aircraft Corp Sensor system for a vacuum deposition apparatus

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1301197A (fr) * 1960-10-04 1962-08-10 Rca Corp Chambre d'évaporation à trou

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4068016A (en) * 1974-03-16 1978-01-10 Wilmanns Ingo G Method for regulating evaporating rate and layer build up in the production of thin layers
US4837044A (en) * 1987-01-23 1989-06-06 Itt Research Institute Rugate optical filter systems

Also Published As

Publication number Publication date
DE1282410B (de) 1968-11-07
BE646776A (fr) 1964-10-20
GB1051402A (fr)
NL6405174A (fr) 1964-11-09

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