FR1248287A - Procédé et appareil de fabrication de dispositifs semi-conducteurs - Google Patents

Procédé et appareil de fabrication de dispositifs semi-conducteurs

Info

Publication number
FR1248287A
FR1248287A FR817910A FR817910A FR1248287A FR 1248287 A FR1248287 A FR 1248287A FR 817910 A FR817910 A FR 817910A FR 817910 A FR817910 A FR 817910A FR 1248287 A FR1248287 A FR 1248287A
Authority
FR
France
Prior art keywords
semiconductor devices
manufacturing semiconductor
manufacturing
devices
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR817910A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Space Systems Loral LLC
Original Assignee
Philco Ford Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philco Ford Corp filed Critical Philco Ford Corp
Application granted granted Critical
Publication of FR1248287A publication Critical patent/FR1248287A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
FR817910A 1959-02-24 1960-02-08 Procédé et appareil de fabrication de dispositifs semi-conducteurs Expired FR1248287A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US795221A US3039515A (en) 1959-02-24 1959-02-24 Fabrication of semiconductor devices

Publications (1)

Publication Number Publication Date
FR1248287A true FR1248287A (fr) 1960-12-09

Family

ID=25165048

Family Applications (1)

Application Number Title Priority Date Filing Date
FR817910A Expired FR1248287A (fr) 1959-02-24 1960-02-08 Procédé et appareil de fabrication de dispositifs semi-conducteurs

Country Status (3)

Country Link
US (1) US3039515A (fr)
FR (1) FR1248287A (fr)
GB (1) GB933144A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3504983A (en) * 1966-05-31 1970-04-07 Nasa Ellipsoidal mirror reflectometer including means for averaging the radiation reflected from the sample
US4497692A (en) * 1983-06-13 1985-02-05 International Business Machines Corporation Laser-enhanced jet-plating and jet-etching: high-speed maskless patterning method
IL83038A (en) * 1987-06-30 1991-08-16 Aaron Lewis Method and device for submicron precision pattern generation

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL26813C (fr) * 1928-02-08
GB401591A (en) * 1932-04-30 1933-11-16 Zeiss Carl Improvements in devices for illuminating microscopic objects with incident light
US1985074A (en) * 1932-11-02 1934-12-18 Zeiss Carl Illumination system
US2846346A (en) * 1954-03-26 1958-08-05 Philco Corp Semiconductor device
US2799637A (en) * 1954-12-22 1957-07-16 Philco Corp Method for electrolytic etching
US2930949A (en) * 1956-09-25 1960-03-29 Philco Corp Semiconductive device and method of fabrication thereof
US2841477A (en) * 1957-03-04 1958-07-01 Pacific Semiconductors Inc Photochemically activated gaseous etching method

Also Published As

Publication number Publication date
GB933144A (en) 1963-08-08
US3039515A (en) 1962-06-19

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