FI900537A0 - Elektricitet ledande resistmassa, foerfarande foer dess framstaellning och dess anvaendning. - Google Patents
Elektricitet ledande resistmassa, foerfarande foer dess framstaellning och dess anvaendning.Info
- Publication number
- FI900537A0 FI900537A0 FI900537A FI900537A FI900537A0 FI 900537 A0 FI900537 A0 FI 900537A0 FI 900537 A FI900537 A FI 900537A FI 900537 A FI900537 A FI 900537A FI 900537 A0 FI900537 A0 FI 900537A0
- Authority
- FI
- Finland
- Prior art keywords
- dess
- resistmassa
- elektricitet
- ledande
- anvaendning
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/12—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
- H01B1/124—Intrinsically conductive polymers
- H01B1/127—Intrinsically conductive polymers comprising five-membered aromatic rings in the main chain, e.g. polypyrroles, polythiophenes
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3903421A DE3903421A1 (de) | 1989-02-06 | 1989-02-06 | Elektrisch leitfaehige resistmasse, verfahren zu ihrer herstellung und ihre verwendung |
Publications (1)
Publication Number | Publication Date |
---|---|
FI900537A0 true FI900537A0 (fi) | 1990-02-02 |
Family
ID=6373485
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI900537A FI900537A0 (fi) | 1989-02-06 | 1990-02-02 | Elektricitet ledande resistmassa, foerfarande foer dess framstaellning och dess anvaendning. |
Country Status (10)
Country | Link |
---|---|
US (1) | US5137799A (fi) |
EP (1) | EP0382046A3 (fi) |
JP (1) | JPH02245755A (fi) |
KR (1) | KR900013033A (fi) |
AU (1) | AU630414B2 (fi) |
BR (1) | BR9000492A (fi) |
CA (1) | CA2009167A1 (fi) |
DE (1) | DE3903421A1 (fi) |
FI (1) | FI900537A0 (fi) |
ZA (1) | ZA90795B (fi) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03137649A (ja) * | 1989-10-24 | 1991-06-12 | Matsushita Electric Ind Co Ltd | 微細パターン形成材料およびパターン形成方法 |
JPH05226238A (ja) * | 1991-10-31 | 1993-09-03 | Internatl Business Mach Corp <Ibm> | E−ビームレジスト用の塩基現像可能な放電トップ層 |
US7166241B1 (en) | 1993-03-03 | 2007-01-23 | International Business Machines Corporation | Water-soluble electrically conducting polymers, their synthesis and use |
US5556706A (en) * | 1993-10-06 | 1996-09-17 | Matsushita Electric Industrial Co., Ltd. | Conductive layered product and method of manufacturing the same |
US6022669A (en) * | 1995-05-02 | 2000-02-08 | Symetrix Corporation | Method of fabricating an integrated circuit using self-patterned thin films |
DE19524132A1 (de) * | 1995-07-03 | 1997-01-09 | Bayer Ag | Kratzfeste leitfähige Beschichtungen |
US6024895A (en) * | 1995-08-11 | 2000-02-15 | Mitsubishi Rayon Co., Ltd. | Cross-linkable, electrically conductive composition, electric conductor and process for forming the same |
GB2325439A (en) * | 1997-05-23 | 1998-11-25 | Gersan Ets | Marking diamond gemstone by plasma or ion beam etching through a laser ablated resist |
US6132644A (en) * | 1997-05-29 | 2000-10-17 | International Business Machines Corporation | Energy sensitive electrically conductive admixtures |
US5985516A (en) * | 1997-07-03 | 1999-11-16 | United Microelectronics Corp. | Electron beam imaging method using conducting polyaniline material |
DE60134317D1 (de) * | 2000-06-26 | 2008-07-17 | Agfa Gevaert | Material und verfahren für die herstellung eines elektrisch leitfähigen musters |
US6638680B2 (en) | 2000-06-26 | 2003-10-28 | Agfa-Gevaert | Material and method for making an electroconductive pattern |
US6482558B1 (en) | 2000-10-24 | 2002-11-19 | Advanced Micro Devices, Inc. | Conducting electron beam resist thin film layer for patterning of mask plates |
US7186987B1 (en) * | 2001-05-22 | 2007-03-06 | Sandia National Laboratories | Organic materials and devices for detecting ionizing radiation |
US6746751B2 (en) | 2001-06-22 | 2004-06-08 | Agfa-Gevaert | Material having a conductive pattern and a material and method for making a conductive pattern |
DE10147954B4 (de) * | 2001-09-28 | 2007-04-19 | Infineon Technologies Ag | CARL für Bioelektronik: Substratanbindung über leitfähige Schicht |
WO2003030278A2 (en) * | 2001-10-01 | 2003-04-10 | Koninklijke Philips Electronics N.V. | Composition, method and electronic device |
DE10244197A1 (de) * | 2002-09-23 | 2004-04-08 | Infineon Technologies Ag | Zusammensetzung, die eine elektrisch leitfähige Lackschicht bildet und ein Verfahren zur Strukturierung eines Fotoresists unter Verwendung der Lackschicht |
EP1549491A4 (en) * | 2002-10-03 | 2007-04-11 | Metss Corp | SURFACES IN HARD LAMINATE DISSIPATING THE ELECTROSTATIC CHARGE |
KR101438172B1 (ko) * | 2006-08-21 | 2014-09-11 | 아그파-게바에르트 엔.브이. | 유기 도전성 층, 패턴 또는 인쇄물 제조용 uv광중합성 조성물 |
JP2021095426A (ja) * | 2019-12-13 | 2021-06-24 | 富士フイルムビジネスイノベーション株式会社 | 金属光沢膜形成用組成物、金属光沢膜、及び物品 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3557068A (en) * | 1968-02-01 | 1971-01-19 | Pennsalt Corp | Thiophene polymers and method of preparation |
DE2404589A1 (de) * | 1973-02-02 | 1974-08-22 | Fuji Photo Film Co Ltd | Reaktionsfaehige hochpolymere verbindung, verfahren zu deren herstellung und massen, die sie enthalten |
DE3036694A1 (de) * | 1980-09-29 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch |
JPS62113134A (ja) * | 1985-11-13 | 1987-05-25 | Fujitsu Ltd | 微細パタ−ンの形成方法 |
JPS62113136A (ja) * | 1985-11-13 | 1987-05-25 | Fujitsu Ltd | レジスト組成物 |
JPS62113139A (ja) * | 1985-11-13 | 1987-05-25 | Fujitsu Ltd | ネガ型レジスト組成物 |
FR2596566B1 (fr) * | 1986-04-01 | 1989-03-10 | Solvay | Polymeres conducteurs derives de 3-alkylthiophenes, procede pour leur fabrication et dispositifs electroconducteurs les contenant |
US5002852A (en) * | 1986-12-15 | 1991-03-26 | Gaf Chemicals Corporation | Recording medium of improved stability |
JP2578881B2 (ja) * | 1987-02-25 | 1997-02-05 | 昭和電工株式会社 | ラジカル重合性組成物 |
AU607537B2 (en) * | 1987-07-29 | 1991-03-07 | Neste Oy | Conductive plastic composites |
JPH01118126A (ja) * | 1987-10-31 | 1989-05-10 | Fujitsu Ltd | パターン形成方法 |
EP0348961B1 (en) * | 1988-06-29 | 1994-01-26 | Matsushita Electric Industrial Co., Ltd. | Fine pattern forming material and pattern forming method |
JP2712413B2 (ja) * | 1988-11-07 | 1998-02-10 | 住友化学工業株式会社 | レジストおよび微細パターンの形成方法 |
US4986886A (en) * | 1990-05-30 | 1991-01-22 | Drexel University | Polymerization of thiophene and its derivatives |
-
1989
- 1989-02-06 DE DE3903421A patent/DE3903421A1/de not_active Withdrawn
-
1990
- 1990-01-30 EP EP19900101765 patent/EP0382046A3/de not_active Withdrawn
- 1990-02-02 FI FI900537A patent/FI900537A0/fi not_active IP Right Cessation
- 1990-02-02 ZA ZA90795A patent/ZA90795B/xx unknown
- 1990-02-02 US US07/474,367 patent/US5137799A/en not_active Expired - Fee Related
- 1990-02-02 CA CA002009167A patent/CA2009167A1/en not_active Abandoned
- 1990-02-05 AU AU49290/90A patent/AU630414B2/en not_active Ceased
- 1990-02-05 JP JP2025917A patent/JPH02245755A/ja active Pending
- 1990-02-05 KR KR1019900001320A patent/KR900013033A/ko not_active Application Discontinuation
- 1990-02-05 BR BR909000492A patent/BR9000492A/pt unknown
Also Published As
Publication number | Publication date |
---|---|
JPH02245755A (ja) | 1990-10-01 |
EP0382046A2 (de) | 1990-08-16 |
CA2009167A1 (en) | 1990-08-06 |
US5137799A (en) | 1992-08-11 |
AU630414B2 (en) | 1992-10-29 |
EP0382046A3 (de) | 1991-10-23 |
ZA90795B (en) | 1990-10-31 |
DE3903421A1 (de) | 1990-08-09 |
KR900013033A (ko) | 1990-09-03 |
AU4929090A (en) | 1990-08-09 |
BR9000492A (pt) | 1991-01-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD | Application lapsed | ||
MM | Patent lapsed |
Owner name: HOECHST AKTIENGESELLSCHAFT |