KR900013033A - 전기전도성 내식막 물질, 및 이의 제조방법 및 용도 - Google Patents

전기전도성 내식막 물질, 및 이의 제조방법 및 용도 Download PDF

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Publication number
KR900013033A
KR900013033A KR1019900001320A KR900001320A KR900013033A KR 900013033 A KR900013033 A KR 900013033A KR 1019900001320 A KR1019900001320 A KR 1019900001320A KR 900001320 A KR900001320 A KR 900001320A KR 900013033 A KR900013033 A KR 900013033A
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South Korea
Prior art keywords
electrically conductive
resist material
resist
polymer
soluble
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KR1019900001320A
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English (en)
Inventor
카엠프 구엔테르
펠트훼스 미카엘
쉐우네만 우데
링나우 예르겐
담멜 랄프
Original Assignee
마이어-둘호이어, 게르만
훽스트 아크티엔게젤샤프트
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Publication of KR900013033A publication Critical patent/KR900013033A/ko

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/24—Electrically-conducting paints
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/08—Anti-corrosive paints
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/12—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
    • H01B1/124—Intrinsically conductive polymers
    • H01B1/127—Intrinsically conductive polymers comprising five-membered aromatic rings in the main chain, e.g. polypyrroles, polythiophenes

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

내용 없음

Description

전기전도성 내식막 물질, 및 이의 제조방법 및 용도
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 내식말 물질을 사용하여 내식막을 제조한 기질의 최상부층에서 전자 비임 조사후 수득되는 팬턴을 나타내는 도면이고,
제2도는 기질의 정전기적 하전 효과에 의해 결과하는 바람직하지 못한 패턴을 나타내는 도면이다.

Claims (8)

  1. 이온화 방사선에 민감한 중합체 하나 이상 및 가용성 전기 전도성 올리고머 또는 가용성 전기 전도성 중합체를 사실상 함유함을 특징으로 하는 전기 전도성 내식막 물질.
  2. 제1항에 있어서, 내식막 물질이 내식막 제형의 건조물질에 대해 0.01 내지 10중량%의 전도성 올리고머 또는 중합체를 함유하는 내식막 물질.
  3. 제1항 있어서, 가용성 전기 전도성 올리고머 또는 가용성 전기 전도성 중합체로서 3-치환된 폴리티오펜이 사용되는 내식막 물질.
  4. 제1항에 있어서, 전도성 올리고머 또는 중합체가 내식막 층과는 개별적으로 가해지는 내식막 물질.
  5. 제1항에 있어서, 알칼리-가용성 결합체를 기본으로한 내식막 제형이 사용되는 내식막 물질.
  6. 제1항에 있어서, 고-에너지 방사선에 의해 교차결합 및 분해될 수 있는 중합체 하나 이상을 사용함으로써 제조한, 용매중에서 현상될 수 있는 내식막 물질.
  7. 이온화 방사선에 민감한 중합체 하나 이상과 적합한 용매중에 용해된 전기 전도성 올리고머 또는 중합체를 혼합함을 특징으로하여, 제1항에 따른 전기 전도성 내식막 물질을 제조하는 방법.
  8. 정전기적 하전 및 그로부터 생성되는 정전기장을 방지하는 전자 비임 내식막의 제조에 사용하기 위한 제1항에 따른 전기 전도성 내식막 물질의 용도.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900001320A 1989-02-06 1990-02-05 전기전도성 내식막 물질, 및 이의 제조방법 및 용도 KR900013033A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3903421.6 1989-02-06
DE3903421A DE3903421A1 (de) 1989-02-06 1989-02-06 Elektrisch leitfaehige resistmasse, verfahren zu ihrer herstellung und ihre verwendung

Publications (1)

Publication Number Publication Date
KR900013033A true KR900013033A (ko) 1990-09-03

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ID=6373485

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900001320A KR900013033A (ko) 1989-02-06 1990-02-05 전기전도성 내식막 물질, 및 이의 제조방법 및 용도

Country Status (10)

Country Link
US (1) US5137799A (ko)
EP (1) EP0382046A3 (ko)
JP (1) JPH02245755A (ko)
KR (1) KR900013033A (ko)
AU (1) AU630414B2 (ko)
BR (1) BR9000492A (ko)
CA (1) CA2009167A1 (ko)
DE (1) DE3903421A1 (ko)
FI (1) FI900537A0 (ko)
ZA (1) ZA90795B (ko)

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WO2003030278A2 (en) * 2001-10-01 2003-04-10 Koninklijke Philips Electronics N.V. Composition, method and electronic device
DE10244197A1 (de) * 2002-09-23 2004-04-08 Infineon Technologies Ag Zusammensetzung, die eine elektrisch leitfähige Lackschicht bildet und ein Verfahren zur Strukturierung eines Fotoresists unter Verwendung der Lackschicht
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Also Published As

Publication number Publication date
EP0382046A2 (de) 1990-08-16
ZA90795B (en) 1990-10-31
CA2009167A1 (en) 1990-08-06
AU630414B2 (en) 1992-10-29
DE3903421A1 (de) 1990-08-09
FI900537A0 (fi) 1990-02-02
JPH02245755A (ja) 1990-10-01
BR9000492A (pt) 1991-01-15
US5137799A (en) 1992-08-11
EP0382046A3 (de) 1991-10-23
AU4929090A (en) 1990-08-09

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