FI864625A - Genom bestraolning polymeriserbar blandning, av den framstaellt tryckmaterial och foerfarande foer framstaellning av relieftryckmoenster. - Google Patents

Genom bestraolning polymeriserbar blandning, av den framstaellt tryckmaterial och foerfarande foer framstaellning av relieftryckmoenster. Download PDF

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Publication number
FI864625A
FI864625A FI864625A FI864625A FI864625A FI 864625 A FI864625 A FI 864625A FI 864625 A FI864625 A FI 864625A FI 864625 A FI864625 A FI 864625A FI 864625 A FI864625 A FI 864625A
Authority
FI
Finland
Prior art keywords
alkyl
tryckmaterial
relieftryckmoenster
polymeriserbar
bestraolning
Prior art date
Application number
FI864625A
Other languages
English (en)
Other versions
FI864625A0 (fi
Inventor
Ulrich Geissler
Hartmut Steppan
Walter Herwig
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of FI864625A0 publication Critical patent/FI864625A0/fi
Publication of FI864625A publication Critical patent/FI864625A/fi

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Reinforced Plastic Materials (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Holo Graphy (AREA)
FI864625A 1985-11-15 1986-11-13 Genom bestraolning polymeriserbar blandning, av den framstaellt tryckmaterial och foerfarande foer framstaellning av relieftryckmoenster. FI864625A (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19853540480 DE3540480A1 (de) 1985-11-15 1985-11-15 Durch strahlung polymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen

Publications (2)

Publication Number Publication Date
FI864625A0 FI864625A0 (fi) 1986-11-13
FI864625A true FI864625A (fi) 1987-05-16

Family

ID=6286025

Family Applications (1)

Application Number Title Priority Date Filing Date
FI864625A FI864625A (fi) 1985-11-15 1986-11-13 Genom bestraolning polymeriserbar blandning, av den framstaellt tryckmaterial och foerfarande foer framstaellning av relieftryckmoenster.

Country Status (10)

Country Link
US (1) US4956264A (fi)
EP (1) EP0222320B1 (fi)
JP (1) JPH0746225B2 (fi)
AT (1) ATE81911T1 (fi)
BR (1) BR8605631A (fi)
CA (1) CA1300786C (fi)
DE (2) DE3540480A1 (fi)
FI (1) FI864625A (fi)
IL (1) IL80582A (fi)
ZA (1) ZA868307B (fi)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3710282A1 (de) * 1987-03-28 1988-10-13 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3743454A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US5104770A (en) * 1988-03-11 1992-04-14 Hoechst Celanese Corporation Positive-working photoresist compositions
DE3824903A1 (de) * 1988-07-22 1990-02-01 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
CA2009274A1 (en) * 1989-02-22 1990-08-22 Manuel Buentello Iii Method for making electronic components using a masking material and a masking material therefor
US5061600A (en) * 1990-07-17 1991-10-29 Eastman Kodak Company Radiation-sensitive composition containing both a vinyl pyrrolidone polymer and an unsaturated polyester and use thereof in lithographic printing plates
WO2002085962A1 (en) * 2001-04-24 2002-10-31 Ucb, S.A. Improved radiation curable composition
JP4280574B2 (ja) * 2002-07-10 2009-06-17 キヤノン株式会社 液体吐出ヘッドの製造方法
CN1723195A (zh) * 2002-12-12 2006-01-18 舒飞士特种化工有限公司 用于生产氨基甲酰氧基(甲基)丙烯酸酯的方法和新型的氨基甲酰氧基(甲基)丙烯酸酯
US7294656B2 (en) * 2004-01-09 2007-11-13 Bayer Materialscience Llc UV curable coating composition
US7544754B2 (en) * 2005-09-30 2009-06-09 3M Innovative Properties Company Crosslinked polymers with amine binding groups
JP5092986B2 (ja) * 2008-08-20 2012-12-05 Ｊｓｒ株式会社 重合体及び感放射線性組成物並びに単量体
US20160280807A1 (en) * 2015-03-24 2016-09-29 Mark D. Soucek Preparation of non-isocyanate urethane (meth) acrylates for urethane functional latex
CN110737172B (zh) * 2017-07-07 2021-03-02 Tcl华星光电技术有限公司 Uv固化粉末光阻组合物及其制作方法、彩膜基板的制作方法

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE36813C (de) * 1900-01-01 J. F. ELLIS und L. P. BOUVIER in Toronto, Canada Briefumschlagmaschine
DE1522463C3 (de) * 1966-03-22 1978-09-28 Basf Ag, 6700 Ludwigshafen Verfahren zum Herstellen von Reliefdruckformen
US3850770A (en) * 1969-10-24 1974-11-26 Kansai Paint Co Ltd Radiation curable compositions from acrylurethane resins
US4088498A (en) * 1970-12-28 1978-05-09 Hoechst Aktiengesellschaft Photopolymerizable copying composition
DE2064080C3 (de) * 1970-12-28 1983-11-03 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
US3887450A (en) * 1971-02-04 1975-06-03 Dynachem Corp Photopolymerizable compositions containing polymeric binding agents
US3783151A (en) * 1971-03-23 1974-01-01 Sun Chemical Corp Isocyanate-modified esters
US3953309A (en) * 1972-12-14 1976-04-27 Dynachem Corporation Polymerization compositions and processes having polymeric binding agents
DE2361041C3 (de) * 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
DE2363806B2 (de) * 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
US3957561A (en) * 1975-05-22 1976-05-18 National Starch And Chemical Corporation Anaerobic adhesive and sealant compositions employing a two component catalyst system of diazosulfone and o-sulfobenzimide
US4111769A (en) * 1977-12-29 1978-09-05 Union Carbide Corporation Radiation curable pressure sensitive adhesive composition
US4296196A (en) * 1978-05-20 1981-10-20 Hoechst Aktiengesellschaft Photopolymerizable mixture in a transfer element
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
US4227980A (en) * 1978-09-13 1980-10-14 Whittaker Corporation Photoreactive coating compositions based on urethane modified acrylates
US4424100A (en) * 1979-05-04 1984-01-03 Mobil Oil Corporation Method for producing articles by deformation substrates having a radiation cured substrate
US4340497A (en) * 1980-03-21 1982-07-20 Union Carbide Corporation (N-Substituted carbamoyloxy) alkanoyloxyalkyl acrylate esters
CA1154456A (en) * 1980-03-21 1983-09-27 Robert J. Knopf (n-substituted carbamoyloxy) alkyleneoxy alkyl acrylate esters
DE3036694A1 (de) * 1980-09-29 1982-06-03 Hoechst Ag, 6000 Frankfurt Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch
DE3048502A1 (de) * 1980-12-22 1982-07-22 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3223104A1 (de) * 1982-06-21 1983-12-22 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial
US4439600A (en) * 1983-06-03 1984-03-27 Loctite Corporation Cure to elastomers compositions
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
DE3441787A1 (de) * 1984-03-17 1985-09-19 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
EP0198392A1 (en) * 1985-04-10 1986-10-22 E.I. Du Pont De Nemours And Company Partial neutralization of aqueous developable photoresist
JPS61273536A (ja) * 1985-05-29 1986-12-03 Nitto Electric Ind Co Ltd 画像形成材料とこの材料を用いた回路形成方法
JPS61273537A (ja) * 1985-05-29 1986-12-03 Nitto Electric Ind Co Ltd 画像形成材料とこの材料を用いた回路形成方法

Also Published As

Publication number Publication date
ATE81911T1 (de) 1992-11-15
JPS62119541A (ja) 1987-05-30
BR8605631A (pt) 1987-08-18
US4956264A (en) 1990-09-11
IL80582A0 (en) 1987-02-27
CA1300786C (en) 1992-05-12
EP0222320B1 (de) 1992-10-28
JPH0746225B2 (ja) 1995-05-17
DE3687036D1 (de) 1992-12-03
EP0222320A3 (en) 1988-08-31
EP0222320A2 (de) 1987-05-20
ZA868307B (en) 1987-06-24
DE3540480A1 (de) 1987-05-21
FI864625A0 (fi) 1986-11-13
IL80582A (en) 1990-08-31

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Legal Events

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FD Application lapsed

Owner name: HOECHST AKTIENGESELLSCHAFT