FI840593A0 - Komposition foer fotoresistant strippning och foerfarande foer dess anvaendning - Google Patents

Komposition foer fotoresistant strippning och foerfarande foer dess anvaendning

Info

Publication number
FI840593A0
FI840593A0 FI840593A FI840593A FI840593A0 FI 840593 A0 FI840593 A0 FI 840593A0 FI 840593 A FI840593 A FI 840593A FI 840593 A FI840593 A FI 840593A FI 840593 A0 FI840593 A0 FI 840593A0
Authority
FI
Finland
Prior art keywords
composition
photo resistance
resistance strength
over far
far
Prior art date
Application number
FI840593A
Other languages
English (en)
Other versions
FI78310B (fi
FI840593A (fi
FI78310C (fi
Inventor
Wesley L Archer
Susan M Dallessandro
Vicki A Lynn
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Publication of FI840593A0 publication Critical patent/FI840593A0/fi
Publication of FI840593A publication Critical patent/FI840593A/fi
Publication of FI78310B publication Critical patent/FI78310B/fi
Application granted granted Critical
Publication of FI78310C publication Critical patent/FI78310C/fi

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5013—Organic solvents containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
    • C23G5/02806—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing only chlorine as halogen atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/266—Esters or carbonates
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/28—Organic compounds containing halogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Metallurgy (AREA)
  • General Physics & Mathematics (AREA)
  • Emergency Medicine (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
FI840593A 1983-02-14 1984-02-14 Avlaegsningsblandning av en ljuskaenslig polymer och foerfarande foer avlaegsning av en ljuskaenslig polymer. FI78310C (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46597583 1983-02-14
US06/465,975 US4438192A (en) 1983-02-14 1983-02-14 Photoresist stripper composition and method of use

Publications (4)

Publication Number Publication Date
FI840593A0 true FI840593A0 (fi) 1984-02-14
FI840593A FI840593A (fi) 1984-08-15
FI78310B FI78310B (fi) 1989-03-31
FI78310C FI78310C (fi) 1989-07-10

Family

ID=23849937

Family Applications (1)

Application Number Title Priority Date Filing Date
FI840593A FI78310C (fi) 1983-02-14 1984-02-14 Avlaegsningsblandning av en ljuskaenslig polymer och foerfarande foer avlaegsning av en ljuskaenslig polymer.

Country Status (9)

Country Link
US (1) US4438192A (fi)
EP (1) EP0116343B1 (fi)
JP (1) JPS59157639A (fi)
BR (1) BR8400680A (fi)
CA (1) CA1193177A (fi)
DE (1) DE3471770D1 (fi)
FI (1) FI78310C (fi)
HK (1) HK79489A (fi)
NO (1) NO165218C (fi)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3444293A1 (de) * 1984-12-05 1986-06-05 Metallgesellschaft Ag, 6000 Frankfurt Mittel zum reinigen von verarbeitungsanlagen fuer hochviskose reaktive mehrkomponentenmischungen
FR2601703B1 (fr) * 1986-07-21 1993-05-07 Atochem Composition a base de chlorure de methylene - son utilisation pour l'enlevement des films photoresist
CA2024589A1 (en) * 1989-09-05 1991-03-06 Masaru Sugita Cleaning compositions and applications thereof
US5218979A (en) * 1989-09-05 1993-06-15 Nagase & Company, Ltd. Method of cleaning printed circuit boards with dimethylcyclooctadienes
JP2519807B2 (ja) * 1989-10-13 1996-07-31 信越化学工業株式会社 オ―バ―ヘッドプロジェクタ用フィルムの再生方法
FR2657876B1 (fr) * 1990-02-07 1992-05-15 Atochem Composition nettoyante a base de 1,1-dichloro-1-fluoroethane et de formiate de methyle.
FR2657877B1 (fr) * 1990-02-07 1992-05-15 Atochem Composition nettoyante a base de 1,1-dichloro-1-fluoroethane, de formiate de methyle et de methanol.
US6511547B1 (en) 1996-01-30 2003-01-28 Siliconvalley Chemlabs, Inc. Dibasic ester stripping composition
US5909744A (en) * 1996-01-30 1999-06-08 Silicon Valley Chemlabs, Inc. Dibasic ester stripping composition
US5741368A (en) * 1996-01-30 1998-04-21 Silicon Valley Chemlabs Dibasic ester stripping composition
AU2001273598A1 (en) 2000-06-29 2002-01-14 Huntsman Petrochemical Corporation Carbonate-based photoresist stripping compositions

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU37804A1 (fi) 1958-11-04
LU37891A1 (fi) 1958-12-11
US3113154A (en) 1960-05-27 1963-12-03 Ethyl Corp Stable methylchloroform compositions
US3600322A (en) 1968-05-29 1971-08-17 Union Carbide Corp Paint removal formulation
US3650969A (en) 1968-07-29 1972-03-21 Allied Chem Compositions for removal of finish coatings
US3625763A (en) 1968-12-04 1971-12-07 Bunker Ramo Conformal coating stripping method and composition
US3813309A (en) 1969-12-23 1974-05-28 Ibm Method for stripping resists from substrates
GB1329731A (en) 1970-08-12 1973-09-12 Imp Chemical Ind Ld Method for removal of resists from printed circuit boards
US3988256A (en) 1974-04-03 1976-10-26 Allied Chemical Corporation Photoresist stripper rinse
GB2049972B (en) 1977-07-12 1982-06-23 Asahi Chemical Ind Photosensitive element for producing a printed circuit board
US4187191A (en) 1978-07-26 1980-02-05 General Motors Corporation Photoresist stripper with dodecylsulfonic acid and chlorinated solvents
EP0011658B1 (en) * 1978-12-01 1982-05-19 Dow Chemical (Europe) S.A. Stabilized methylene chloride formulation for vapor degreasing
US4246130A (en) 1979-06-21 1981-01-20 Amchem Products, Inc. Stripping composition and method for metals
US4367324A (en) 1980-02-05 1983-01-04 Ciba-Geigy Corporation Photocrosslinkable polymers with thioxanthone and imidyl groupings in side chains
US4269724A (en) 1980-02-13 1981-05-26 Hodson James V Composition for paint stripper
NL8001016A (nl) * 1980-02-22 1981-09-16 Kluthe Gmbh Chem Werke Toepassing van methylalcohol als stabilisator tegen explosiegevaar in een ontvettingsmiddel uit dichloormethaan voor metaaloppervlakken.
US4278557A (en) 1980-04-15 1981-07-14 The United States Of America As Represented By The Secretary Of The Air Force Solvent mixture for dissolving and removing epoxy resinous compounds

Also Published As

Publication number Publication date
CA1193177A (en) 1985-09-10
DE3471770D1 (en) 1988-07-07
FI78310B (fi) 1989-03-31
EP0116343A3 (en) 1985-10-30
FI840593A (fi) 1984-08-15
HK79489A (en) 1989-10-13
JPS59157639A (ja) 1984-09-07
EP0116343B1 (en) 1988-06-01
EP0116343A2 (en) 1984-08-22
US4438192A (en) 1984-03-20
NO165218C (no) 1991-01-09
FI78310C (fi) 1989-07-10
NO840515L (no) 1984-08-15
BR8400680A (pt) 1984-09-18
NO165218B (no) 1990-10-01

Similar Documents

Publication Publication Date Title
FI840576A0 (fi) Sammansatt elektrodstruktur och foerfarande foer dess framstaellning
DK205284D0 (da) Kompleksforbindelser af technetium-9m med alkylenaminoximer
FI823431A0 (fi) Transportfilt foer papperstillverkning och foerfarande foer dess tillverkning
FI823430A0 (fi) Pressfilt foer papperstillverkning och foerfarande foer dess tillverkning
FI832258L (fi) Fenolskum och blandning och foerfarande foer dess framstaellning
FI833474A0 (fi) Fraes och dess tillaeggsanordning
FI834847A0 (fi) Voltammetriskt maetningsfoerfarande och anordning foer dess tillaempning
FI840593A0 (fi) Komposition foer fotoresistant strippning och foerfarande foer dess anvaendning
FI65592B (fi) Foerpackning och foerfarande foer dess framstaellning
FI824283L (fi) Intravenoest injicerbart humanimmunglobulin och foerfarande foer dess framstaellning
FI840004A0 (fi) Ditiofosfor/amin-salter och dessa innehaollande vattenhaltiga kompositioner
DK120385D0 (da) Bladfjeder af kompositmateriale
FI832738A (fi) Veckat korvhoelje och foerfarande foer dess framstaellning
DK400384A (da) Modstandskomposition
FI832260A0 (fi) Skidbroms och foerfarande foer dess fastsaettning
FI824327A0 (fi) Skaft foer ishockeyklubba och foerfarande och verktyg foer dess framstaellning
FI803738L (fi) Komposition och dess framstaellning
FI831489A0 (fi) Slithaollfast belaeggning och dess framstaellning
FI831078A0 (fi) Skaop och dess doerrkonstruktion
DK14585D0 (da) Praeparat til foroegelse af udbyttet fra fisk
FR2507195B1 (fr) Composition adhesive
DK506084A (da) Bladfjeder af kompositmateriale
FI65591B (fi) Foerpackningspaose och foerfarande foer dess framstaellning
FI830244A0 (fi) Paels- och skinnplagg och dess framstaellningsfoerfarande
FI833128A0 (fi) Smycke- och medaljdosa och foerfarande foer dess framstaellning

Legal Events

Date Code Title Description
MM Patent lapsed

Owner name: THE DOW CHEMICAL COMPANY