NO840515L - Materiale som er egnet for avrivning av lysbestandig polymer - Google Patents

Materiale som er egnet for avrivning av lysbestandig polymer

Info

Publication number
NO840515L
NO840515L NO840515A NO840515A NO840515L NO 840515 L NO840515 L NO 840515L NO 840515 A NO840515 A NO 840515A NO 840515 A NO840515 A NO 840515A NO 840515 L NO840515 L NO 840515L
Authority
NO
Norway
Prior art keywords
materials suitable
resistant polymer
removing light
light resistant
polymer
Prior art date
Application number
NO840515A
Other languages
English (en)
Other versions
NO165218B (no
NO165218C (no
Inventor
Wesley L Archer
Susan M Dallessandro
Vicki A Lynn
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Publication of NO840515L publication Critical patent/NO840515L/no
Publication of NO165218B publication Critical patent/NO165218B/no
Publication of NO165218C publication Critical patent/NO165218C/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5013—Organic solvents containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
    • C23G5/02806—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing only chlorine as halogen atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/266—Esters or carbonates
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/28—Organic compounds containing halogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
NO840515A 1983-02-14 1984-02-13 Materiale som er egnet ved avrivning av lysbestandig polymer. NO165218C (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/465,975 US4438192A (en) 1983-02-14 1983-02-14 Photoresist stripper composition and method of use

Publications (3)

Publication Number Publication Date
NO840515L true NO840515L (no) 1984-08-15
NO165218B NO165218B (no) 1990-10-01
NO165218C NO165218C (no) 1991-01-09

Family

ID=23849937

Family Applications (1)

Application Number Title Priority Date Filing Date
NO840515A NO165218C (no) 1983-02-14 1984-02-13 Materiale som er egnet ved avrivning av lysbestandig polymer.

Country Status (9)

Country Link
US (1) US4438192A (no)
EP (1) EP0116343B1 (no)
JP (1) JPS59157639A (no)
BR (1) BR8400680A (no)
CA (1) CA1193177A (no)
DE (1) DE3471770D1 (no)
FI (1) FI78310C (no)
HK (1) HK79489A (no)
NO (1) NO165218C (no)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3444293A1 (de) * 1984-12-05 1986-06-05 Metallgesellschaft Ag, 6000 Frankfurt Mittel zum reinigen von verarbeitungsanlagen fuer hochviskose reaktive mehrkomponentenmischungen
FR2601703B1 (fr) * 1986-07-21 1993-05-07 Atochem Composition a base de chlorure de methylene - son utilisation pour l'enlevement des films photoresist
US5218979A (en) * 1989-09-05 1993-06-15 Nagase & Company, Ltd. Method of cleaning printed circuit boards with dimethylcyclooctadienes
CA2024589A1 (en) * 1989-09-05 1991-03-06 Masaru Sugita Cleaning compositions and applications thereof
JP2519807B2 (ja) * 1989-10-13 1996-07-31 信越化学工業株式会社 オ―バ―ヘッドプロジェクタ用フィルムの再生方法
FR2657876B1 (fr) * 1990-02-07 1992-05-15 Atochem Composition nettoyante a base de 1,1-dichloro-1-fluoroethane et de formiate de methyle.
FR2657877B1 (fr) * 1990-02-07 1992-05-15 Atochem Composition nettoyante a base de 1,1-dichloro-1-fluoroethane, de formiate de methyle et de methanol.
US5909744A (en) * 1996-01-30 1999-06-08 Silicon Valley Chemlabs, Inc. Dibasic ester stripping composition
US6511547B1 (en) 1996-01-30 2003-01-28 Siliconvalley Chemlabs, Inc. Dibasic ester stripping composition
US5741368A (en) * 1996-01-30 1998-04-21 Silicon Valley Chemlabs Dibasic ester stripping composition
WO2002003143A2 (en) 2000-06-29 2002-01-10 Huntsman Petrochemical Corporation Alkylene carbonate-based photoresist stripping compositions

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE583776A (no) 1958-11-04
LU37891A1 (no) 1958-12-11
US3113154A (en) 1960-05-27 1963-12-03 Ethyl Corp Stable methylchloroform compositions
US3600322A (en) 1968-05-29 1971-08-17 Union Carbide Corp Paint removal formulation
US3650969A (en) 1968-07-29 1972-03-21 Allied Chem Compositions for removal of finish coatings
US3625763A (en) 1968-12-04 1971-12-07 Bunker Ramo Conformal coating stripping method and composition
US3813309A (en) 1969-12-23 1974-05-28 Ibm Method for stripping resists from substrates
GB1329731A (en) 1970-08-12 1973-09-12 Imp Chemical Ind Ld Method for removal of resists from printed circuit boards
US3988256A (en) 1974-04-03 1976-10-26 Allied Chemical Corporation Photoresist stripper rinse
GB2000874B (en) 1977-07-12 1982-02-17 Asahi Chemical Ind Process for producing image and photosensitive element therefor and method of producing printed circuit board
US4187191A (en) 1978-07-26 1980-02-05 General Motors Corporation Photoresist stripper with dodecylsulfonic acid and chlorinated solvents
EP0011658B1 (en) * 1978-12-01 1982-05-19 Dow Chemical (Europe) S.A. Stabilized methylene chloride formulation for vapor degreasing
US4246130A (en) 1979-06-21 1981-01-20 Amchem Products, Inc. Stripping composition and method for metals
US4367324A (en) 1980-02-05 1983-01-04 Ciba-Geigy Corporation Photocrosslinkable polymers with thioxanthone and imidyl groupings in side chains
US4269724A (en) 1980-02-13 1981-05-26 Hodson James V Composition for paint stripper
NL8001016A (nl) * 1980-02-22 1981-09-16 Kluthe Gmbh Chem Werke Toepassing van methylalcohol als stabilisator tegen explosiegevaar in een ontvettingsmiddel uit dichloormethaan voor metaaloppervlakken.
US4278557A (en) 1980-04-15 1981-07-14 The United States Of America As Represented By The Secretary Of The Air Force Solvent mixture for dissolving and removing epoxy resinous compounds

Also Published As

Publication number Publication date
EP0116343B1 (en) 1988-06-01
HK79489A (en) 1989-10-13
BR8400680A (pt) 1984-09-18
FI78310B (fi) 1989-03-31
FI840593A (fi) 1984-08-15
FI840593A0 (fi) 1984-02-14
EP0116343A2 (en) 1984-08-22
JPS59157639A (ja) 1984-09-07
EP0116343A3 (en) 1985-10-30
DE3471770D1 (en) 1988-07-07
NO165218B (no) 1990-10-01
FI78310C (fi) 1989-07-10
NO165218C (no) 1991-01-09
US4438192A (en) 1984-03-20
CA1193177A (en) 1985-09-10

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