FI20085580A - Sovitelma ALD-reaktorin yhteydessä - Google Patents
Sovitelma ALD-reaktorin yhteydessä Download PDFInfo
- Publication number
- FI20085580A FI20085580A FI20085580A FI20085580A FI20085580A FI 20085580 A FI20085580 A FI 20085580A FI 20085580 A FI20085580 A FI 20085580A FI 20085580 A FI20085580 A FI 20085580A FI 20085580 A FI20085580 A FI 20085580A
- Authority
- FI
- Finland
- Prior art keywords
- arrangement
- connection
- ald reactor
- ald
- reactor
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20085580A FI122941B (fi) | 2008-06-12 | 2008-06-12 | Sovitelma ALD-reaktorin yhteydessä |
US12/937,782 US8496753B2 (en) | 2008-06-12 | 2009-06-09 | Arrangement in connection with ALD reactor |
JP2011513013A JP5369178B2 (ja) | 2008-06-12 | 2009-06-09 | Ald反応器の接続部の構成 |
PCT/FI2009/050487 WO2009150297A1 (en) | 2008-06-12 | 2009-06-09 | Arrangement in connection with ald reactor |
EP09761852.4A EP2294245B1 (en) | 2008-06-12 | 2009-06-09 | Arrangement in connection with ald reactor |
EA201071368A EA018887B1 (ru) | 2008-06-12 | 2009-06-09 | Устройство для реактора послойного атомного осаждения |
CN2009801206812A CN102057079B (zh) | 2008-06-12 | 2009-06-09 | 与原子层沉积反应器相连接的装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20085580A FI122941B (fi) | 2008-06-12 | 2008-06-12 | Sovitelma ALD-reaktorin yhteydessä |
FI20085580 | 2008-06-12 |
Publications (3)
Publication Number | Publication Date |
---|---|
FI20085580A0 FI20085580A0 (fi) | 2008-06-12 |
FI20085580A true FI20085580A (fi) | 2009-12-13 |
FI122941B FI122941B (fi) | 2012-09-14 |
Family
ID=39589344
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI20085580A FI122941B (fi) | 2008-06-12 | 2008-06-12 | Sovitelma ALD-reaktorin yhteydessä |
Country Status (7)
Country | Link |
---|---|
US (1) | US8496753B2 (fi) |
EP (1) | EP2294245B1 (fi) |
JP (1) | JP5369178B2 (fi) |
CN (1) | CN102057079B (fi) |
EA (1) | EA018887B1 (fi) |
FI (1) | FI122941B (fi) |
WO (1) | WO2009150297A1 (fi) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8152922B2 (en) * | 2003-08-29 | 2012-04-10 | Asm America, Inc. | Gas mixer and manifold assembly for ALD reactor |
US10954597B2 (en) * | 2015-03-17 | 2021-03-23 | Asm Ip Holding B.V. | Atomic layer deposition apparatus |
JP6054470B2 (ja) | 2015-05-26 | 2016-12-27 | 株式会社日本製鋼所 | 原子層成長装置 |
JP5990626B1 (ja) * | 2015-05-26 | 2016-09-14 | 株式会社日本製鋼所 | 原子層成長装置 |
JP6054471B2 (ja) | 2015-05-26 | 2016-12-27 | 株式会社日本製鋼所 | 原子層成長装置および原子層成長装置排気部 |
FI129501B (fi) * | 2019-04-25 | 2022-03-31 | Beneq Oy | Kaasunjakoyksikkö ALD-reaktorin yhteydessä |
KR20210126202A (ko) | 2020-04-09 | 2021-10-20 | 삼성디스플레이 주식회사 | 표시 장치 및 그 제조 방법 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FI57975C (fi) | 1979-02-28 | 1980-11-10 | Lohja Ab Oy | Foerfarande och anordning vid uppbyggande av tunna foereningshinnor |
US4389973A (en) | 1980-03-18 | 1983-06-28 | Oy Lohja Ab | Apparatus for performing growth of compound thin films |
US5224513A (en) * | 1991-06-04 | 1993-07-06 | Cselt - Centro Studi E Laboratori Telecomunicazioni S.P.A. | Device for introducing reagents into an organometallic vapor phase deposition apparatus |
JPH06291318A (ja) * | 1993-02-02 | 1994-10-18 | Fujitsu Ltd | 薄膜トランジスタマトリクス装置及びその製造方法 |
EP0619450A1 (en) * | 1993-04-09 | 1994-10-12 | The Boc Group, Inc. | Zero Dead-Leg Gas Cabinet |
US6022414A (en) * | 1994-07-18 | 2000-02-08 | Semiconductor Equipment Group, Llc | Single body injector and method for delivering gases to a surface |
FI100409B (fi) * | 1994-11-28 | 1997-11-28 | Asm Int | Menetelmä ja laitteisto ohutkalvojen valmistamiseksi |
US6068703A (en) * | 1997-07-11 | 2000-05-30 | Applied Materials, Inc. | Gas mixing apparatus and method |
FI117978B (fi) * | 2000-04-14 | 2007-05-15 | Asm Int | Menetelmä ja laitteisto ohutkalvon kasvattamiseksi alustalle |
FI117980B (fi) * | 2000-04-14 | 2007-05-15 | Asm Int | Menetelmä ohutkalvon kasvattamiseksi alustalle |
TWI277140B (en) | 2002-07-12 | 2007-03-21 | Asm Int | Method and apparatus for the pulse-wise supply of a vaporized liquid reactant |
US6936086B2 (en) | 2002-09-11 | 2005-08-30 | Planar Systems, Inc. | High conductivity particle filter |
JP4427451B2 (ja) * | 2002-10-30 | 2010-03-10 | 株式会社日立国際電気 | 基板処理装置 |
JP5032986B2 (ja) | 2004-06-24 | 2012-09-26 | ベネク・オサケユキテュア | 材料にドーピングするための方法およびドーピングされた材料 |
KR101463581B1 (ko) | 2005-01-18 | 2014-11-20 | 에이에스엠 아메리카, 인코포레이티드 | 박막 성장용 반응 시스템 |
JP2008540840A (ja) * | 2005-05-09 | 2008-11-20 | エイエスエム・ジェニテック・コリア・リミテッド | 複数の気体流入口を有する原子層堆積装置の反応器 |
FI121543B (fi) | 2005-11-17 | 2010-12-31 | Beneq Oy | Järjestely ALD-reaktorin yhteydessä |
FI121750B (fi) | 2005-11-17 | 2011-03-31 | Beneq Oy | ALD-reaktori |
JP5280861B2 (ja) | 2006-01-19 | 2013-09-04 | エーエスエム アメリカ インコーポレイテッド | 高温aldインレットマニホールド |
KR101355638B1 (ko) | 2006-11-09 | 2014-01-29 | 한국에이에스엠지니텍 주식회사 | 원자층 증착 장치 |
JP5219562B2 (ja) * | 2007-04-02 | 2013-06-26 | 株式会社日立国際電気 | 基板処理装置、基板処理方法及び半導体装置の製造方法 |
-
2008
- 2008-06-12 FI FI20085580A patent/FI122941B/fi active IP Right Grant
-
2009
- 2009-06-09 CN CN2009801206812A patent/CN102057079B/zh active Active
- 2009-06-09 EA EA201071368A patent/EA018887B1/ru not_active IP Right Cessation
- 2009-06-09 EP EP09761852.4A patent/EP2294245B1/en active Active
- 2009-06-09 WO PCT/FI2009/050487 patent/WO2009150297A1/en active Application Filing
- 2009-06-09 US US12/937,782 patent/US8496753B2/en active Active
- 2009-06-09 JP JP2011513013A patent/JP5369178B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP5369178B2 (ja) | 2013-12-18 |
WO2009150297A1 (en) | 2009-12-17 |
EP2294245A4 (en) | 2013-08-28 |
FI122941B (fi) | 2012-09-14 |
FI20085580A0 (fi) | 2008-06-12 |
CN102057079A (zh) | 2011-05-11 |
EA201071368A1 (ru) | 2011-06-30 |
EP2294245A1 (en) | 2011-03-16 |
EA018887B1 (ru) | 2013-11-29 |
US8496753B2 (en) | 2013-07-30 |
CN102057079B (zh) | 2013-03-20 |
EP2294245B1 (en) | 2014-11-26 |
US20110036291A1 (en) | 2011-02-17 |
JP2011522969A (ja) | 2011-08-04 |
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