FI20045264A0 - Menetelmä ja laite optisen materiaalin tuottamiseksi sekä optinen aaltojohde - Google Patents

Menetelmä ja laite optisen materiaalin tuottamiseksi sekä optinen aaltojohde

Info

Publication number
FI20045264A0
FI20045264A0 FI20045264A FI20045264A FI20045264A0 FI 20045264 A0 FI20045264 A0 FI 20045264A0 FI 20045264 A FI20045264 A FI 20045264A FI 20045264 A FI20045264 A FI 20045264A FI 20045264 A0 FI20045264 A0 FI 20045264A0
Authority
FI
Finland
Prior art keywords
well
optical waveguide
producing
optical material
optical
Prior art date
Application number
FI20045264A
Other languages
English (en)
Swedish (sv)
Other versions
FI116619B (fi
Inventor
Kauko Janka
Markku Rajala
Juha Tikkanen
Original Assignee
Liekki Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Liekki Oy filed Critical Liekki Oy
Publication of FI20045264A0 publication Critical patent/FI20045264A0/fi
Priority to FI20045264A priority Critical patent/FI116619B/fi
Priority to US10/885,410 priority patent/US20060001952A1/en
Priority to PCT/FI2005/050239 priority patent/WO2006003253A1/en
Priority to CA2613576A priority patent/CA2613576C/en
Priority to EP05757928.6A priority patent/EP1778597B1/en
Priority to JP2007518629A priority patent/JP5107035B2/ja
Priority to DK05757928.6T priority patent/DK1778597T3/da
Priority to KR1020077002314A priority patent/KR101224509B1/ko
Priority to CNA2005800225979A priority patent/CN1984851A/zh
Application granted granted Critical
Publication of FI116619B publication Critical patent/FI116619B/fi
Priority to IL180372A priority patent/IL180372A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C13/00—Fibre or filament compositions
    • C03C13/04—Fibre optics, e.g. core and clad fibre compositions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D11/00—Burners using a direct spraying action of liquid droplets or vaporised liquid into the combustion space
    • F23D11/10—Burners using a direct spraying action of liquid droplets or vaporised liquid into the combustion space the spraying being induced by a gaseous medium, e.g. water vapour
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
    • C03B2201/36—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers doped with rare earth metals and aluminium, e.g. Er-Al co-doped
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/14—Tapered or flared nozzles or ports angled to central burner axis
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/34—Liquid, e.g. mist or aerosol
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
FI20045264A 2004-07-02 2004-07-02 Menetelmä ja laite optisen materiaalin tuottamiseksi sekä optinen aaltojohde FI116619B (fi)

Priority Applications (10)

Application Number Priority Date Filing Date Title
FI20045264A FI116619B (fi) 2004-07-02 2004-07-02 Menetelmä ja laite optisen materiaalin tuottamiseksi sekä optinen aaltojohde
US10/885,410 US20060001952A1 (en) 2004-07-02 2004-07-07 Method and device for producing optical material, and an optical waveguide
EP05757928.6A EP1778597B1 (en) 2004-07-02 2005-06-23 Method for producing an optical waveguide material
CA2613576A CA2613576C (en) 2004-07-02 2005-06-23 Method and device for producing optical material, and an optical waveguide
PCT/FI2005/050239 WO2006003253A1 (en) 2004-07-02 2005-06-23 Optical waveguide material as well as method and device for producing it
JP2007518629A JP5107035B2 (ja) 2004-07-02 2005-06-23 光導波路材料ならびにその製造方法および製造装置
DK05757928.6T DK1778597T3 (da) 2004-07-02 2005-06-23 Fremgangsmåde til fremstilling af et optisk bølgeledermateriale
KR1020077002314A KR101224509B1 (ko) 2004-07-02 2005-06-23 광 도파관 재료, 및 이를 제조하기 위한 방법 및 장치
CNA2005800225979A CN1984851A (zh) 2004-07-02 2005-06-23 光波导材料及其制备方法和制备所用设备
IL180372A IL180372A (en) 2004-07-02 2006-12-26 Optical material production method increases light

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20045264A FI116619B (fi) 2004-07-02 2004-07-02 Menetelmä ja laite optisen materiaalin tuottamiseksi sekä optinen aaltojohde
FI20045264 2004-07-02

Publications (2)

Publication Number Publication Date
FI20045264A0 true FI20045264A0 (fi) 2004-07-02
FI116619B FI116619B (fi) 2006-01-13

Family

ID=32749256

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20045264A FI116619B (fi) 2004-07-02 2004-07-02 Menetelmä ja laite optisen materiaalin tuottamiseksi sekä optinen aaltojohde

Country Status (10)

Country Link
US (1) US20060001952A1 (fi)
EP (1) EP1778597B1 (fi)
JP (1) JP5107035B2 (fi)
KR (1) KR101224509B1 (fi)
CN (1) CN1984851A (fi)
CA (1) CA2613576C (fi)
DK (1) DK1778597T3 (fi)
FI (1) FI116619B (fi)
IL (1) IL180372A (fi)
WO (1) WO2006003253A1 (fi)

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DE102007045097B4 (de) 2007-09-20 2012-11-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von co-dotiertem Quarzglas
JP5362382B2 (ja) 2008-02-27 2013-12-11 信越化学工業株式会社 光ファイバ用母材の製造方法及び光ファイバ用母材製造用バーナ
EP2233836B1 (de) * 2009-03-23 2015-07-29 Siemens Aktiengesellschaft Drallerzeuger, Verfahren zum Vermeiden von Flammenrückschlag in einem Brenner mit wenigstens einem Drallerzeuger und Brenner
GB2478307A (en) 2010-03-02 2011-09-07 Heraeus Quartz Uk Ltd Manufacture of silica glass
US9066412B2 (en) 2010-04-15 2015-06-23 Asml Netherlands B.V. Systems and methods for cooling an optic
US8840858B2 (en) * 2011-07-06 2014-09-23 Corning Incorporated Apparatus for mixing vaporized precursor and gas and method therefor
JP5748633B2 (ja) * 2011-10-18 2015-07-15 信越化学工業株式会社 多孔質ガラス母材製造用バーナ及び多孔質ガラス母材の製造方法
DE102012012524B3 (de) * 2012-06-26 2013-07-18 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines dotierten SiO2-Schlickers sowie Verwendung des SiO2-Schlickers
WO2014104359A1 (ja) 2012-12-28 2014-07-03 住友電気工業株式会社 ガラス微粒子堆積体の製造方法およびガラス母材の製造方法
WO2015010622A1 (zh) * 2013-07-25 2015-01-29 Yu Liang 燃烧器喷嘴
DE102015109264A1 (de) * 2015-06-11 2016-12-15 Maicom Quarz Gmbh Partikelförmiges Material, Verfahren zu dessen Herstellung und Verwendung des Materials
US10882777B2 (en) * 2017-03-16 2021-01-05 Corning Incorporated Adjustable fume tube burner
US11676069B2 (en) 2018-12-13 2023-06-13 Diveplane Corporation Synthetic data generation using anonymity preservation in computer-based reasoning systems
US11669769B2 (en) 2018-12-13 2023-06-06 Diveplane Corporation Conditioned synthetic data generation in computer-based reasoning systems
US11625625B2 (en) 2018-12-13 2023-04-11 Diveplane Corporation Synthetic data generation in computer-based reasoning systems
CN108648758B (zh) * 2018-03-12 2020-09-01 北京云知声信息技术有限公司 医疗场景中分离无效语音的方法及系统
US11176465B2 (en) 2018-11-13 2021-11-16 Diveplane Corporation Explainable and automated decisions in computer-based reasoning systems
US11763176B1 (en) 2019-05-16 2023-09-19 Diveplane Corporation Search and query in computer-based reasoning systems
US20220098084A1 (en) * 2020-05-20 2022-03-31 Corning Incorporated Methods for increasing deposition in a flame hydrolysis deposition process

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Also Published As

Publication number Publication date
JP2008504207A (ja) 2008-02-14
US20060001952A1 (en) 2006-01-05
EP1778597B1 (en) 2013-10-09
CA2613576A1 (en) 2006-01-12
IL180372A0 (en) 2007-06-03
FI116619B (fi) 2006-01-13
DK1778597T3 (da) 2014-01-13
EP1778597A1 (en) 2007-05-02
IL180372A (en) 2014-02-27
CN1984851A (zh) 2007-06-20
JP5107035B2 (ja) 2012-12-26
WO2006003253A1 (en) 2006-01-12
KR101224509B1 (ko) 2013-01-22
KR20070057138A (ko) 2007-06-04
CA2613576C (en) 2014-03-18

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